ZH
RU
ES

Electrode Piece Thickness

Electrode Piece Thickness, Total:499 items.

In the international standard classification, Electrode Piece Thickness involves: Surface treatment and coating, Machine tools, Welding, brazing and soldering, Electricity. Magnetism. Electrical and magnetic measurements, Equipment for the metallurgical industry, Linear and angular measurements, Electrical engineering in general, Non-ferrous metals, Products of non-ferrous metals, Integrated circuits. Microelectronics, Chipless working equipment, Semiconductor devices, Iron and steel products, Resistors, Testing of metals, Printed circuits and boards, Optics and optical measurements, Conducting materials, Insulating fluids, Capacitors, Shipbuilding and marine structures in general, Wood-based panels, Electronic tubes, Optoelectronics. Laser equipment, Products of the chemical industry, Thermodynamics and temperature measurements, Wastes, Medical equipment, Vocabularies, Rotating machinery, Radiocommunications, Data storage devices, Solar energy engineering, Materials for aerospace construction, Electrical wires and cables, Protection against electric shock.

Indonesia Standards, Electrode Piece Thickness

• SNI 07-0955-1989 Test method for thickness of anodic coatings

Association Francaise de Normalisation, Electrode Piece Thickness

• NF EN ISO 2128:2010 Anodisation de l'aluminium et de ses alliages - Détermination de l'épaisseur des couches anodiques - Méthode non destructive par microscope à coupe optique
• NF EN ISO 2177:2004 Revêtements métalliques - Mesurage de l'épaisseur - Méthode coulométrique par dissolution anodique
• NF A91-404:1966 Surface treatment of metals. Anodizing (anodic oxydizing) of aluminium and its alloys. Measurement of thickness.
• NF A91-111:1995 Metallic coatings. Measurement of coating thickness. Coulometric method by anodic dissolution.
• NF A82-105:1985 Electric resistance welding. Straight resistance spot welding electrodes with caps, male taper fits and male caps. Sizes and tolerances (taper 1/10).
• NF A91-402:1981 Surface treatments of metals. Anodic oxidation of aluminium and its alloys. Thickness measurements.
• NF A91-481*NF EN ISO 2128:2010 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope
• NF A91-111*NF EN ISO 2177:2004 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution
• NF A81-304:1994 Covered electrodes for manual metal arc welding. Deposition of a weld metal pad for chemical analysis.
• NF A82-115:2008 Resistance welding equipment - Angles for mounting spot welding electrodes.
• NF A82-104-2*NF EN ISO 5183-2:2001 Resistance spot welding - Electrode adaptors, male taper 1:10 - Part 2 : parallel shank fixing for end-thrust electrodes
• NF A91-055*NF EN 16866:2017 Metallic and other inorganic coatings - Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test)
• NF A82-105:2011 Resistance spot welding - Electrode adaptors, female taper 1:10.
• NF A82-105:2021 Resistance spot welding - Electrode adaptors, female taper 1:10
• NF EN ISO 16866:2022 Revêtements métalliques et autres revêtements inorganiques - Détermination simultanée de l'épaisseur et du potentiel d'électrode de couches individuelles dans des dépôts de nickel multicouches (essai STEP)
• NF A82-120-2*NF EN ISO 8430-2:2016 Resistance spot welding - Electrode holders - Part 2 : morse taper fixing
• NF A82-120-2:1992 Resistance spot welding. Electrode holders. Part 2 : morse taper fixing.
• NF A82-120-1*NF EN ISO 8430-1:2016 Resistance spot welding - Electrode holders - Part 1 : tapper fixing 1:10
• NF A82-120-1:1992 Resistance spot welding. Electrode holders. Part 1 : tapper fixing 1:10.
• FD R13-438:1996 Road vehicles. Multipole, 3 mm flat tab connections with housing locking. Dimensional characteristics.

GM North America, Electrode Piece Thickness

• GM GM4260P-1988 Measuring Thickness of Electrodeposits and Anodic Coatings
• GM 9984070-2014 High Build Cathodic Electrocoat (Issue 8)

(U.S.) Ford Automotive Standards, Electrode Piece Thickness

• FORD FLTM EU-BQ 010-01-2000 FILM THICKNESS MEASUREMENT FOR ANODIZED ALUMINUM
• FORD FLTM EU-BQ 010-1-2000 FILM THICKNESS MEASUREMENT FOR ANODIZED ALUMINUM
• FORD FLTM BQ 010-01-2000 TEST PROCEDURES FOR ANODIZED ALUMINUM FILM THICKNESS MEASUREMENT
• FORD FLTM BQ 010-1-2000 TEST PROCEDURES FOR ANODIZED ALUMINUM FILM THICKNESS MEASUREMENT
• FORD WSK-M64J35-C1-1993 PRIMER, WATERBORNE CATHODIC ELECTROCOAT, 25 MICROMETRE FILM BUILD, GRAY, LEAD FREE, 175 C BAKING TEMPERATURE, INITIAL FILL (Shown on WSK-M64J35-A1)

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Electrode Piece Thickness

• GB/T 8014-1987 Anodizing of aluminium and aluminium alloys--Definitions thickness of anodic oxidation coatings and conventions concerning the measurement of thickness
• GB/T 4955-1997 Metallic coatings--Measurement of coating thickness--Coulometric method by anodic dissolution
• GB/T 4955-2005 Metallic coatings.Measurement of coating thickness.Coulometric method by anodic dissolution
• GB 8015.1-1987 Test method for thickness of anodized film on aluminum and aluminum alloys - gravimetric method
• GB/T 8015.1-1987 Test methods for thickness of anodic oxidation coatings on aluminium and aluminium alloys--Gravimetric method
• GB/T 30869-2014 Test method for thickness and total thickness variation of silicon wafers for solar cell
• GB/T 3074.1-2008 Method for the determination of the flexure strength of graphite electrodes
• GB/T 3074.1-1982 Method for determination of the flexure strength of graphite electrodes
• GB 8015.2-1987 Test method for thickness of anodized films on aluminum and aluminum alloys - split beam microscopy
• GB/T 8015.2-1987 Test methods for thickness of anodic oxidation coatings on aluminium and aluminium alloys--Split-beam microscope method
• GB/T 26295-2010 Carbonaceous materials used in the production of aluminium.Prebaked anodes and cathode blocks.Determination of flexural strength by the four-point method
• GB/T 8014.1-2005 Anodizing of aluminium and its alloys-The measuring method of thickness of anodic oxide coatings Part 1:The measuring principle
• GB/T 8014.2-2005 Anodizing of aluminium and its alloys-The measuring method of thickness of anodic oxide coatings Part2:Mass-loss method
• GB/T 6589-2002 Semiconductor devices discrete devices Part 3-2: Signal (including switching) and regulator diodes blank detail specification for voltage-regulator diodes and voltage-reference diodes (excluding temperature-compensated precision reference diodes)

Hebei Provincial Standard of the People's Republic of China, Electrode Piece Thickness

• DB13/T 1513-2012 Battery pole piece rolling equipment

Korean Agency for Technology and Standards (KATS), Electrode Piece Thickness

• KS D ISO 2177-2002(2022) Measurement of coating thickness - Coulometric method by anodic dissolution
• KS D ISO 2177-2002(2017) Measurement of coating thickness - Coulometric method by anodic dissolution
• KS D ISO 2128-2011(2016) Anodizing of aluminium and its alloys－Determination of thickness of anodic oxidation coatings－Non-destructive measurement by split-beam microscope
• KS D ISO 2128-2011(2021) Anodizing of aluminium and its alloys－Determination of thickness of anodic oxidation coatings－Non-destructive measurement by split-beam microscope
• KS D ISO 2177:2002 Measurement of coating thickness - Coulometric method by anodic dissolution
• KS D 8310-2001(2016) Anodizing of aluminium and its alloys－Determination of mass per unit area(surface density) of anodic oxide coatings(gravimetric method) and determination of thickness of anodic oxide coatings(non-dest
• KS D 8310-2001(2021) Anodizing of aluminium and its alloys－Determination of mass per unit area(surface density) of anodic oxide coatings(gravimetric method) and determination of thickness of anodic oxide coatings(non-dest
• KS D ISO 2128:2011 Anodizing of aluminium and its alloys－Determination of thickness of anodic oxidation coatings－Non-destructive measurement by split-beam microscope
• KS B ISO 5829:2002 Resistance spot welding－Electrode adaptors, female taper 1：10
• KS B ISO 5183-2:2004 Resistance spot welding－Electrode adaptors, male taper 1：10－Part 2：Parallel shank fixing for end-thrust electrodes
• KS B ISO 1089-2003(2018) Electrode taper fits for spot welding equipment－Dimensions
• KS C ISO 12145:2001 Resistance welding equipment-Angles for mountingspot welding electrodes
• KS B ISO 5829:2022 Resistance spot welding — Electrode adaptors, female taper 1：10
• KS C ISO 12145:2013 Resistance welding equipment－Angles for mountingspot welding electrodes
• KS D 8312-1978 Test method for resistance to cracking by deforming of anodic oxidation coatings on aluminium and aluminium alloys
• KS B 0892-1971 Method of deposition rate measurement
• KS C ISO 8430-1-2016(2021) Resistance spot welding－Electrode holders－Part 1：Taper fixing 1：10
• KS C ISO 8430-2-2016(2021) Resistance spot welding－Electrode holders－Part 2：Morse taper fixing
• KS C 2712-2001 Test methods of negative temperature coefficient thermistor
• KS C IEC 60747-3-2:2006 Semiconductor devices－Discrete devices－Part 3：Signal (including switching) and regulator diodes－Section Two：Blank detail specification for voltage-regulator diodes and voltage-reference diodes, excluding temperature-compensated precision reference diodes
• KS B ISO 18276:2006 Welding consumables-Tubular cored electrodes for gas-shielded and non-gas-shielded metal arc welding of high-strength steels-Classification
• KS B ISO 18276:2016 Welding consumables－Tubular cored electrodes for gas-shielded and non-gas-shielded metal arc welding of high-strength steels－Classification
• KS C IEC 60724:2005 Short－circuit temperature limits of electric cables with rated voltages of 1 kV(Um＝1.2 kV) and 3 kV(Um＝3.6 kV)
• KS C ISO 8430-1:2001 Resistance spot welding-Electrode holders-Part 1:Taper fixing 1:10
• KS C ISO 8430-1:2016 Resistance spot welding－Electrode holders－Part 1：Taper fixing 1：10

