Obducat电子束刻蚀系统

仪器简介：
1998年Obducat公司并购了在SEM有三十年经验的Camscan，并结合自身在纳米压印设备以及光存储设备的开发经验，研发了电子束刻蚀设备，提供EBR-30kV,EBR-50kV两种不同型号，都配备热场发射电子腔。

技术参数：
Electron gun /
Filament type
Thermal Field Emission (ZrO/C) X/Y Tilt/Shift Magnetic Alignment

Cathode life
Typically 10,000 hrs+

Beam spot size
Down to 8 nm 30 kV, Down to 2nm 50kV

Beam current density
Typically > 1000 A/cm2

Acceleration voltage
30 kV or 50kV

Gun EHT unit
EHT unit includes Suppressor, Extractor, Lens and Filament supplies

Condenser lenses
Integrated E/S Lens in Electron Gun, and Magnetic Condenser Lens

Objective lens
One electromagnetic low aberration final probe forming lens

Stigmator T
wo Octupole Stigmators, to correct both lens and source astigmatism
 
Beam blanker
Electrostatic blanking plates conjugate to writing plane Bandwidth up to 30 MHz. (tr/tf < 6 ns)

Dynamic focus
Iron free coil, ±100 µm range

Beam current drift
< ±0.5% / hr with activated beam current feedback system

Beam apertures
4 selectable by aperture changer mechanism


Maximal travel 100 mm
Drive unit Brush less 3-phase linear motor
Bearing Cross roller bearing
Straightness < 5 µm / 50 mm
Measuring system Integrated laser scale, resolution < 1nm
Position repeatability < ± 6.4 nm
Dynamic position error < ± 3.8 nm
Speed range high resolution 2.5 - 250 µm/s
Speed range low resolution Up to 5 mm/s

Rotation Spindle
Axial rotational error < 0.05 µm
Radial rotational error < 0.05 µm
Radial async. rotation error < 0.015 µm ptp
Rotation speed 1-3000 rpm




主要特点：
General:
Feedback and closed-loop systems guarantees long time exposure stability.
Fast exposure, High beam current from 1 nA to 30 nA,
CLV or CAV exposure method,
Overlay exposure accuracy and DOSE-control,

Mechanics：
Linear motor and stage outside of vacuum chamber
No magnetic/electrostatic or acoustics interference
Brush less sub systems ensure repeatability
Rotation stage on air bearing
Radial async. rotation error less than 15 nm ptp

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注：该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案，不可用于临床诊断或治疗等相关用途