BS-80020CPPS等离子体源

• BS-80020CPPS等离子体源

• BS-80020CPPS是用于辅助低温（100℃以下等）下塑料基板和胶片成膜的等离子体源。

The plasma source in this product series is specialized for processes with a low temperature, such as plastic film or substrate. The film quality of vacuum deposited film can be improved by deposition assisted by plasma, with lower temperature increases of a substrate. The item can also be used for plasma treatment, such as for surface modification and cleaning. .
本系列产品是专门为等离子源与低温过程，如塑料膜或基板。真空薄膜质量的沉积膜可以通过沉积以等离子体辅助改善，随着衬底温度的升高降低。该项目也可用于等离子体处理，如表面改性和清洗。。
The reflective deposition is made possible by electron beam-excited plasma, while the ARE technique (Activated Reactive Evaporation) promotes a highly effective discharge, in order to enhance the evaporation materials ionization. There are multiple modes of operation, including a CPPS mode, as well as a normal plasma mode.
反射的沉积是由电子束激发的等离子体成为可能，而技术（活性反应蒸发）促进高效放电，为了提高蒸发物质电离。有多种操作模式，包括当前的模式，以及正常的等离子体模式。

Features特性

BS-80020CPPS Plasma Source for Low-temperature Process

This plasma source is specialized for low-temperature process, for example for a plastic substrate/film. Film quality of vacuum deposited film can be improved by plasma assisted deposition with lowering temperature increase of a substrate. And can also be used for plasma treatment such as cleaning and surface modification.

Can form high density oxide films in a low-temperature process. 

Reactive deposition by electron beam excited plasma, associated with ion-assistant effects.

Activated Reactive Evaporation (ARE) technique, promoting highly effective discharge above crucible, to enhance ionization of evaporation materials.

Selectable from CPPS mode, for low-temperature process, and normal plasma mode.

Retrofit to an existing vacuum chamber is possible. 

技术规格：

BS-80020CPPS等离子体源信息由日本电子株式会社(JEOL)为您提供，如您想了解更多关于BS-80020CPPS等离子体源报价、型号、参数等信息，欢迎来电或留言咨询。

注：该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案，不可用于临床诊断或治疗等相关用途