IT-UNI, Electrode Piece Thickness

• UNI EN ISO 20168:2021 Resistance welding - Locking tapers for electrode holders and electrode caps
• UNI 7796-1977
• UNI EN ISO 5829:2021 Resistance spot welding - Electrode adaptors, female taper 1:10

FI-SFS, Electrode Piece Thickness

• SFS-ISO 2177:1986 n case of interpretation disputes the English text applies

Defense Logistics Agency, Electrode Piece Thickness

• DLA SMD-5962-88598 REV A-1990 MICROCIRCUITS, DIGITAL, BIPOLAR CLOCK GENERATOR/MICROCYCLE LENGTH CONTROLLER, MONOLITHIC SILICON
• DLA MIL-M-38510/150 D VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, TTL, Magnitude Comparators, Monolithic Silicon
• DLA SMD-5962-88605 REV B-2001 MICROCIRCUIT, DIGITAL, BIPOLAR HIGH PERFORMANCE 10-BIT BUFFER, MONOLITHIC SILICON
• DLA MIL-M-38510/82 C VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, Schottky TTL, Magnitude Comparators, Monolithic Silicon
• DLA SMD-5962-88677 REV C-2009 MICROCIRCUIT, DIGITAL, 4-BIT BIPOLAR MICROPROCESSOR SLICE, MONOLITHIC SILICON
• DLA DSCC-DWG-04052-2006 CAPACITOR, FIXED, MULTIPLE ANODE POLYMER TANTALUM CHIP
• DLA MIL-M-38510/10 D VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, TTL, Decoders Monolithic Silicon
• DLA MIL-M-38510/13 G VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, TTL, Counters Monolithic Silicon
• DLA SMD-5962-86727 REV B-2011 MICROCIRCUIT, DIGITAL, BIPOLAR, BCD COUNTER MONOLITHIC SILICON
• DLA MIL-M-38510/161 A-2005 MICROCIRCUITS, DIGITAL, BIPOLAR, TTL, COMMON OR GATES, MONOLITHIC SILICON
• DLA SMD-5962-87791 REV B-1989 MICROCIRCUITS, DIGITAL, BIPOLAR, FIRST-IN FIRST-OUT (FIFO), MONOLITHIC SILICON
• DLA MIL-M-38510/3 G VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, TTL, Nand Buffers Monolithic Silicon
• DLA MIL-M-38510/503 B VALID NOTICE 4-2010 Microcircuits, Digital, Bipolar, Programmable Logic, Monolithic Silicon
• DLA MIL-M-38510/505 C VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar Programmable Logic, Monolithic Silicon
• DLA SMD-5962-86715 REV C-2011 MICROCIRCUITS, DIGITAL, BIPOLAR, D-TYPE REGISTER, MONOLITHIC SILICON
• DLA SMD-5962-86728 REV B-2011 MICROCIRCUIT, DIGITAL, BIPOLAR, HIGH SPEED REGISTER, MONOLITHIC SILICON
• DLA SMD-5962-87755 REV C-2011 MICROCIRCUIT, DIGITAL, BIPOLAR, BUFFERED REGISTERS, MONOLITHIC SILICON
• DLA MIL-M-38510/3 G (1)-2012 MICROCIRCUITS, DIGITAL, BIPOLAR, TTL, NAND BUFFERS MONOLITHIC SILICON
• DLA SMD-5962-87683 REV D-2013 MICROCIRCUIT, DIGITAL, BIPOLAR ALS TTL, DECODER, MONOLITHIC SILICON
• DLA SMD-5962-95567 REV A-2002 MICROCIRCUIT, LINEAR, CLOSED LOOP HIGH SPEED BUFFER, MONOLITHIC SILICON
• DLA SMD-5962-96843 REV D-2008 MICROCIRCUIT, LINEAR, VOLTAGE REFERENCE DIODE, 1.2 VOLTS, MONOLITHIC SILICON
• DLA MIL-M-38510/210 F-2013 MICROCIRCUIT, DIGITAL, 16,384 BIT SCHOTTKY, BIPOLAR, PROGRAMMABLE READ-ONLY MEMORY (PROM), MONOLITHIC SILICON
• DLA SMD-5962-85065 REV A-1988 MICROCIRCUITS, DIGITAL, BIPOLAR, PROGRAMMABLE, LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-87755 REV B-2005 MICROCIRCUIT, DIGITAL, BIPOLAR, BUFFERED REGISTERS, MONOLITHIC SILICON
• DLA SMD-5962-88515-1988 MICROCIRCUITS, DIGITAL, BIPOLAR, PROGRAMMABLE LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-89930 REV C-2003 MICROCIRCUIT, LINEAR, DUAL POLARITY TRACKING VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-88604 REV B-2007 MICROCIRCUIT, DIGITAL, BIPOLAR, BIDIRECTIONAL TRANSCEIVERS, MONOLITHIC SILICON
• DLA SMD-5962-88666-1988 MICROCIRCUITS, DIGITAL, BIPOLAR, INTERRUPT HANDLER, MONOLITHIC SILICON
• DLA SMD-5962-88763-1990 MICROCIRCUIT, LINEAR, DUAL-POLARITY TRACKING VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-89549-1989 MICROCIRCUITS, DIGITAL, BIPOLAR, PIPELINE REGISTER WITH SHADOW REGISTER, MONOLITHIC SILICON
• DLA SMD-5962-86023 REV D-2011 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR 256-BIT RAM, MONOLITHIC SILICON
• DLA SMD-5962-86051 REV D-2011 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR 64-BIT RAM, MONOLITHIC SILICON
• DLA MIL-M-38510/9 E VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar TTL, Shift Registers, Monolithic Silicon
• DLA SMD-5962-86725 REV B-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, OCTAL BUFFER, MONOLITHIC SILICON
• DLA MIL-M-38510/22 D VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, High-Speed TTL, Flip-Flops, Monolithic Silicon
• DLA MIL-M-38510/80 F VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, Schottky TTL, and Gates, Monolithic Silicon
• DLA SMD-5962-78015 REV J-2010 MICROCIRCUIT, DIGITAL, BIPOLAR, MEMORY, 64-BIT RAM, MONOLITHIC SILICON
• DLA SMD-5962-88763 REV A-2010 MICROCIRCUIT, LINEAR, DUAL POLARITY TRACKING VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-89930 REV D-2011 MICROCIRCUIT, LINEAR, DUAL POLARITY TRACKING VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-89930 REV E-2013 MICROCIRCUIT, LINEAR, DUAL POLARITY TRACKING VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-78019 REV E-2006 MICROCIRCUIT, LINEAR, DUAL, HIGH SPEED, VOLTAGE COMPARATOR, MONOLITHIC SILICON
• DLA MIL-M-38510/211 (1)-2012 MICROCIRCUITS, DIGITAL, 32,768 BIT SCHOTTKY, BIPOLAR, PROGRAMMABLE READ-ONLY MEMORY (PROM), MONOLITHIC SILICON
• DLA SMD-5962-88589 REV D-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW POWER SCHOTTKY TTL, POSITIVE NAND GATE, MONOLITHIC SILICON
• DLA DSCC-DWG-89085 REV C-2006 CAPACITORS, FIXED, ELECTROLYTIC POLARIZED, ALUMINUM OXIDE, SNAP MOUNT, LOW PROFILE
• DLA SMD-5962-97548 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, SYNCHRONOUS 4-BIT COUNTER, MONOLITHIC SILICON
• DLA SMD-5962-81035 REV E-1988 MICROCIRCUITS, DIGITAL, BIPOLAR, PROGRAMMABLE LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-78017 REV G-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, MICROPROGRAM CONTROLLER, MONOLITHIC SILICON
• DLA SMD-5962-87769 REV A-2001 MICROCIRCUIT, DIGITAL, BIPOLAR, DUAL LINE DRIVERS, MONOLITHIC SILICON
• DLA SMD-5962-87772-1988 MICROCIRCUITS, DIGITAL, BIPOLAR, REGISTERED TRANSCEIVER, MONOLITHIC SILICON
• DLA SMD-5962-98640 REV B-2009 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, 15 VOLT, POSITIVE, FIXED, MONOLITHIC SILICON
• DLA SMD-5962-98641 REV B-2009 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, 15 VOLT, NEGATIVE, FIXED, MONOLITHIC SILICON
• DLA SMD-5962-98642 REV B-2009 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, 5 VOLT, NEGATIVE, FIXED, MONOLITHIC SILICON
• DLA SMD-5962-98642 REV C-2012 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, 5 VOLT, NEGATIVE, FIXED, MONOLITHIC SILICON
• DLA SMD-5962-98643 REV C-2012 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, 5 VOLT, POSITIVE, FIXED, MONOLITHIC SILICON
• DLA SMD-5962-91523 REV C-2013 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, POSITIVE, 20 V FIXED, MONOLITHIC SILICON
