PR1-9000A
Positive Resist PR1-9000A is a positive tone photoresist designed for 365 or 436 nm wavelength
exposure, using tools such as wafer steppers, scanning projection aligners, proximity printers and
contact printers. PR1-9000A excels in applications when superior adhesion is required. Use of
adhesion promoters, such as HMDS is not recommended with PR1-9000A.
The following are advantages of PR1-9000A over other resists:
- superior resolution capability
- fast photospeed
- superior linewidth control due to suppression of reflective notching
- substrate adhesion which is superior to that of any commercial positive resist
- ease of removal after RIE process
- shelf life exceeding 1 year at room temperature storage.
The formulation and processing of PR1-9000A were designed with regard to occupational and
environmental safety. The principal solvent in PR1-9000A is 1-methoxy-2-propanol and
development of PR1-9000A is accomplished in a basic water solution.
Properties
♦ Solids content (%): 43-47
♦ Principal solvent: 1-methoxy-2-propanol
♦ Appearance: light yellow liquid
♦ Coating characteristic: very uniform, striation free
♦ Film thickness information:
Coating spin speed,
40 s spin (rpm)
Film thickness after 115°C hotplate
bake for 6 min (nm)
800 17100-18900
2000 11276-12463
3000 8550-9450
4000 7738-8552
5000 6716-7423
♦ Sensitivity (mJ/cm² for 1 μm thick film):
365 nm exposure wavelength: 70
436 nm exposure wavelength: 40
♦ Guaranteed shelf life at 25°C storage (years): 2
Processing
1 Application of resist by spin coating at selected spin speed for 40 s.
2 Application of Edge Bead Remover EBR1 to bottom and edge of the coated wafer for 10s, until
5 s before completion of spin cycle.

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注：该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案，不可用于临床诊断或治疗等相关用途