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Silicon mass spectrometry

Silicon mass spectrometry, Total:12 items.

In the international standard classification, Silicon mass spectrometry involves: Optics and optical measurements, Analytical chemistry, Organic chemicals, Semiconducting materials.

Group Standards of the People's Republic of China, Silicon mass spectrometry

• T/YYHG 0003-2022 Silica-Based Reversed-Phase Columns

国家市场监督管理总局、中国国家标准化管理委员会, Silicon mass spectrometry

• GB/T 40109-2021 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of boron in silicon

Japanese Industrial Standards Committee (JISC), Silicon mass spectrometry

• JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Silicon mass spectrometry

• GB/T 32495-2016 Surface chemical analysis.Secondary-ion mass spectrometry.Method for depth profiling of arsenic in silicon
• GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry

International Organization for Standardization (ISO), Silicon mass spectrometry

• ISO 17560:2014 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
• ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon

Professional Standard - Chemical Industry, Silicon mass spectrometry

• HG/T 6153-2023 Determination of ethyldichlorosilane in methylchlorosilane by gas chromatography-mass spectrometry

KR-KS, Silicon mass spectrometry

• KS D ISO 17560-2003(2023)
• KS D ISO 14237-2003(2023)

工业和信息化部, Silicon mass spectrometry

• YS/T 1300-2019 Determination of methyldichlorosilane, trimethylchlorosilane and methyltrichlorosilane in chlorosilanes by gas chromatography mass spectrometry

British Standards Institution (BSI), Silicon mass spectrometry

• BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon

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