• DLA SMD-5962-87671 REV F-2008 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, PROGRAMMING LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-86714 REV C-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, QUAD BUS TRANSCEIVER, MONOLITHIC SILICON
• DLA MIL-M-38510/25 E VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, TTL, Low Power, Counters, Monolithic Silicon
• DLA MIL-M-38510/21 F VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, TTL, Low Power, Flip-Flops, Monolithic Silicon
• DLA SMD-5962-87534 REV D-2011 MICROCIRCUITS, DIGITAL, BIPOLAR, QUAD BUS TRANSCEIVER, MONOLITHIC SILICON
• DLA SMD-5962-87657 REV D-2012 MICROCIRCUIT, LINEAR, BIPOLAR, RF/IF AMPLIFIER WITH AGC, MONOLITHIC SILICON
• DLA DSCC-DWG-13008-2013 CAPACITORS, FIXED, MULTIPLE ANODE TANTALUM, CHIP, CONFORMAL COATED CASE
• DLA SMD-5962-94676 REV F-2005 MICROCIRCUIT, LINEAR, CURRENT FEEDBACK AMPLIFIER, ULTRA HIGH SPEED, MONOLITHIC SILICON
• DLA SMD-5962-96756 REV B-2007 MICROCIRCUIT, LINEAR, RADIATION HARDENED, ULTRA HIGH SPEED, CURRENT FEEDBACK AMPLIFIER WITH OFFSET ADJUST, MONOLITHIC SILICON
• DLA SMD-5962-00516 REV B-2002 MICROCIRCUIT, LINEAR, POSITIVE 5-VOLT ADJUSTABLE PRECISION VOLTAGE REFERENCE, MONOLITHIC SILICON
• DLA SMD-5962-95527-1994 MICROCIRCUIT, LINEAR, 7-CHANNEL COMMON-SOURCE POWER DMOS ARRAY, MONOLITHIC SILICON
• DLA SMD-5962-89479 REV C-2002 MICROCIRCUIT, LINEAR, POSITIVE 10-VOLT ADJUSTABLE PRECISION VOLTAGE REFERENCE, MONOLITHIC SILICON
• DLA SMD-5962-97572 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, QUADRUPLE 2-INPUT EXCLUSIVE-OR GATES, MONOLITHIC SILICON
• DLA MIL-E-19122 A VALID NOTICE 3-2006 ELECTRODES, CARBON, LIGHTING, HIGH-INTENSITY SEARCHLIGHT SERVICE
• DLA MIL-E-19122 A NOTICE 2-1999 ELECTRODES, CARBON, LIGHTING, HIGH-INTENSITY SEARCHLIGHT SERVICE
• DLA MIL-E-19122 A NOTICE 1-1988 ELECTRODES, CARBON, LIGHTING, HIGH-INTENSITY SEARCHLIGHT SERVICE
• DLA MIL-E-19122 A-1973 ELECTRODES, CARBON, LIGHTING, HIGH-INTENSITY SEARCHLIGHT SERVICE
• DLA SMD-5962-84129 REV E-2004 MICROCIRCUITS, MEMORY, DIGITAL, BIPOLAR, PROGRAMMABLE LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-88507 REV A-2001 MICROCIRCUIT, DIGITAL, BIPOLAR, FIELD PROGRAMMABLE SEQUENCER (FPLS), MONOLITHIC SILICON
• DLA SMD-5962-88581 REV A-2006 MICROCIRCUIT, LINEAR, BIPOLAR HEX NTDS DRIVER, MONOLITHIC SILICON
• DLA SMD-5962-88582 REV B-2006 MICROCIRCUIT, LINEAR, BIPOLAR HEX NTDS RECEIVER, MONOLITHIC SILICON
• DLA SMD-5962-98647 REV B-2010 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, POSITIVE, ADJUSTABLE, LOW DROPOUT, MONOLITHIC SILICON
• DLA SMD-5962-98648 REV B-2011 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, POSITIVE, ADJUSTABLE, LOW DROPOUT, MONOLITHIC SILICON
• DLA SMD-5962-98650 REV B-2011 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, POSITIVE, ADJUSTABLE, LOW DROPOUT, MONOLITHIC SILICON
• DLA SMD-5962-98649 REV C-2012 MICROCIRCUIT, LINEAR, VOLTAGE REGULATOR, POSITIVE, ADJUSTABLE, LOW DROPOUT, MONOLITHIC SILICON
• DLA SMD-5962-02524 REV G-2013 MICROCIRCUIT, LINEAR, POSITIVE, ADJUSTABLE, LOW DROPOUT, VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-81036 REV M-2010 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, PROGRAMMABLE LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-88541 REV C-2010 MICROCIRCUITS, MEMORY, DIGITAL, BIPOLAR, 512 X 4-BIT PROM, MONOLITHIC SILICON
• DLA SMD-5962-87791 REV D-2012 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, FIRST-IN FIRST-OUT (FIFO), MONOLITHIC SILICON
• DLA SMD-5962-87788 REV E-2013 MICROCIRCUIT, MEMORY, DIGITAL 256 X 4-BIT, BIPOLAR PROM, MONOLITHIC SILICON
• DLA SMD-5962-03202 REV A-2008 MICROCIRCUIT, MEMORY, DIGITAL, 1024 X 8-BIT BIPOLAR PROM, MONOLITHIC SILICON
• DLA SMD-5962-03203 REV A-2008 MICROCIRCUIT, MEMORY, DIGITAL, 2048 X 8-BIT BIPOLAR PROM, MONOLITHIC SILICON
• DLA SMD-5962-84129 REV F-2009 MICROCIRCUITS, MEMORY, DIGITAL, BIPOLAR, PROGRAMMABLE LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-87791 REV C-2010 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, FIRST-IN FIRST-OUT (FIFO), MONOLITHIC SILICON
• DLA MIL-M-38510/333 C VALID NOTICE 1-2008 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Nor Gates, Monolithic Silicon
• DLA SMD-5962-88605 REV C-2008 MICROCIRCUIT, DIGITAL, BIPOLAR HIGH PERFORMANCE 10-BIT BUFFER, MONOLITHIC SILICON
• DLA SMD-5962-87542 REV C-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, THREE-STATE PRIORITY ENCODER, MONOLITHIC SILICON
• DLA SMD-5962-86713 REV B-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, 8-BIT EQUAL-TO COMPARATOR, MONOLITHIC SILICON
• DLA MIL-M-38510/75 C VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, SCHOTTKY TTL, Exclusive or Gates, Monolithic Silicon
• DLA SMD-5962-86868 REV C-2011 MICROCIRCUITS, DIGITAL, BIPOLAR, OCTAL BUS TRANSCEIVERS, MONOLITHIC SILICON
• DLA MIL-M-38510/600 VALID NOTICE 4-2012 Microcircuits, Digital, Bipolar, Semicustom (Gate Array) Devices, Monolithic Silicon
• DLA MIL-M-38510/333 C VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Nor Gates, Monolithic Silicon
• DLA SMD-5962-89520 REV D-2008 MICROCIRCUIT, LINEAR, ADJUSTABLE POSITIVE, LOW DROPOUT, VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-89521 REV F-2008 MICROCIRCUIT, LINEAR, ADJUSTABLE, POSITIVE, LOW DROPOUT, VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-88646 REV G-2008 MICROCIRCUIT, LINEAR, ADJUSTABLE, POSITIVE, LOW DROPOUT, VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-89748 REV A-2005 MICROCIRCUITS, DIGITAL, BIPOLAR, LOW POWER SCHOTTKY TTL, OCTAL BUS TRANSCEIVERS, OPEN COLLECTOR OUTPUTS, MONOLITHIC SILICON
• DLA SMD-5962-90563 REV B-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, OCTAL BUFFER AND LINE DRIVER WITH OPEN-COLLECTOR OUTPUTS, MONOLITHIC SILICON
• DLA SMD-5962-97577 REV A-2006 MICROCIRCUITS, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, QUADRUPLE 2-INPUT POSITIVE-NAND GATES, MONOLITHIC SILICON
• DLA SMD-5962-97578 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, QUADRUPLE 2-INPUT POSITIVE-NOR GATES, MONOLITHIC SILICON
• DLA SMD-5962-97579 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, TRIPLE 3-INPUT POSITIVE NAND GATE, MONOLITHIC SILICON
• DLA SMD-5962-89687 REV C-2004 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW-POWER SCHOTTKY, TTL, OCTAL BUS TRANSCEIVERS AND REGISTERS, WITH INVERTING THREE-STATE AND OPEN-COLLECTOR OUTPUTS, MONOLITHIC SILICON
• DLA SMD-5962-81036 REV L-2005 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, PROGRAMMABLE LOGIC, MONOLITHIC SILICON
• DLA SMD-5962-90513-1990 MICROCIRCUIT, DIGITAL, BIPOLAR, PARITY BUS TRANSCEIVERS, MONOLITHIC SILICON
