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Spectral secondary diffraction peaks
Spectral secondary diffraction peaks, Total:9 items.
In the international standard classification, Spectral secondary diffraction peaks involves: Semiconductor devices, Optoelectronics. Laser equipment, Analytical chemistry.
Professional Standard - Agriculture, Spectral secondary diffraction peaks
- 784兽药典 一部-2015 Appendix Contents 0400 Spectroscopy 0451 X-ray Diffraction
Professional Standard - Electron, Spectral secondary diffraction peaks
- SJ/T 2658.12-2015 Measuring method for semiconductor infrared-emitting diode.Part 12: Peak-emission wavelength and spectral radiant bandwidth
- SJ 2658.12-1986 Methods of measurement for semiconductor infrared diodes Methods of measurement for peak emission wavelength and spectral half width
International Organization for Standardization (ISO), Spectral secondary diffraction peaks
- ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
- ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
British Standards Institution (BSI), Spectral secondary diffraction peaks
- BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
- 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
国家市场监督管理总局、中国国家标准化管理委员会, Spectral secondary diffraction peaks
- GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films