日本电子推出JPS-9030 X射线光电子能谱仪,预计第一年发售20套
发布: 2015-04-10 17:00:06来源: 日本电子株式会社(JEOL)
JEOL Ltd. (President Gon-emon Kurihara) has completed the development of the X-ray Photoelectron Spectrometer (XPS) JPS-9030, with sales scheduled to start on April 10, 2015.
Product development background
In recent years, there has been a growing demand to perform high quality surface analysis quickly, easily and reproducibly on any kind of sample for any level user. The JPS-9030 is equipped with a newly-designed user interface that further improves operability and also debuts a sophisticated, new modern and sleek exterior design.
Main Features
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Depth profiling optimized for the application
The newly-developed Kaufman-type etching ion source provides etching rates from 1 nm/min to 100 nm/min (SiO2equivalent), and allows a wide range of settings. It is capable of depth profiles suitable for any application, from measurements demanding precision to processes that require speed. The mounting of the Kaufman-type etching ion source to the specimen exchange chamber facilitates prevention of contamination of the measurement chamber. -
Newly-developed software provides even greater ease-of-use
SpecSurf Ver. 2.0 now incorporates a ribbon-style GUI, offering a user-friendly environment in which all operations can be performed with the mouse. With JEOL’s own automatic qualitative analysis function, it is possible to sequentially perform qualitative, quantitative and chemical state analyses for multiple acquisition points. -
Ultra-high surface sensitivity
The JPS-9030 supports techniques like Angle-Resolved XPS (ARXPS) and Total Reflection XPS (TRXPS), and is capable ultra-high sensitive analysis of the top surfaces of 1 nm (standard measurement method 6 nm or more). -
A wealth of options
- Monochromatic X-ray sources
- Argon gas cluster ion source suitable for organic samples
- Infra-red heating system capable of temperatures of 1,000°C or higher
- Transfer vessel to protect specimens from exposure to the atmosphere
Main Specifications
Intensity (MgKα, 300W equivalent) |
1,000,000 cps or more (at Ag3d5/2 FWHM is 1.0 eV) |
---|---|
X-ray source | Mg/Al twin anode |
Input-lens system | Cylindrical electrostatic lens |
Energy analyzer | Electrostatic hemispherical analyzer |
Energy sweep method | Constant Analyzer Energy and Constant Retarding Ratio |
Detector | multichannel plate |
Ion gun | Kaufman type ion gun |
Base pressure | 7 × 10-8 Pa or better |
Bake-out system | Built-in heater, automatic control |
Annual unit sales target
20 units/year
厂家名称
日本电子株式会社(JEOL Ltd., )在各地设有服务机构,能够迅速、妥善地应对全球客户的需求。我们的目标旨在为所有顾客提供满意的、具有一贯服务能力的服务体系。JEOL目前面向中国及全球,生产销售各型扫描电子显微镜、透射电子显微镜、电子探...