IEC TS 61945:2000由国际电工委员会 IX-IEC 发布于 2000-03。
IEC TS 61945:2000 在中国标准分类中归属于: L56 半导体集成电路,在国际标准分类中归属于: 31.200 集成电路、微电子学。
This technical specification gives the methodology for technology and failure analysis in manufacturing integrated circuits. Taking into account the level of complexity of techniques and means to be used, the present technical specification covers the classification of several levels of technology analysis that may be used for semiconductors and defines for each level: - the objective to be performed (or goal); - the points to be investigated; - the tools and techniques needed for currently available technologies to perform these objectives. Technology analysis is used to determine the way a component is built by observing it using adequate resolution, which increases progressively with the level of analysis. In addition, it allows detection of any fault potentially affecting the reliability of the devices under typical working conditions. It may be used to verify the conformance of a device to its manufacturing documents, but may also be used to determine the physical and chemical characteristics of the device under test. The points observed during the analysis can also serve as guidelines for an expert in a future quality audit of a manufacturing line. By using similar or case-specific means, the failure analysis leads to identifying the physical reasons of a failure found in a device during a test or during normal working conditions. Through a deep knowledge of the component and of its intrinsic failure mechanisms, the technology analysis can prepare for future failure analyses. This technical specification is considered as a suitable test methodology when referred to in an application document. Such documents shall indicate the specific conditions for its application.
Copyright ©2007-2022 ANTPEDIA, All Rights Reserved
京ICP备07018254号 京公网安备1101085018 电信与信息服务业务经营许可证:京ICP证110310号