Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
What is ISO 22415 about?
ISO 22415 specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material.
The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1000 nanometres on a flat substrate that has a different chemical composition to the specified material.
ISO 22415 is applicable to test samples in which the specified material layer has a homogeneous composition in-depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. ISO 22415 is applicable to instruments in which the ...