• DLA SMD-5962-90538 REV D-2003 MICROCIRCUIT, LINEAR, QUAD SCHOTTKY DIODE ARRAY, MONOLITHIC SILICON
• DLA SMD-5962-90573-1991 MICROCIRCUIT, MEMORY, BIPOLAR, ECL PROGRAMMABLE LOGIC DEVICE, MONOLITHIC SILICON
• DLA SMD-5962-88696 REV A-1990 MICROCIRCUITS, DIGITAL BIPOLAR DYNAMIC MEMORY CONTROLLER MONOLITHIC SILICON
• DLA SMD-5962-93226 REV H-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, DUAL CHANNEL, BUS TRANSCEIVER, MONOLITHIC SILICON
• DLA MIL-M-38510/330 C VALID NOTICE 1-2008 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Nand Gates, Monolithic Silicon
• DLA MIL-M-38510/337 B VALID NOTICE 1-2008 Microcircuits, Digital, Bipolar, Advanced Schottky TTL, Decoders, Monolithic Silicon
• DLA SMD-5962-01507 REV A-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, HIGH-SPEED LOOK-AHEAD CARRY GENERATOR, MONOLITHIC SILICON
• DLA MIL-M-38510/12 J VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, TTL, Monostable Multivibrators, Monolithic Silicon
• DLA MIL-M-38510/81 D VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, Schottky TTL, Line Drivers, Monolithic Silicon
• DLA MIL-M-38510/74 C VALID NOTICE 1-2010 Microcircuits, Digital, Bipolar, Schottky TTL, and-or-Invert Gates, Monolithic Silicon
• DLA MIL-M-38510/310 D VALID NOTICE 2-2012 Microcircuits, Digital, Bipolar Low-Power Schottly TTL, and Gates Monolithic Silicon
• DLA MIL-M-38510/330 C VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Nand Gates, Monolithic Silicon
• DLA MIL-M-38510/337 B VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar, Advanced Schottky TTL, Decoders, Monolithic Silicon
• DLA SMD-5962-88550 REV D-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, EDGE TRIGGERED, D-TYPE FLIP-FLOP, MONOLITHIC SILICON
• DLA DSCC-VID-V62/12615 REV A-2012 MICROCIRCUIT, DIGITAL, EXTREME TEMPERATURE SINGLE PORT 10/100 MB/S ETHERNET PHYSICAL LAYER TRANSCEIVER, MONOLITHIC SILICON
• DLA SMD-5962-87767 REV B-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, OCTAL BUFFER AND LINE DRIVER WITH OPEN-COLLECTOR OUTPUTS, MONOLITHIC SILICON
• DLA SMD-5962-95574 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, TTL QUADRUPLE 2-INPUT POSITIVE-OR GATE, MONOLITHIC SILICON
• DLA SMD-5962-97547 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, LOW-POWER SCHOTTKY TTL, 4-BIT MAGNITUDE COMPARATORS, MONOLITHIC SILICON
• DLA SMD-5962-97553 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, TTL, MONOSTABLE MULTIVIBRATOR, MONOLITHIC SILICON
• DLA SMD-5962-97558 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, 8-INPUT POSITIVE-NAND GATES, MONOLITHIC SILICON
• DLA SMD-5962-02534 REV D-2006 MICROCIRCUIT, LINEAR, POSITIVE, FIXED, 2.5 V, LOW DROPOUT, VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-02535 REV D-2006 MICROCIRCUIT, LINEAR, POSITIVE, FIXED, 3.3 V, LOW DROPOUT, VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-02536 REV D-2006 MICROCIRCUIT, LINEAR, POSITIVE, FIXED, 5 V, LOW DROPOUT, VOLTAGE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-88550 REV C-2001 MICROCIRCUIT, DIGITAL, BIPOLAR, EDGE-TRIGGERED, D-TYPE FLIP-FLOP, MONOLITHIC SILICON
• DLA SMD-5962-88583 REV B-2006 MICROCIRCUIT LINEAR, BIPOLAR, HEX NTDS, FAST DRIVER, MONOLITHIC SILICON
• DLA SMD-5962-85065 REV B-2010 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, PROGRAMMABLE LOGIC ARRAY, MONOLITHIC SILICON
• DLA SMD-5962-87528 REV A-2011 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR PROGRAMMABLE LOGIC ARRAY, MONOLITHIC SILICON
• DLA SMD-5962-87530 REV A-2011 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR PROGRAMMABLE LOGIC ARRAY, MONOLITHIC SILICON
• DLA SMD-5962-85527 REV C-2010 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, 2K x 8-bit, REGISTERED PROM, MONOLITHIC SILICON
• DLA SMD-5962-87794 REV C-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, NOR DRIVER, MONOLITHIC SILICON
• DLA MIL-M-38510/345 C VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Exclusive or Gates, Monolithic Silicon
• DLA SMD-5962-87711 REV B-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, TTL, DUAL MONOSTABLE MULTIVIBRATOR, MONOLITHIC SILICON
• DLA MIL-M-38510/151 B VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, TTL, Schmitt-Trigger Nand Gates, Monolithic Silicon
• DLA SMD-5962-76020 REV H-2010 MICROCIRCUIT, DIGITAL, BIPOLAR LOW POWER SCHOTTKY TTL, NAND GATES, MONOLITHIC SILICON
• DLA MIL-M-38510/230 A VALID NOTICE 4-2010 Microcircuit, Digital, Bipolar 256 Bit Random Access Memory (RAM) Monolithic Silicon
• DLA SMD-5962-86726 REV C-2011 MICROCIRCUIT, DIGITAL, BIPOLAR, 12 INPUT PARITY CHECKER/GENERATOR, MONOLITHIC SILICON
• DLA MIL-M-38510/302 D VALID NOTICE 2-2012 Microcircuits, Digital, Bipolar Low-Power Schottky TTL, Buffers, Monolithic Silicon
• DLA MIL-M-38510/327 B VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar, Low-Power Schottky TTL, Counters, Monolithic Silicon
• DLA MIL-M-38510/345 C VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Exclusive or Gates, Monolithic Silicon
• DLA SMD-5962-87767 REV A-2001 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, OCTAL BUFFER AND LINE DRIVER WITH OPEN-COLLECTOR OUTPUTS, MONOLITHIC SILICON
• DLA SMD-5962-76018 REV H-2005 MICROCIRUIT, DIGITAL, BIPOLAR, LOW-POWER SCHOTTKY TTL, LATCH, MONOLITHIC SILICON
• DLA SMD-5962-76032 REV E-2005 MICROCIRCUIT, DIGITAL, BIPOLAR LOW POWER SCHOTTKY TTL, COUNTER, MONOLITHIC SILICON
• DLA SMD-5962-76036 REV E-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, LOW POWER SCHOTTKY TTL, COUNTER, MONOLITHIC SILICON
• DLA SMD-5962-77001 REV G-2005 MICROCIRCUIT, DIGITAL, BIPOLAR, LOW-POWER SCHOTTKY TTL, COUNTER, MONOLITHIC SILICON
• DLA SMD-5962-77010 REV G-2005 MICROCIRCUIT, DIGITAL, LOW POWER SCHOTTKY TTL, COUNTER, MONOLITHIC SILICON
• DLA SMD-5962-00523 REV F-2006 MICROCIRCUIT, LINEAR, RADIATION HARDENED, 2.5 V SHUNT DIODE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-88504 REV D-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, FIELD PROGRAMMABLE, LOGIC ARRAY (FPLA), MONOLITHIC SILICON
• DLA SMD-5962-92319 REV A-2004 MICROCIRCUIT, DIGITAL, BIPOLAR, LOW POWER SCHOTTKY TTL, EXCLUSIVE-OR GATE, MONOLITHIC SILICON
• DLA SMD-5962-86025 REV F-2011 MICROCIRCUITS, MEMORY, DIGITAL, BIPOLAR, 16-WORD BY 4-BIT, 2-PORT, RAM, MONOLITHIC SILICON
• DLA SMD-5962-90573 REV A-2012 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, ECL, PROGRAMMABLE LOGIC DEVICE, MONOLITHIC SILICON
• DLA SMD-5962-88731 REV B-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, HEX DRIVERS, MONOLITHIC SILICON
• DLA SMD-5962-95580 REV B-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, TTL, DATA SELECTORS/MULTIPLEXERS, MONOLITHIC SILICON
• DLA MIL-M-38510/332 C VALID NOTICE 1-2008 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Octal Buffers, Monolithic Silicon
