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Total Reflection X-ray Fluorescence Spectroscopic Test Method for Metal Contamination on Silicon Wafer Surface

Total Reflection X-ray Fluorescence Spectroscopic Test Method for Metal Contamination on Silicon Wafer Surface, Total:2 items.

In the international standard classification, Total Reflection X-ray Fluorescence Spectroscopic Test Method for Metal Contamination on Silicon Wafer Surface involves: Testing of metals, Semiconducting materials.

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Total Reflection X-ray Fluorescence Spectroscopic Test Method for Metal Contamination on Silicon Wafer Surface

GB/T 24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy
GB/T 24578-2009 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy