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您现在所在的位置:首页 >> 仪器导购 >> ICP-MS>> NexION 350系列电感耦合等离子体质谱仪ICP-MS

NexION 350系列电感耦合等离子体质谱仪ICP-MS

tel: 400-6699-117 5858

珀金埃尔默ICP-MS, 通用池技术,3锥接口,zei快的速度测纳米粒子......

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参考:NexION 350指标

NexIon 350D 指标

质量范围: 1-285 amu

瞬时数据采集速率:zei高100,000 amu/sec

检出限:

Elementng/L (ppt)
9Be< 1
56Fe< 3
59Co< 1
115In< 0.5
238U< 0.5

灵敏度

ElementM cps/mg/L
9Be> 3
24Mg> 20
115In> 50
238U> 40

  

氧化物和双电荷比率:

CeO+/Ce+   < 0.025

Ce++/Ce+   < 0.03

背景噪音: Mass 220  < 1 cps

短期精度: < 3% RSD

长期稳定性: < 4% RSD over 4 hours

同位素比精度: < 0.08*% RSD

质量轴稳定性: < 0.05 amu over 8 hours of continuous operation

四极杆跳峰hop (slew)速度: 1.6M amu/sec

四极杆扫描速度: 5000 amu/sec,瞬时数据采集速率:zei高100,000 amu/sec

检测器线性范围:SimulScan™ 检测系统,操控范围:< 0.1 cps ~ > 109 cps

RF射频发生器: 40MHz, 3rd generation free-running design with PlasmaLok, adjustable from 500 to 1600 watts, in 1 watt increments. True Power Control maintains the plasma power at the set point, even when changing sample matrices. RF load coil is cooled by argon for electrical safety.

Torch/torch mount: Demountable torch design. Easily removal quick change torch mount cassette for maximum performance in different matrices. No tools are required for sample-introduction cassette removal.

Torch position: Fully computer controlled X, Y, Z torch positioning optimize for maximum ion transmission. Torch positioning system in all three axes (horizontal, vertical, sampling depth) is +/- 6 mm with 0.05 mm reproducibility.

Sample introduction system: The standard 2-mm i.d. quartz injector is held by a specially designed pass-through injector-support assembly to minimize contact with materials that could cause sample contamination – for determinations made at the parts-per-trillion level. The glass-cyclonic spray chamber optimize sample-washout characteristics. The glass-concentric nebulizer provides the ultimate in sensitivity and performance for ultratrace-level determinations.

Peristaltic pump: Fully computer controlled, high-precision pump, variable speed from 0-100 rpm, integrated three-channel and 10 rollers.

等离子体观测窗: Full color plasma view window allows the visual inspection of the cones, torch and load coil without opening the instruments. Enables optimization of plasma sampling depth and simplifies analysis of organics and complex matrices.

PlasmaLok interface:

PlasmaLok eliminates damage to the interface cones from uncontrolled arcing of the plasma, which leads to sample deposition on the cones and high background signal rates. PlasmaLok minimizes cone clogging and guarantees that excellent signal precision and long-term stability are achieved. The fact that there is less buildup of deposits on the cones, less cleaning and routine maintenance are required. PlasmaLok stabilizes ion-energy distribution, thus maintaining excellent spectral resolution and simplifying ion-optic tuning. This is achieved even when the sample matrix dramatically changes, such as going from a wet-sample aerosol (conventional nebulization) to a dry sample aerosol (laser sampling) or from aqueous solutions to organics.

三锥接口:

采样锥 : 1.1 mm diameter orifice, nickel.

Skimmer cone : 0.9 mm large diameter orifice, nickel. It is to maximize signal stability and to minimize clogging during extended runs of samples containing high dissolved solids.

3rd hyper skimmer cone : 1.0 mm large diameter orifice to produce tightly focused ion beam, filter complex matrix, un-ionized material and neutrals to reduce maintenance.

Gate valve: An isolation vacuum automated gate valve position after the 3rd hyper skimmer cone to isolate the high vacuum region in the event of power, water, argon or interface vacuum failure. The gate valve allows triple cone to be removed for cleaning without venting the vacuum system.

