PROC TECH SILI CARBD DEVC-2002

Process Technology for Silicon Carbide Devices


 

 

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标准号
PROC TECH SILI CARBD DEVC-2002
发布日期
2002年01月01日
实施日期
2014年03月20日
废止日期
中国标准分类号
/
国际标准分类号
/
发布单位
IET - Institution of Engineering and Technology
引用标准
200
适用范围
This book on the process technology for silicon carbide devices is divided into seven chapters. The first chapter discusses the material properties of SiC@ and specifically the advantages of SiC that started the interest in the first place. This chapter also includes some basic calculations on high-voltage blocking and on-resistance. Chapters 2-6 cover the basic process steps used in fabricating SiC devices. The chapters cover bulk and epitaxial growth of SiC@ ion implantation and diffusion@ wet and dry etching@ thermally grown and deposited dielectrics and Schottky and ohmic contacts. The final chapter@ Chapter 7@ covers devices in SiC@ divided into different categories high-voltage devices@ high-frequency devices@ high-temperature@ optical and mechanical devices. Author Carl-Mikael Zetterling




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