Hot-carrier-induced degradation of MOSFET parameters over time is an important reliability
concern in modern microcircuits. High energy carriers, also called hot carriers, are generated in
the MOSFET by the large channel electric fields near the drain region. The electric fields
accelerate the carriers to effective temperatures well above the lattice temperature. These hot
carriers transfer energy to the lattice through phonon emission and break bonds at the Si/SiO2
interface. Carriers also are injected into the Si02 and can be trapped there. The trapping or bond
breaking creates oxide charge and interface traps that affect the channel carrier mobility and the
effective channel potential.