Quadrupole ion deflector: Turning analyte ion beam through 90 degrees, focusing a specified ions mass into Universal Cell System. It is supplied with focusing voltage that is automatically controlled by the instrument software. During each scan, the optimum voltage for each mass is dynamically applied to maximize analyte ions transmission to achieve high sensitivity, minimize other interfering ions transmission to achieve low backgrounds. Filtering feature discarding all photons, matrix and neutral species to wast`e via vacuum system  to provide un-surplus stability of the instrument. Maintenance free, the path of quadrupole ion deflector is aligned tightly defined ion beam leaving the hyper skimmer of Triple Cone Interface. This ensures analyte ions and neutrals species never touch any component’s surfaces of ion deflector, keeping it clean for superior stability and eliminating cleaning requirements.

Universal Cell通用池技术:

Universal Cell Technology (UCT) allows the instrument to be run in three different modes within same method depending on the level of interference removal and detection limits required.

Standard mode for routine application, Cell gas is turned off so there is no loss in analyte sensitivity. Interference removal technique is through correction equations.

Collision mode for removal of unknown interferences, non-reactive gas such as helium is introduced into the cell to collide with the interfering ions with larger diameters, reducing their kinetic energy. Collision mode removes many interferences to deliver better detection limits than Standard mode for some elements. Interference removal technique is through Kinetic Energy Discrimination (KED).

Reaction (DRC) Mode for application demanding best performance and unprecedented level of interference removal. Highly reactive gas such as ammonia is introduced into the cell to create predictable chemical reactions. Any side reactions and resulting new interferences are instantly removed by a scanning quadrupole. Interference removal technique is through Dynamic Reaction Cell (DRC) with scanning quadrupole.

Quadrupole mass spectrometer:

The quadrupole is driven by a high-frequency 2.5-MHz power supply carefully designed to produce a perfect hyperbolic field for optimum resolving power and ion-transmission efficiency. 
State-of-the-art binary gold-metallized ceramic rods, combined with ceramic mounting collars, ensure that the coefficient of thermal expansion is completely matched, guaranteeing rigid structural integrity along the entire length of the rod to achieve exceptional mass 
calibration stability.

Dimensions:  125 cm x 77 cm x 76 cm (WxHxD), 181 kg


参考参数:

分析对象:质量数1-285amu的所有元素

分析范围:ppt%含量同时分析

分析速度:十万测量数据/

抗干扰能力:>109(干扰信号/分析信号)

抗干扰分辨率:>105,可分辨87Rb87Sr

真空能力:冷启动时间小于8分钟

同位素比值精密度:RSD<0.08%


The NexION® 350D ICP-MS features a dual-channel Universal Cell as well the ability to use Dynamic Reaction Cell™ technology, giving analysts the flexibility to choose Kinetic Energy Discrimination (KED) and/or the use of a scanning quadrupole in the Dynamic Reaction Cell. These capabilities make it the ideal solution for biomonitoring applications.

 

The NexION® 350X ICP-MS, with a single-channel Universal Cell, is well suited for general purpose applications that may be susceptible to interferences or analyses where you simply want to remove any unknown interferences. The NexION 350X ICP-MS can use a simple non-reactive gas in Collision mode or a reactive gas in Reaction mode, making it ideal for semi-quantitative analysis, environmental testing, as well as the testing of unknown samples. An optional second channel is available for the NexION 350X ICP-MS.

 

The NexION® 350Q ICP-MS is the ideal solution for simple inorganic analyses requiring no interference-removing correction capabilities, best suited for routine applications requiring high throughput that have few interferences, making it popular in geochemical laboratories.

 

The NexION® 350S ICP-MS features a dual-channel Universal Cell that has been optimized for sensitivity. The system uses pure reactive gases to remove any and all interferences with little or no loss of analyte sensitivity, ideal for applications demanding the very best performance and an unprecedented level of interference removal. The NexION 350S ICP-MS configuration was designed specifically for the semiconductor industry. 


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地址:上海张江高科技园区张衡路1670号

电话:400-6699-117 转 5858

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