BS ISO 17331-2004+A1-2010 表面化学分析.从硅片工作标准物质表面采集元素的化学方法及其全反射X射线荧光光谱(TXRF)法的测定
Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy