BS ISO 21466:2019

Microbeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM

BS ISO 21466:2019 发布历史

What is ISO 21466 - CDSEM about ? ISO 21466 specifies the structure model with related parameters, file format, and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimens, such as gate on wafer, photomask, single isolated or dense line feature pattern down to the size of 10 nm.     Who is ISO 21466 - CDSEM for ?   ISO 21466 on method for evaluating critical dimensions by CDSEM is useful for:     Manufacturers of ...

BS ISO 21466:2019由英国标准学会 GB-BSI 发布于 2019-12-31，并于 2019-12-31 实施。

BS ISO 21466:2019在国际标准分类中归属于: 37.020 光学设备。

BS ISO 21466:2019的历代版本如下：

• 2019年 BS ISO 21466:2019

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标准号

BS ISO 21466:2019

发布

2019年

发布单位

英国标准学会

当前最新

BS ISO 21466:2019

 

 

适用范围

What is ISO 21466 - CDSEM about ? ISO 21466 specifies the structure model with related parameters, file format, and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimens, such as gate on wafer, photomask, single isolated or dense line feature pattern down to the size of 10 nm.     Who is ISO 21466 - CDSEM for ?   ISO 21466 on method for evaluating critical dimensions by CDSEM is useful for:     Manufacturers of ...

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