• DLA MIL-M-38510/334 C VALID NOTICE 1-2008 MICROCIRCUITS, DIGITAL, BIPOLAR ADVANCED SCHOTTKY TTL, AND-OR-INVERT GATES, MONOLITHIC SILICON
• DLA SMD-5962-86836 REV D-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW POWER SCHOTTKY TTL, OR GATES, MONOLITHIC SILICON
• DLA MIL-M-38510/349 B VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Parity Checker, Monolithic Silicon
• DLA SMD-5962-87595 REV C-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, BUS TRANSCEIVER, MONOLITHIC SILICON
• DLA MIL-M-38510/375 A VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, Advanced Low Power-Schottky TTL, or Gates, Monolithic Silicon
• DLA SMD-5962-88752 REV D-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, HEX INVERTER, MONOLITHIC SILICON
• DLA SMD-5962-88707 REV D-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, PI-BUS TRANSCEIVER, MONOLITHIC SILICON
• DLA SMD-5962-00520 REV E-2010 MICROCIRCUIT, DIGITAL-LINEAR, RADIATION HARDENED, 8-CHANNEL SOURCE DRIVER, MONOLITHIC SILICON
• DLA MIL-M-38510/332 C VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Octal Buffers, Monolithic Silicon
• DLA MIL-M-38510/334 C VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar Advanced Schottky TTL, and-or-Invert Gates, Monolithic Silicon
• DLA SMD-5962-00520 REV F-2013 MICROCIRCUIT, DIGITAL-LINEAR, RADIATION HARDENED, 8-CHANNEL SOURCE DRIVER, MONOLITHIC SILICON
• DLA MIL-M-38510/349 B VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar Advanced Schottky TTL, Parity Checker, Monolithic Silicon
• DLA SMD-5962-00523 REV G-2008 MICROCIRCUIT, LINEAR, RADIATION HARDENED, 2.5 V SHUNT DIODE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-00523 REV J-2010 MICROCIRCUIT, LINEAR, RADIATION HARDENED, 2.5 V SHUNT DIODE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-00523 REV K-2011 MICROCIRCUIT, LINEAR, RADIATION HARDENED, 2.5 V SHUNT DIODE REGULATOR, MONOLITHIC SILICON
• DLA SMD-5962-94677 REV A-2002 MICROCIRCUIT, LINEAR, CURRENT FEEDBACK AMPLIFIER, ULTRA HIGH SPEED, OUTPUT CLAMPING, MONOLITHIC SILICON
• DLA SMD-5962-97560 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, QUAD 2-INPUT POSITIVE-OR GATES, MONOLITHIC SILICON
• DLA SMD-5962-97561 REV A-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, TRIPLE 3-INPUT POSITIVE AND GATES, MONOLITHIC SILICON
• DLA SMD-5962-81023 REV L-2006 MICROCIRCUIT, LINEAR, BI-FET OPERATIONAL AMPLIFIERS, MONOLITHIC SILICON
• DLA SMD-5962-01507-2001 MICROCIRCUIT, DIGITAL, BIPOLAR, HIGH-SPEED LOOK-AHEAD CARRY GENERATOR, MONOLITHIC SILICON
• DLA SMD-5962-89558 REV A-2005 MICROCIRCUITS, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, TRANSCEIVERS/REGISTERS, MONOLITHIC SILICON
• DLA SMD-5962-88555 REV C-2001 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, D-TYPE REGISTER, MONOLITHIC SILICON
• DLA SMD-5962-88698 REV D-2006 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW POWER SCHOTTKY TTL, SYNCHRONOUS 4-BIT UP/DOWN COUNTER, MONOLITHIC SILICON
• DLA SMD-5962-88707 REV C-1992 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, PI-BUS TRANSCEIVER, MONOLITHIC SILICON
• DLA SMD-5962-89525 REV B-2004 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, BUS INTERFACE FLIP-FLOP, MONOLITHIC SILICON
• DLA SMD-5962-91761 REV A-2008 MICROCIRCUIT, DIGITAL, ECL, TWO MODULUS DIVIDER, 200 MHz ?10/11, MONOLITHIC SILICON
• DLA SMD-5962-88507 REV B-2011 MICROCIRCUIT, MEMORY, DIGITAL, BIPOLAR, FIELD PROGRAMMABLE SEQUENCER (FPLS), MONOLITHIC SILICON
• DLA MIL-M-38510/202 B VALID NOTICE 3-2010 Microcircuits, Digital, 1024 Bit Bipolar Programmable Read-Only Memory (P-ROM), Monolithic Silicon
• DLA SMD-5962-95583 REV B-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, TTL, PARALLEL-LOAD 8-BIT SHIFT REGISTERS, MONOLITHIC SILICON
• DLA MIL-M-38510/329 B VALID NOTICE 1-2008 Microcircuits, Digital, Bipolar, Low-Power Schottky TTL, Parity Checker, Monolithic Silicon
• DLA MIL-M-38510/338 B VALID NOTICE 1-2008 Microcircuits, Digital, Bipolar, Advanced Schottky TTL, Arithmetic Logic Units,Monolithic Silicon
• DLA SMD-5962-88555 REV D-2008 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, D-TYPE REGISTER, MONOLITHIC SILICON
• DLA SMD-5962-86838 REV D-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW-POWER SCHOTTKY TTL, NOR GATES, MONOLITHIC SILICON
• DLA MIL-M-38510/341 F VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, Advanced, Schottky TTL, Flip-Flops, Cascadable, Monolithic Silicon
• DLA MIL-M-38510/343 B VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, Advanced Schottky TTL, Binary Counters, Monolithic Silicon
• DLA MIL-M-38510/344 A VALID NOTICE 1-2009 Microcircuits, Digital, Bipolar, Advanced Schottky TTL, Decade Counters, Monolithic Silicon
• DLA SMD-5962-76037 REV G-2009 MICROCIRCUIT, DIGITAL, BIPOLAR, LOW-POWER SCHOTTKY TTL, MULTIPLEXER, MONOLITHIC SILICON
• DLA SMD-5962-88709 REV A-2010 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, 2-INPUT NOR GATES, MONOLITHIC SILICON
• DLA SMD-5962-88712 REV A-2010 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, 8-BIT IDENTITY COMPARATOR, MONOLITHIC SILICON
• DLA SMD-5962-86840 REV F-2011 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW-POWER SCHOTTKY TTL, COUNTER, MONOLITHIC SILICON
• DLA SMD-5962-88774 REV C-2011 MICROCIRCUITS, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, DUAL AND-OR-INVERT GATE, MONOLITHIC SILICON
• DLA SMD-5962-89438 REV B-2012 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY, TTL, 10-NONINVERTING REGISTER, MONOLITHIC SILICON
• DLA SMD-5962-89558 REV B-2012 MICROCIRCUITS, DIGITAL, BIPOLAR, ADVANCED SCHOTTKY TTL, TRANSCEIVERS/REGISTERS, MONOLITHIC SILICON
• DLA SMD-5962-86844 REV E-2013 MICROCIRCUITS, DIGITAL, BIPOLAR, ADVANCED LOW POWER SCHOTTKY TTL, NOR GATES, MONOLITHIC SILICON
• DLA SMD-5962-86865 REV E-2013 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW POWER SCHOTTKY TTL, NAND GATE, MONOLITHIC SILICON
• DLA SMD-5962-86866 REV D-2013 MICROCIRCUIT, DIGITAL, BIPOLAR, ADVANCED LOW POWER SCHOTTKY TTL, DECODER, MONOLITHIC SILICON
• DLA MIL-M-38510/329 B VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar, Low-Power Schottky TTL, Parity Checker, Monolithic Silicon
• DLA SMD-5962-87544 REV D-2013 MICROCIRCUIT, DIGITAL, BIPOLAR SYNCHRONOUS FOUR-BIT BINARY UP-DOWN COUNTER, MONOLITHIC SILICON
• DLA MIL-M-38510/341 F VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar, Advanced, Schottky TTL, Flip-Flops, Cascadable, Monolithic Silicon
• DLA MIL-M-38510/343 B VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar, Advanced Schottky TTL, Binary Counters, Monolithic Silicon
• DLA MIL-M-38510/344 A VALID NOTICE 2-2013 Microcircuits, Digital, Bipolar, Advanced Schottky TTL, Decade Counters, Monolithic Silicon

