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伯英科技粉末与颗粒镀膜原子层沉积系统-Powder ALD-研发与生产型

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粉末原子层沉积系统 ALD

美国ALD NANOSOLUTIONS公司技术,专注于粉末颗粒表面镀膜。


专用于在粉末、颗粒表面沉积ALD薄膜,可用于科研,生产。单批次体积从45ml~150L,满足科研到生产的需要。可沉积氧化物,氮化物,金属等类型薄膜。可用于锂离子电池、催化剂、等需要粉末镀膜的行业。

专业的粉末镀膜原子层沉积系统,为科研与生产提供专业的解决方案。


设备沉积方法有:流化床法、滚动法、振动法。


粉末原子层沉积系统型号:

FX系列:75 or 150 mL,适用于R&D

FP系列:  500 mL / 2 L / 5 L / 10 L,适用于R&D,生产

RX系列10 or 40 mL, 适用于R&D 

RP系列: ~40L, 适用于生产

CVR系列:15L/hr to 150L/hr,适用于生产


fxALDN FP ReactorALDN RX with Glove Box Option


粉末原子层沉积系统技术参数:

ALD REACTOR SYSTEMS

Fluidized
   
Bed Reactors
   
(FBR)

Rotary Reactors (Rotary)

Continuous Vibrating Reactors (CVR)

Substrate Volume

75mL to 10L per batch

10ml to 40L

15L/hr to 150L/hr

Substrate Mass
   
(Density Dependent)

75g - 12.5kg per batch

10g - 50kg per batch

15kg/hr to 150kg/hr

Vapor Draw Sources

2 standard,
   
up to 8

2 standard,
   
up to 8

2 standard,
   
up to 8

Regulatory Compliance

CE, GMP and ISO compliance upon request

Weight

300 lbs -
   
1,000 lbs (150kg - 500kg)

300lbs - 4,000lb (150kg
   
- 2000kg)

500lbs - 8,000lb (250kg - 4000kg)

Venting  Emissions and   Abatement

Equipment can be designed to comply with local jurisdiction   codes and regulations

Electrical Requirements

Project-specific and customized. Further details can be   supplied upon request

Demonstrated Particle Diameters

10 nm - 500micron

10 nm - 200micron

5-50micron

Potential  Particle   Diameters

2 nm - 1mm

2 nm - 250px

10nm - 1 cm

Other Features

Highest Precursor Efficiency

Plasma ALD Compatible

Atmospheric Pressure Operation


Fluidization Reactor – Experimental Series (FX)

Reactor Style:

Fluidization Reactor

Substrate Volume:

75 or 150 mL

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 4

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading

Low Vapor Pressure Containers capable of   150 °C

Residual Gas Analyzer

Waste Abatement

Glovebox

Research License for ALD on Particles

Various Vapor Sources


Fluidization Reactor – Pilot Series (FP)

Reactor Style:

Fluidization Reactor

Substrate Volume:

500 mL / 2 L / 5 L / 10 L

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

400 lbs/ 180 kg

Options Available:

Substrate Loading


Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Research License for ALD on Particles

Various Vapor Sources

Rotary ALD Reactor – Pilot Series (RP)

Reactor Style:

Rotary Reactor

Substrate Volume:

~40 L

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

500 lbs/ 230 kg

Options Available:

Substrate Loading


Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources

 

Rotary ALD Reactor – Experimental Series (RX)



Reactor Style:

Rotary Reactor

Substrate Volume:

10 or 40 mL

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading


Plasma Source from Meaglow

Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources


伯英科技粉末与颗粒镀膜原子层沉积系统-Powder ALD-研发与生产型信息由北京伯英科技有限公司为您提供,如您想了解更多关于伯英科技粉末与颗粒镀膜原子层沉积系统-Powder ALD-研发与生产型报价、型号、参数等信息,欢迎来电或留言咨询。

注:该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案,不可用于临床诊断或治疗等相关用途

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