【技术特点】-- ETD-2000Ⅲ 离子溅射仪

   ETD-2000III型三靶离子溅射仪是依据二极（DC）直流溅射原理设计而成的最简单、可靠、经济的镀膜设备。本机特别之处是在一个真空室内安装了三个靶，旋转样品台可依次在同一样品上涂覆三种材料。因此，适用于实验室各种复合膜样品的制备，以及非导体材料实验电极的制作。

       工作时结合内部自动控制电路很容易控制真空室压强、电离电流及选择所需的电离气体，获得最佳镀膜效果。

      配有高位定性的飞跃真空泵

The ETD-2000III type three target ion sputtering apparatus is the simplest, reliable and economical coating equipment designed on the basis of DC (DC) sputtering principle. This machine is specially designed to install three targets in a vacuum chamber. The rotating sample stage can be coated with three materials on the same sample in turn. Therefore, it is suitable for the preparation of various composite membrane samples and the fabrication of experimental electrodes for non conductor materials. It is easy to control the vacuum chamber pressure, ionization current and choose the required ionization gas when working in conjunction with the internal automatic control circuit, so as to achieve the best coating effect. High qualitative jump vacuum pump

【技术特点对用户带来的好处】-- ETD-2000Ⅲ 离子溅射仪

【典型应用举例】-- ETD-2000Ⅲ 离子溅射仪