【技术特点】-- ETD-2000C 溅射蒸碳仪

      ETD-2000C型离子溅射仪在ETD-2000离子溅射仪基础上，增加了热蒸发附件，可以蒸发碳丝，具有溅射和蒸发两种功能。因此扩展了应用范围，特别适用于扫描电镜实验室样品制备。

       工作时结合内部自动控制电路很容易控制真空室压强、电离电流及选择所需的电离气体，获得最佳镀膜效果。

      配有高位定性的飞跃真空泵

   On the basis of ETD-2000 ion sputtering apparatus, the ETD-2000C type ion sputtering apparatus adds thermal evaporation accessories, which can evaporate carbon filament, and has two functions of sputtering and evaporation. Therefore, the application scope is extended, especially for sample preparation in SEM. 

   It is easy to control the vacuum chamber pressure, ionization current and choose the required ionization gas when working in conjunction with the internal automatic control circuit, so as to achieve the best coating effect.

  High qualitative jump vacuum pump

【技术特点对用户带来的好处】-- ETD-2000C 溅射蒸碳仪

【典型应用举例】-- ETD-2000C 溅射蒸碳仪