Group Standards of the People's Republic of China, Electrode Piece Thickness

• T/SSEA 0202-2022 Lithium battery pole piece rolling mill roll
• T/CEMIA 028-2022 Specification for surface electrode paste for chip resistors
• T/CEMIA 027-2022 Specification for back electrode paste for chip resistors
• T/HBZXL 011-2023 Technical specification for roller press of battery electrode
• T/ZZB 1912-2020 Nickel powder for electrode of multi-layer ceramic capacitor
• T/CAS 455-2020 Automatic pole blade scraping machine for Lithium-ion battery
• T/QGCML 030-2020 Conventional Electrical Standards for Diode Diffusion Sheets
• T/SSEA 0201-2022 Roll blanks for lithium battery pole piece rolling mill rolls
• T/COEMA 004LCD-2022 Polarizer film for the Organic Light-Emitting Diode TV Display
• T/DZJN 114-2022 Technical specification for recycling waste lithium-ion battery pole piece materials
• T/WHAS 050-2023 Clamp sheet of bipolar electric coagulation tweezer mold forming production specifications
• T/CSTM 00461-2022 Test method for electrode peel strength of crystalline silicon PV cells

German Institute for Standardization, Electrode Piece Thickness

• DIN EN ISO 20168:2021-03 Resistance welding - Locking tapers for electrode holders and electrode caps (ISO 20168:2016); German version EN ISO 20168:2021
• DIN EN ISO 2177:2004 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution (ISO 2177:2003); German version EN ISO 2177:2004
• DIN EN ISO 2177:2004-08 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution (ISO 2177:2003); German version EN ISO 2177:2004
• DIN EN ISO 2128:2010-12 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope (ISO 2128:2010); German version EN ISO 2128:2010
• DIN EN ISO 5829:2021-03 Resistance spot welding - Electrode adaptors, female taper 1:10 (ISO 5829:1984); German version EN ISO 5829:2021
• DIN ISO 1089:1985 Electrode taper fits for spot welding equipment; dimensions; identical with ISO 1089, edition 1980
• DIN 16196:1991 Dial indicating thermometers with electrical limit contact devices; filled system thermometers and bimetallic-thermometers
• DIN 16196:2015 Dial indicating thermometers with electrical limit contact devices - Filled system thermometers and bimetallic thermometers
• DIN 16196:2013 Dial indicating thermometers with electrical limit contact devices - Filled system thermometers and bimetallic thermometers
• DIN 50022:2007 Metallic and other inorganic coatings - Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP Test)
• DIN EN 12373-3:1999 Aluminium and aluminium alloys - Anodizing - Part 3: Determination of thickness of anodic oxidation coatings; non-destructive measurement by split-beam-microscope; German version EN 12373-3:1998
• DIN EN ISO 5183-2:2002-03 Resistance spot welding - Electrode adaptors, male taper 1:10 - Part 2: Parallel shank fixing for end-thrust electrodes (ISO 5183-2:2000); German version EN ISO 5183-2:2002
• DIN EN ISO 16866:2023-01 Metallic and other inorganic coatings - Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test) (ISO 16866:2020); German version EN ISO 16866:2022
• DIN EN ISO 2128:2010 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope (ISO 2128:2010); German version EN ISO 2128:2010
• DIN EN 2996-006:2023-06 Aerospace series - Circuit breakers, three-poles, temperature compensated, rated currents 1 A to 25 A - Part 006:6,3 mm & 2,8 mm blade terminal - With polarized signal contact - Product standard; German version ASD-STAN prEN 2996-006:2023 / Note: D...
• DIN EN ISO 16866:2023 Metallic and other inorganic coatings - Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test) (ISO 16866:2020)
• DIN EN 28430-2:1992 Resistance spot welding; electrode holders; part 2: Morse taper fixing (ISO 8430-2:1988); german version EN 28430-2:1992
• DIN EN 28430-1:1992 Resistance spot welding; electrode holders; part 1: taper fixing 1:10 (ISO 8430-1:1988); german version EN 28430-1:1992
• DIN EN ISO 8430-2:2016-12 Resistance spot welding - Electrode holders - Part 2: Morse taper fixing (ISO 8430-2:2016); German version EN ISO 8430-2:2016
• DIN EN ISO 8430-1:2016-12 Resistance spot welding - Electrode holders - Part 1: Taper fixing 1:10 (ISO 8430-1:2016); German version EN ISO 8430-1:2016
• DIN EN ISO 1089:2022-10 Resistance welding equipment - Electrode taper fits for spot welding equipment - Dimensions (ISO/DIS 1089:2022); German and English version prEN ISO 1089:2022 / Note: Date of issue 2022-09-09*Intended as replacement for DIN ISO 1089 (1985-10).
• DIN EN ISO 18276:2006 Welding consumables - Tubular cored electrodes for gas-shielded and non-gas-shielded metal arc welding of high strength steels - Classification (ISO 18276:2005); English version of DIN EN ISO 18276:2006-09
• DIN EN 2995-006:2023-06 Aerospace series - Circuit breakers, single-pole, temperature compensated, rated currents 1 A to 25 A - Part 006:6,3 mm & 2,8 mm blade terminal with polarized signal contact - Product standard; German version ASD-STAN prEN 2995-006:2023 / Note: Dat...

ES-UNE, Electrode Piece Thickness

• UNE-EN ISO 20168:2021 Resistance welding - Locking tapers for electrode holders and electrode caps (ISO 20168:2016)
• UNE-EN ISO 5829:2021 Resistance spot welding - Electrode adaptors, female taper 1:10 (ISO 5829:1984)
• UNE-EN 16866:2018 Metallic and other inorganic coatings - Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test)
• UNE-EN ISO 8430-2:2016 Resistance spot welding - Electrode holders - Part 2: Morse taper fixing (ISO 8430-2:2016)
• UNE-EN ISO 8430-1:2016 Resistance spot welding - Electrode holders - Part 1: Taper fixing 1:10 (ISO 8430-1:2016)

Danish Standards Foundation, Electrode Piece Thickness

• DS/ISO 2177:1986 Metallic coatings. Measurement of coating thickness. Coulometric method by anodic dissolution
• DS/EN ISO 20168:2021 Resistance welding – Locking tapers for electrode holders and electrode caps (ISO 20168:2016)
• DS/EN ISO 2177:2004 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution
• DS/EN ISO 2128:2010 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope
• DS/EN ISO 5183-2:2002 Resistance spot welding - Electrode adaptors, male taper 1:10 - Part 2: Parallel shank fixing for end-thrust electrodes
• DS/EN 21089:1992 Electrode taper fits for spot welding equipment. Dimensions
• DS/EN ISO 5829:2021 Resistance spot welding – Electrode adaptors, female taper 1:10 (ISO 5829:1984)
• DS/IEC 747-3-2:1987 Semiconductor devices. Discrete devices. Part 3: Signal (including switching) and regulator diodes. Section 2: Blank detail specification for voltage regulator diodes and voltage reference diodes, excluding temperature compensated precision refere di
• DS/EN 28430-1:1992 Resistance spot welding. Electrode holders. Part 1: Taper fixing 1:10
• DS/EN 28430-2:1992 Resistance spot welding. Electrode holders. Part 2: Morse taper fixing
• DS/ISO 8430-1:1992 Resistance spot welding - Electrode holders - Part 1: Taper fixing 1 : 10
• DS/ISO 8430-2:1992 Resistance spot welding - Electrode holders - Part 2: Morse taper fixing

ZA-SANS, Electrode Piece Thickness

• SANS 2177:1986 Metallic coatings — Measurement of coating thickness — Coulometric method by anodic dissolution
• SANS 2177:2008 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution
• SANS 5183-2:1994 Resistance spot welding — Electrode adaptors, male taper 1:10Part 2: Parallel shank fixing for end-thrust electrodes
• SANS 5183-2:2008 Resistance spot welding - Electrode adaptors, male taper 1:10 Part 2: Parallel shank fixing for end-thrust electrodes
• SANS 5829:1984 Resistance spot welding - Electrode adaptors, female taper 1:10

International Organization for Standardization (ISO), Electrode Piece Thickness

• ISO 2177:1985 Metallic coatings; Measurement of coating thickness; Coulometric method by anodic dissolution
• ISO 2177:1972 Metallic coatings — Measurement of coating thickness — Coulometric method by anodic dissolution
• ISO 2128:2010 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope
• ISO 2128:1976 Anodizing of aluminium and its alloys; Determination of thickness of anodic oxide coatings; Non-destructive measurement by split-beam microscope
• ISO 2177:2003 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution
• ISO 12145:1998 Resistance welding equipment - Angles for mounting spot welding electrodes
• ISO 5183-2:2000 Resistance spot welding - Electrode adaptors, male taper 1:10 - Part 2: Parallel shank fixing for end-thrust electrodes
• ISO 5183-2:1988 Resistance spot welding; electrode adaptors, male taper 1 : 10; part 2: parallel shank fixing for end-thrust electrodes
• ISO 1089:1980 Electrode taper fits for spot welding equipment; Dimensions
• ISO 5829:1984 Resistance spot welding; Electrode adaptors, female taper 1 : 10
• ISO 16866:2020 Metallic and other inorganic coatings — Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test)
• ISO 8430-1:2016 Resistance spot welding - Electrode holders - Part 1: Taper fixing 1:10
• ISO 8430-2:2016 Resistance spot welding - Electrode holders - Part 2: Morse taper fixing
• ISO 8430-1:1988 Resistance spot welding; electrode holders; part 1: taper fixing 1:10
• ISO 8430-2:1988 Resistance spot welding; electrode holders; part 2: Morse taper fixing
• ISO 1089:2023 Resistance welding equipment — Electrode taper fits for spot welding equipment — Dimensions
• ISO/FDIS 1089 Resistance welding equipment — Electrode taper fits for spot welding equipment — Dimensions
• ISO 18276:2017 Welding consumables - Tubular cored electrodes for gas-shielded and non-gas-shielded metal arc welding of high strength steels - Classification
• ISO 18276:2005 Welding consumables - Tubular cored electrodes for gas-shielded and non-gas-shielded metal arc welding of high-strength steels - Classification
• ISO/CD 11713:2023 Carbonaceous materials used in the production of aluminium — Cathode blocks and baked anodes — Determination of electrical resistivity at ambient temperature

