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resolution target metal

resolution target metal, Total:22 items.

In the international standard classification, resolution target metal involves: Photography, Non-ferrous metals, Analytical chemistry, Testing of metals, Cereals, pulses and derived products, Conducting materials, Surface treatment and coating, Products of non-ferrous metals, Semiconducting materials.

Guangdong Provincial Standard of the People's Republic of China, resolution target metal

• DB44/T 1833-2016 Electronic imaging office document scanning test target low resolution test target

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, resolution target metal

• GB/T 17473.6-2008 Test method of precious metals pastes used for microelectronics.Determination of resolution
• GB/T 17473.6-1998 Test methods of precious metal pastes used for thick-film microelectronics--Determination of resolution

Hebei Provincial Standard of the People's Republic of China, resolution target metal

• DB13/T 2259-2015 Identification and classification of major hazard sources in metal and nonmetal underground mines

American Society for Testing and Materials (ASTM), resolution target metal

• ASTM F1710-97 Standard Test Method for Trace Metallic Impurities in Electronic Grade Titanium by High Mass-Resolution Glow Discharge Mass Spectrometer
• ASTM F1710-97(2002) Standard Test Method for Trace Metallic Impurities in Electronic Grade Titanium by High Mass-Resolution Glow Discharge Mass Spectrometer
• ASTM F2405-04(2011) Standard Test Method for Trace Metallic Impurities in High Purity Copper by High-Mass-Resolution Glow Discharge Mass Spectrometer
• ASTM F2405-04 Standard Test Method for Trace Metallic Impurities in High Purity Copper by High-Mass-Resolution Glow Discharge Mass Spectrometer
• ASTM F1593-08(2016) Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum by High Mass-Resolution Glow-Discharge Mass Spectrometer
• ASTM F1710-08(2016) Standard Test Method for Trace Metallic Impurities in Electronic Grade Titanium by High Mass-Resolution Glow Discharge Mass Spectrometer
• ASTM F1845-08(2016) Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Resolution Glow Discharge Mass Spectrometer
• ASTM F2113-01 Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
• ASTM F2113-01(2007) Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
• ASTM F2113-01e1 Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
• ASTM F2113-01(2011) Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

KR-KS, resolution target metal

• KS B ISO TR 14936-2003(2023)

Group Standards of the People's Republic of China, resolution target metal

• T/CITS 0002-2021 Detection of heavy mental cadmium in grain—Time-resolved fluorescent immunochromatographic method
• T/CITS 0001-2021 Detection of heavy mental plumbum in grain—Time-resolved fluorescent immunochromatographic method

Danish Standards Foundation, resolution target metal

• DS/EN ISO 4524-3:1995 Metallic coatings - Test methods for electrodeposited gold and gold alloy coatings - Part 3: Electrographic tests for porosity

Taiwan Provincial Standard of the People's Republic of China, resolution target metal

• CNS 8283-1982 Method of Chemical Analysis for Carbon in Metallic Silicon (Conductivity Method)

Professional Standard - Non-ferrous Metal, resolution target metal

• YS/T 935-2013 Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications

Association Francaise de Normalisation, resolution target metal

• NF A91-095-3:1987 METALLIC COATINGS. TEST METHODS FOR ELECTRODEPOSITED GOLD AND GOLD ALLOY COATINGS. PART 3 : ELECTROGRAPHIC TESTS FOR POROSITY.

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