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chemical mass spectrometry

chemical mass spectrometry, Total:24 items.

In the international standard classification, chemical mass spectrometry involves: Analytical chemistry, Nuclear energy engineering.


International Organization for Standardization (ISO), chemical mass spectrometry

  • ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon
  • ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
  • ISO 17560:2014 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
  • ISO/TS 15338:2009 Surface chemical analysis - Glow discharge mass spectrometry (GD-MS) - Introduction to use
  • ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
  • ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer

British Standards Institution (BSI), chemical mass spectrometry

  • BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
  • BS ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
  • BS DD ISO/TS 15338:2009 Surface chemical analysis - Glow discharge Mass spectrometry (GD-MS) - Introduction to use
  • BS ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry

Association Francaise de Normalisation, chemical mass spectrometry

  • NF X21-066*NF ISO 23812:2009 Surface chemical analysis - Secondary ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials

American Society for Testing and Materials (ASTM), chemical mass spectrometry

  • ASTM C698-04 Standard Test Methods for Chemical, Mass Spectrometric, and Spectrochemical Analysis of Nuclear-Grade Mixed Oxides ((U, Pu)O2)
  • ASTM C698-98 Standard Test Methods for Chemical, Mass Spectrometric, and Spectrochemical Analysis of Nuclear-Grade Mixed Oxides ((U, Pu)O2)
  • ASTM C889-06 Standard Test Methods for Chemical and Mass Spectrometric Analysis of Nuclear-Grade Gadolinium Oxide (Gd2O3) Powder
  • ASTM C889-11 Standard Test Methods for Chemical and Mass Spectrometric Analysis of Nuclear-Grade Gadolinium Oxide (Gd2O3) Powder
  • ASTM C889-99 Standard Test Methods for Chemical and Mass Spectrographic Analysis of Nuclear-Grade Gadolinium Oxide (Gd2O3) Powder
  • ASTM C698-16 Standard Test Methods for Chemical, Mass Spectrometric, and Spectrochemical Analysis of Nuclear-Grade Mixed Oxides ((U, Pu)O2)

Professional Standard - Electron, chemical mass spectrometry

  • SJ 2594-1985 Method for the analysis of boron and metalic impurities in pure SiC14-Spectro-chemical method

IT-UNI, chemical mass spectrometry

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会, chemical mass spectrometry

  • GB/T 33236-2016 Polycrystalline silicon—Determination of trace elements—Glow discharge mass spectrometry method

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, chemical mass spectrometry

  • GB/T 42518-2023 Chemical Analysis of Trace Elements in Bismuth Germanate (BGO) Crystals by Glow Discharge Mass Spectrometry

Korean Agency for Technology and Standards (KATS), chemical mass spectrometry

  • KS D ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry

Japanese Industrial Standards Committee (JISC), chemical mass spectrometry

  • JIS K 0168:2011 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry

Standard Association of Australia (SAA), chemical mass spectrometry

  • AS ISO 17560:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon




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