British Standards Institution (BSI), Electrode Piece Thickness

• BS EN ISO 20168:2021 Resistance welding. Locking tapers for electrode holders and electrode caps
• BS EN ISO 2177:2005 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution
• BS EN ISO 2177:2004 Metallic coatings. Measurement of coating thickness. Coulometric method by anodic dissolution
• BS 4215-6:1987 Resistance spot welding electrodes, electrode holders and ancillary equipment - Specification for electrode adaptors, female taper 1:10
• BS EN ISO 2128:2010 Anodizing of aluminium and its alloys. Determination of thickness of anodic oxidation coatings. Non-destructive measurement by split-beam microscope
• BS EN ISO 5183-2:2001 Resistance welding equipment - Electrode adaptors, male taper 1: 10 - Parallel shank fixing for end-thrust electrodes
• BS 6043-3.2:1997 Methods of sampling and test for carbonaceous materials used in aluminium manufacture. Electrodes. Determination of density of cathode blocks and prebaked anodes
• BS EN 21089:1992 Electrode taper fits for spot welding equipment - Dimensions
• BS EN 16866:2017 Metallic and other inorganic coatings. Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test)
• BS EN ISO 16866:2022 Metallic and other inorganic coatings. Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test)
• BS EN ISO 5829:2021 Resistance spot welding. Electrode adaptors, female taper 1:10
• BS 6043-3.3:2000 Methods of sampling and test for carbonaceous materials used in aluminium manufacture - Electrodes - Determination of the bulk density (apparent density) of cathode blocks and prebaked anodes using a dimensions method
• BS 6043-3.6:2000 Methods of sampling and test for carbonaceous materials used in aluminium manufacture. Electrodes. Determination of electrical resistivity of cathode blocks and prebaked anodes at ambient temperature
• BS EN 12373-3:1999 Aluminium and Aluminium Alloys - Anodizing - Part 3: Determination of Thickness of Anodic Oxidation Coatings - Non-Destructive Measurement by Split-Beam Microscope Ratified European Text
• BS EN ISO 18276:2006 Welding consumables - Tubular cored electrodes for gas-shielded and non-gas-shielded metal arc welding of high-strength steels - Classification
• 19/30402378 DC BS ISO 16866. Metallic and other inorganic coatings. Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test)
• BS EN 120001:1993 Harmonized system of quality assessment for electronic components. Blank detail specification. Light emitting diodes, light emitting diode arrays, light emitting diode displays without internal logic and resistor
• BS E9375:1975 Specification - Harmonized system of quality assessment for electronic components - Blank detail specification: voltage regulator diodes and voltage reference diodes excluding precision-voltage temperature-compensated reference diodes
• 22/30454187 DC BS EN ISO 1089. Resistance welding. Electrode taper fits for spot welding equipment. Dimensions
• BS 6043-3.4:2000 Methods of sampling and test for carbonaceous materials used in aluminium manufacture - Electrodes - Determination of the open porosity and bulk density (apparent density) of cathode blocks and prebaked anodes by a hydrostatic method

工业和信息化部, Electrode Piece Thickness

• JB/T 14230-2022 Lithium-ion battery pole piece coating machine

CZ-CSN, Electrode Piece Thickness

• CSN 03 8150-1975 Anodized aluminium. Measurement of coating tbickntss and sealing
• CSN 05 5016-1985 Coated electrodes for arc welding and surfacLng. Determination of humidity in the electrode coating
• CSN 05 2673-1992 Resistance spot welding. Electrode adaptors, male taper 1:10
• CSN ST SEV 1379-1978
• CSN 35 8760-1973 Seraiconductors. Stabilizing diodes. Measurement of voltage temperature coefficient

Taiwan Provincial Standard of the People's Republic of China, Electrode Piece Thickness

• CNS 8406-1989 Methods of Test for Thickness of Anodic Oxidation Coatings on Aluminium and Aluminium Alloys
• CNS 13806-1997 Method of Measurement for Emission Wavelength and Luminous Intensity of Epitaxial Wafers of Light Emitting Diodes
• CNS 5023-1984 Shape and Dimension of Electrode Tip for Spot Welding

AT-ON, Electrode Piece Thickness

• OENORM EN ISO 20168:2021 Resistance welding - Locking tapers for electrode holders and electrode caps (ISO 20168:2016)
• ONORM EN 21089-1992 Electrode taper fits for spot welding equipment -Dimensions
• OENORM EN ISO 5829:2021 Resistance spot welding - Electrode adaptors, female taper 1:10 (ISO 5829:1984)

Lithuanian Standards Office , Electrode Piece Thickness

• LST EN ISO 20168:2021 Resistance welding - Locking tapers for electrode holders and electrode caps (ISO 20168:2016)
• LST EN ISO 2128:2011 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope (ISO 2128:2010)
• LST EN ISO 2177:2004 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution (ISO 2177:2003)
• LST EN ISO 5183-2:2003 Resistance spot welding - Electrode adaptors, male taper 1:10 - Part 2: Parallel shank fixing for end-thrust electrodes (ISO 5183-2:2000)
• LST EN ISO 5829:2021 Resistance spot welding - Electrode adaptors, female taper 1:10 (ISO 5829:1984)

PL-PKN, Electrode Piece Thickness

• PN-EN ISO 20168-2021-07 E Resistance welding -- Locking tapers for electrode holders and electrode caps (ISO 20168:2016)
• PN H04606-01-1990 Aluminium and aluminium alloys Test methods of anodic oxide coatings Measurement of thickness
• PN-EN ISO 5829-2021-07 E Resistance spot welding -- Electrode adaptors, female taper 1:10 (ISO 5829:1984)

VN-TCVN, Electrode Piece Thickness

• TCVN 5876-1995 Anodizing of aluminium and its alloys.Determination of thickness of anodic oxide coatings.Non.destructive measurement by split.beam microscope

YU-JUS, Electrode Piece Thickness

• JUS C.A6.033-1989 Metallic coatings. Measurement of coating thlckness. Coulometric method by anod'ic dlssolution
• JUS C.T7.228-1984 Anodic oxidation of a/uminium and aluminium allols. Measurement of thickness of oxide coatings. Eddy current method
• JUS C.T7.226-1984 Anodic oxidation of afuminium and aluminium alloys. Microscopic determination of thickness of oxide coating
• JUS N.R2.624-1980 Polar tantahim electrolytic capacitors with sintered anode and solid electrolyte without protected-layer - tantahim chip capacitors (type 3A2), 6,3 to 35 V d.c. Climatic severities 55/125/
• JUS C.T7.227-1984 Anodic oxidation of aluminium and its alloys. Measurement of thickness of oxide coatings by light section microscope

Japanese Industrial Standards Committee (JISC), Electrode Piece Thickness

• JIS H 8680:1993 Test methods for thickness of anodic oxide coatings on aluminium and aluminium alloys
• JIS H 8680-2:1998 Test methods for thickness of anodic oxide coatings on aluminium and aluminium alloys -- Part 2: Eddy current method
• JIS H 8687:2013 Anodizing of aluminium and its alloys.Determination of electric strength
• JIS H 8680-1:1998 Test methods for thickness of anodic oxide coatings on aluminium and aluminium alloys -- Part 1: Microscopical method

Electronic Components, Assemblies and Materials Association, Electrode Piece Thickness

• EIA_ECA-956-2006 Aluminum Electrolytic Chip Capacitor with Polmer Cathode
• EIA/ECA-956-2006 Aluminum Electrolytic Chip Capacitor with Polmer Cathode
• EIA_ECA-953-2006 Molded Tantalum Chip Capacitor with Polymer Cathode
• EIA/ECA-953-2006 Molded Tantalum Chip Capacitor with Polymer Cathode
• EIA/ECA-955-2007 SURFACE MOUNT ALUMINUM ELECTROLYTIC CHIP CAPACITOR WITH POLYMER CATHODE (QUALIFICATION SPECIFICATION)
• ECA EIA/ECA-955-2007 SURFACE MOUNT ALUMINUM ELECTROLYTIC CHIP CAPACITOR WITH POLYMER CATHODE (QUALIFICATION SPECIFICATION)

NO-SN, Electrode Piece Thickness

• NS 1182-1979 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic solution

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会, Electrode Piece Thickness

• GB/T 33970-2017 Al2O3 dispersion strengthened copper sheet for resistance welding electrode

CH-SNV, Electrode Piece Thickness

• VSM 34130-1934
• VSM 18653.1-1965
• VSM 23890-1971

KR-KS, Electrode Piece Thickness

• KS B ISO 26304-2016 Welding consumables — Solid wire electrodes, tubular cored electrodes and electrode-flux combinations for submerged arc welding of high strength steels — Classification
• KS B ISO 1089-2003(2023) Electrode taper fits for spot welding equipment－Dimensions
• KS B ISO 5829-2022 Resistance spot welding — Electrode adaptors, female taper 1：10

TR-TSE, Electrode Piece Thickness

• TS 3179-1978 METALIC COATINGS - MEASUREMENT OF COATING THICKNESS - COULOMETRIC METHOD BY ANODIC DISSOLUT?ON

European Committee for Standardization (CEN), Electrode Piece Thickness

• EN ISO 2128:2010 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope (ISO 2128:2010)
• EN ISO 2177:1994 Metallic Coatings - Measurement of Coating Thickness - Coulometric Method by Anodic Dissolution (ISO 2177 : 1985)
• EN ISO 2177:2004 Metallic Coatings - Measurement of Coating Thickness - Coulometric Method by Anodic Dissolution
• EN 21089:1991 Electrode Taper Fits for Spot Welding Equipment - Dimensions
• EN ISO 5829:2021 Resistance spot welding - Electrode adaptors, female taper 1:10 (ISO 5829:1984)
• EN 16866:2017 Metallic and other inorganic coatings - Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test)
• EN 12373-3:1998 Aluminium and Aluminium Alloys - Anodizing - Part 3: Determination of Thickness of Anodic Oxidation Coatings - Non-Destructive Measurement by Split-Beam Microscope Ratified European Text
• EN ISO 16866:2022 Metallic and other inorganic coatings - Simultaneous thickness and electrode potential determination of individual layers in multilayer nickel deposits (STEP test) (ISO 16866:2020)
• EN 25183-2:1991 Resistance spot welding; electrode adaptors, male taper 1:10; part 2: parallel shank fixing for end-thrust electrodes (ISO 5183-2:1988)

U.S. Military Regulations and Norms, Electrode Piece Thickness

• ARMY MIL-PRF-55365/12 D (2)-2008 CAPACITORS, CHIP, FIXED, TANTALUM, POLARIZED ESTABLISHED RELIABILITY AND NONESTABLISHED RELIABILITY, STYLE CWR15

National Metrological Verification Regulations of the People's Republic of China, Electrode Piece Thickness

• JJG 761-1991 Verification Regulation of Electrode Type Salinometer
• JJG 761-2016 Verification Regulations for Electrode Salinity Meter

