STRN SILI HETSTRUCT-2001

Strained Silicon Heterostructures: materials and devices


 

 

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标准号
STRN SILI HETSTRUCT-2001
发布日期
2001年01月01日
实施日期
2014年03月20日
废止日期
中国标准分类号
/
国际标准分类号
/
发布单位
IET - Institution of Engineering and Technology
引用标准
510
适用范围
This book comprehensively covers the areas of materials growth@ characterisation and descriptions for the new devices in silicon heterostructure material systems. In recent years@ the development of powerful epitaxial growth techniques such as molecular beam epitaxy (MBE)@ ultra-high vacuum chemical vapour deposition (UHVCVD) and other low temperature epitaxy techniques has given rise to a new area of research of bandgap engineering in silicon-based materials. This has paved the way not only for heterojunction bipolar and field effect transistors@ but also for other fascinating novel quantum devices. This book provides an excellent introduction and valuable references for postgraduate students and research scientists. Author(s) S. K. Ray@ C. K. Maiti@ N. B. Chakrabarti




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