SE-SIS, Electrode Piece Thickness

• SIS SS-ISO 2128:1984 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxide coatings - Non-destructive mea- surement by split-beam microscope
• SIS SS 11 70 30-1980 Anodizing of aluminium and its alloys — Determination of thickness of anodic oxide coatings — Non-destructive measure ment by split-beam microscope
• SIS SS-ISO 2177:1986 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution
• SIS SS-ISO 5183-2:1991 Resistance sp?t welding — Electrode adap- tors, male taper 1:10 — Part 2: Parallel shank fixing for end-thrust electrodes
• SIS SS-ISO 5829:1987 Resistance sp?t welding - Electrode adaptors, female taper 1:10
• SIS SS-ISO 5829:1986 Resistance sp?t welding - Electrode adaptors, female taper 1:10
• SIS SS-EN 25 183-2-1991 Resistance sp?t welding equipment — Electrode adaptors, male taper 1:10 — Part 2: Parallel shank fixing for end-thrust electrodes
• SIS SS 06 11 01-1990 Welding electrodes — Wire electrodes and tubular wires for gas metal arc welding and metal arc welding of carbon steel, carbon-manganese alloyed steel, microalloyed steel and low-alloyed steel — Weld metal test specimens for all-weld-metal tests

AENOR, Electrode Piece Thickness

• UNE-EN ISO 2128:2011 Anodizing of aluminium and its alloys - Determination of thickness of anodic oxidation coatings - Non-destructive measurement by split-beam microscope (ISO 2128:2010)
• UNE-EN ISO 2177:2005 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution (ISO 2177:2003)
• UNE-EN ISO 5183-2:2002 Resistance spot welding - Electrode adaptors, male taper 1:10 - Part 2: Parallel shank fixing for end-thrust electrodes. (ISO 5183-2:2000)
• UNE-EN 21089:1993 ELECTRODE TAPER FITS FOR SPOT WELDING EQUIPMENT. DIMENSIONS. (ISO 1089:1980).

PT-IPQ, Electrode Piece Thickness

• E 297-1974
• NP EN 12373-3-2001 Aluminium and aluminium alloys Anodizing Part 3:Determination of thickness of anodic oxidation coatings.Non-destructive measurement by split-beam microscope

ES-AENOR, Electrode Piece Thickness

• UNE 14-211-1985
• UNE 38 013

International Electrotechnical Commission (IEC), Electrode Piece Thickness

• IEC 91/926/PAS:2010 Electronic circuit board for high-brightness LEDs
• IEC 60747-3-2:1986 Semiconductor devices. Discrete devices. Part 3 : Signal (including switching) and regulator diodes. Section Two: Blank detail specification for voltage-regulator diodes and voltage-reference diodes, excluding temperature-compensated precision reference d
• IEC 91/928/PAS:2010 Test methods for electronic circuit board for high-brightness LEDs
• IEC 61443:1999 Short-circuit temperature limits of electric cables with rated voltages above 30 kV (U<(Index)m> = 36 kV)
• IEC 60724:1984 Guide to the short-circuit temperature limits of electric cables with a rated voltage not exceeding 0,6/1,0kV

American Society for Testing and Materials (ASTM), Electrode Piece Thickness

• ASTM B764-04 Standard Test Method for Simultaneous Thickness and Electrode Potential Determination of Individual Layers in Multilayer Nickel Deposit (STEP Test)
• ASTM B764-04(2021) Standard Test Method for Simultaneous Thickness and Electrode Potential Determination of Individual Layers in Multilayer Nickel Deposit (STEP Test)
• ASTM B764-04(2014) Standard Test Method for Simultaneous Thickness and Electrode Potential Determination of Individual Layers in Multilayer Nickel Deposit 40;STEP Test41;
• ASTM C1025-91(2000) Standard Test Method for Modulus of Rupture in Bending of Electrode Graphite

Professional Standard - Machinery, Electrode Piece Thickness

• JB/T 3957-1999 Electrode taper fits for spot welding equipment-dimensions
• JB/T 9959-1999 Resistance spot welding-electrode adaptors,female taper 1:10
• JB/T 10256.1-2001 Resistance spot welding - Electrode holders Part 1:Taper fixing 1:10
• JB/T 10256.2-2001 Resistance spot welding - Electrode holders Part 2:Morse taper fixing

Professional Standard - Non-ferrous Metal, Electrode Piece Thickness

• YS/T 611-2023 Electrode paste used for positive temperature coefficient ceramic

Guizhou Provincial Standard of the People's Republic of China, Electrode Piece Thickness

• DB52/T 928-2014 CA45S Type Bottom Electrode Chip Type Solid Electrolyte Tantalum Fixed Capacitor

Professional Standard-Ships, Electrode Piece Thickness

• CB/T 3794-1997 Test methods for piezoelectric ceramics electrode joint strength

RU-GOST R, Electrode Piece Thickness

• GOST 15613.1-1984 Glued massive wood. Methods for determination of glued joint of ultimate strength while shearing palong grain
• GOST 15613.4-1978 Glued massive wood. Methods for determining the ultimate strength of serrate glued joints in static bending
• GOST 21815.1-1986 Image intensifier and image converter tubes. Method of measuring sensitivity of the photocathode to white light and to white light with selective light filter
• GOST 24680-1981 Rotating electrical machinery. Insulating collector plates. Row of thichnesses
• GOST R ISO 11713-2014 Carbonaceous materials used in the production of aluminium. Cathode blocks and baked anodes. Determination of electrical resistivity at ambient temperature
• GOST 11612.1-1981 Photomultipliers. Measuring method of catode luminous sensitivity
• GOST 21011.4-1977 High-voltage kenotrons. Test methods of electric strength
• GOST 11612.17-1981 Phetomultiplirs. Methods of measuring spectral anode sensitivity
• GOST 12.1.038-1982 Occupational safety standards system. Electric safety. Maximum permissible levels of pick-up voltages and currents
• GOST 11612.2-1981 Photomultipliers. Measuring method of anode luminous sensitivity

IN-BIS, Electrode Piece Thickness

• IS 2604-1988

Professional Standard - Aerospace, Electrode Piece Thickness

• QJ 1163.13-1987 Depth, height, length limit gauge type size double-headed piece groove width plug gauge (B=2~315)

未注明发布机构, Electrode Piece Thickness

• BS ISO 16866:2020 Metallicand otherinorganic coatings — Simultaneous thickness and electrode potential determination ofindividual layers in multilayernickel deposits (STEP test)
• BS EN ISO 1089:2023 Resistance welding equipment — Electrode taper fits for spot welding equipment — Dimensions

BE-NBN, Electrode Piece Thickness

• NBN-EN ISO 2177:1995 Metallic coatings - Measurement of coating thickness - Coulometric method by anodic dissolution (ISO 2177:1985)

RO-ASRO, Electrode Piece Thickness

• STAS 7043/2-1990 Non metallic coatings. Coatings by anodic oxi-dation of aluminium and aluminium alloys. Methods for oxide layer thickness determination
• STAS SR ISO 5829:1993 Resistance spot welding - Electrode adaptors, female taper 1:10
• STAS 10625-1981 Spot welding equipment CONICAL ELECTRODE TAPER FITS Forms and dimensions

Professional Standard - Ferrous Metallurgy, Electrode Piece Thickness

• YB/T 4245-2011 Machining and requirements of graphite electrodes and nipples

American National Standards Institute （ANSI), Electrode Piece Thickness

• ANSI/ASTM C1025:2000 Test Method for Modulus of Rupture in Bending of Electrode Graphite

United States Navy, Electrode Piece Thickness

• NAVY MIL-DTL-24403/1 F-2008 ELECTRODES ?WELDING, FLUX CORED, ORDINARY STRENGTH AND LOW ALLOY STEEL

(U.S.) Joint Electron Device Engineering Council Soild State Technology Association, Electrode Piece Thickness

• JEDEC JESD5-1982 Mesurement of Temperature Coefficient of Voltage Regulator Diodes
• JEDEC JESD63-1998 Standard Method for Calculating the Electromigration Model Parameters for Current Density and Temperature

WRC - Welding Research Council, Electrode Piece Thickness

• BULLETIN 36-1957 ULTRA-HIGH STRENGTH WELD METAL WITH LOW-HYDROGEN ELECTRODES

Society of Automotive Engineers (SAE), Electrode Piece Thickness

• SAE AMS6454D-2007 Steel, Sheet, Strip, and Plate 1.8Ni - 0.80Cr - 0.25Mo (0.38 - 0.43C) (SAE 4340) Vacuum Consumable Electrode Remelted UNS G43406
• SAE AMS6438F-2006 Steel, Sheet, Strip, and Plate, 1.05Cr - 0.55Ni - 1.0Mo - 0.12V (0.45 - 0.50C) Consumable Electrode Vacuum Melted

CEN - European Committee for Standardization, Electrode Piece Thickness

• EN 28430-2:1992 Resistance spot welding - Electrode holders - Part 2: Morse taper fixing

Professional Standard - Electron, Electrode Piece Thickness

• SJ 2354.6-1983 Method of measurement for responsivity of PIN and avalanche photodiodes
• SJ 2142-1982 Methods of measurement for current temperature coefficient of silicon current regulator diodes

Others:   Electrode Thickness, battery pole piece thickness, Electrode Piece Thickness, Electrode Coating Thickness, battery pole piece thickness, The thickness of the electrode pad, Electrode Thickness, The thickness of the battery pole piece.