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gold ion sputtering
gold ion sputtering, Total:83 items.
In the international standard classification, gold ion sputtering involves: Vacuum technology, FLUID SYSTEMS AND COMPONENTS FOR GENERAL USE, Analytical chemistry, Semiconducting materials, Products of non-ferrous metals, Non-ferrous metals, Jewellery, Linear and angular measurements, Pumps, Materials for aerospace construction, Coatings and related processes used in aerospace industry, Electricity. Magnetism. Electrical and magnetic measurements, Metalliferous minerals.
Professional Standard - Electron, gold ion sputtering
- SJ 1781-1981 Sputtering ion pump--Testing methods
- SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series
- SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification
- SJ/T 10755-1996 Test methods for gold, silver and their alloy brazing for electronic devices - Test method for spatter property
- SJ/T 10754-2015 Test methods for gold, silver and their alloy brazing for electron device Determination of cleanness, spatter
Professional Standard - Machinery, gold ion sputtering
German Institute for Standardization, gold ion sputtering
- DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps
- DIN CEN/TS 15605:2008 Copper and copper alloys - Inductively coupled plasma optical emission spectrometry; German version CEN/TS 15605:2007
- DIN EN 15605:2010-12 Copper and copper alloys - Inductively coupled plasma optical emission spectrometry; German version EN 15605:2010
American Society for Testing and Materials (ASTM), gold ion sputtering
- ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
- ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
- ASTM E1162-11(2019) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1162-06 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E684-95(2000) Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
- ASTM E684-04 Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
- ASTM E2371-04 Standard Test Method for Analysis of Titanium and Titanium Alloys by Atomic Emission Plasma Spectrometry
General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, gold ion sputtering
- GB/T 25755-2010 Vacuum technology.Sputter-ion pumps.Measurement of performance characteristics
- GB/T 29658-2013 High-purity sputtering aluminium and aluminium alloy target used in electronic film
- GB/T 31227-2014 Test method for the surface roughness by atomic force microscope for sputtered thin films
- GB/T 15072.11-2008 Test method of precious metal alloys.Determination of gadolinium and beryllium contents for gold alloys.Inductively coupled plasma atomic emission spectrometry
- GB/T 15072.16-2008 Test method of precious metal alloys.Determination of copper and manganese contents for gold alloys.Inductively coupled plasma atomic emission spectrometry
- GB/T 15072.18-2008 Test method of precious metal alloys.Determination of zirconium and gadolinium contents for gold alloys.Inductively coupled plasma atomic emission spectrometry
- GB/T 15072.7-2008 Test methods of precious metal alloys.Determination of chromium and iron contents for gold alloys.Inductively coupled plasma atomic emission spectrometry
RU-GOST R, gold ion sputtering
- GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products
- GOST 27973.2-1988 Gold. Method of atomic-emission analysis with inductive plasma
- GOST R 52371-2005 Tin and lead babbits. Method of inductively coupled plasma atomic-emission spectrometry
- GOST R ISO 22033-2014 Nickel alloys. Determination of niobium. Inductively coupled plasma/atomic emission spectrometric method
- GOST R ISO 22725-2014 Nickel alloys. Determination of tantalum. Inductively coupled plasma atomic emission spectrometric method
- GOST 5.413-1970 The mater cooled diode type sputter-ion pump NMDI-01-1 (NIRD-100) with the power supply BP-150. Quality requirements for certified products
- GOST 28353.2-1989 Silver. Method of atomic-emission analysis with inductive plasma
Professional Standard - Non-ferrous Metal, gold ion sputtering
- YS/T 1025-2015 High-purity tungsten and tungsten alloy sputtering target used in electronic film
- YS/T 586-2006 Method for chemical analysis of copper and copper alloys. The inductively copuled plasma atomic emission spectromertic method
British Standards Institution (BSI), gold ion sputtering
- BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
- 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
- BS EN 15605:2010 Copper and copper alloys.Inductively coupled plasma optical emission spectrometry
- BS ISO 22415:2019 Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
- BS ISO 22962:2008 Titanium and titanium alloys - Determination of iron - Inductively coupled plasma atomic emission spectrometry
- 18/30372392 DC BS ISO 23166. Nickel alloys. Determination of tantalum. Inductively coupled plasma atomic emission spectrometric method
International Organization for Standardization (ISO), gold ion sputtering
- ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- ISO 22415:2019 Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
- ISO 22725:2007 Nickel alloys - Determination of tantalum - Inductively coupled plasma atomic emission spectrometric method
- ISO 22033:2005 Nickel alloys - Determination of niobium - Inductively coupled plasma atomic emission spectrometric method
- ISO 11435:2005 Nickel alloys - Determination of molybdenum - Inductively coupled plasma atomic emission spectrometric method
- ISO 22033:2011 Nickel alloys - Determination of niobium - Inductively coupled plasma/atomic emission spectrometric method
- ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
- ISO/TS 18223:2015 Nickel alloys - Determination of Nickel content - Inductively coupled plasma atomic emission spectrometric method
- ISO 22962:2008 Titanium and titanium alloys - Determination of iron - Inductively coupled plasma atomic emission spectrometry
- ISO 11435:2011 Nickel alloys - Determination of molybdenum content - Inductively coupled plasma/atomic emission spectrometric method
Korean Agency for Technology and Standards (KATS), gold ion sputtering
- KS D 1939-2003 Chemical analysis of zinc alloys by inductively coupled plasma emission spectrometric method
- KS D 1674-2009 Methods for inductively coupled plasma spectrometric analysis of trace elements in pure gold
- KS D ISO 22033:2006 Nickel alloys－Determination of niobium－Inductively coupled plasma atomic emission spectrometric method
- KS D ISO 22962:2010 Titanium and titanium alloys－Determination of iron－Inductively coupled plasma atomic emission spectrometry
- KS D ISO 11435:2006 Nickel alloys－Determination of molybdenum－Inductively coupled plasma atomic emission spectrometric method
- KS D ISO TS 18223:2018 Nickel alloys — Determination of Nickel content — Inductively coupled plasma atomic emission spectrometric method
- KS D ISO 22033:2021 Nickel alloys — Determination of niobium — Inductively coupled plasma/atomic emission spectrometric method
- KS D ISO 22962-2010(2020) Titanium and titanium alloys－Determination of iron－Inductively coupled plasma atomic emission spectrometry
- KS D 1678-2012 Methods for inductively coupled plasma emission spectrometric analysis of aluminum and alumnium alloys
- KS D ISO 11435-2006(2016) Nickel alloys－Determination of molybdenum－Inductively coupled plasma atomic emission spectrometric method
- KS D ISO 22033-2006(2016) Nickel alloys－Determination of niobium－Inductively coupled plasma atomic emission spectrometric method
Standard Association of Australia （SAA）, gold ion sputtering
- AS 3515.4:2007 Gold and gold bearing alloys - Determination of gold content (greater than 99.95 percent) - Inductively coupled plasma - Atomic emission spectrometry
European Committee for Standardization (CEN), gold ion sputtering
- EN 15605:2010 Copper and copper alloys - Inductively coupled plasma optical emission spectrometry
Danish Standards Foundation, gold ion sputtering
- DS/EN 15605:2010 Copper and copper alloys - Inductively coupled plasma optical emission spectrometry
Lithuanian Standards Office , gold ion sputtering
- LST EN 15605-2010 Copper and copper alloys - Inductively coupled plasma optical emission spectrometry
AENOR, gold ion sputtering
- UNE-EN 15605:2011 Copper and copper alloys - Inductively coupled plasma optical emission spectrometry
- UNE 38863:2012 Titanium and titanium alloys. Determination of iron. Inductively coupled plasma atomic emission spectrometry.
Association Francaise de Normalisation, gold ion sputtering
- NF ISO 23166:2019 Alliages de nickel - Détermination du tantale - Méthode par spectrométrie d'émission optique avec source à plasma induit par haute fréquence
- NF A08-920:2008 Nickel alloys - Determination of tantalum - Inductively coupled plasma atomic emission spectrometric method.
- NF EN 10361:2016 Aciers alliés - Détermination du Nickel - Méthode par spectrométrie d'émission optique avec source à plasma induit
Society of Automotive Engineers (SAE), gold ion sputtering
国家市场监督管理总局、中国国家标准化管理委员会, gold ion sputtering
- GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- GB/T 39143-2020 Methods for chemical analysis of gold-arsenic alloys—Determination of arsenic content—Inductively coupled plasma atomic emission spectrometry
KR-KS, gold ion sputtering
- KS D ISO TS 18223-2018 Nickel alloys — Determination of Nickel content — Inductively coupled plasma atomic emission spectrometric method
- KS D ISO 22033-2021 Nickel alloys — Determination of niobium — Inductively coupled plasma/atomic emission spectrometric method
GOSTR, gold ion sputtering
- GOST 28353.2-2017 Silver. Method of inductively coupled plasma atomic-emission analysis
Henan Provincial Standard of the People's Republic of China, gold ion sputtering
- DB41/T 1189-2016 Analysis of Chemical Composition of Polymetallic Minerals by Inductively Coupled Plasma-Atomic Emission Spectrometry
Japanese Industrial Standards Committee (JISC), gold ion sputtering
- JIS H 1307:1993 Methods for inductively coupled plasma emission spectrometric analysis of aluminium and aluminium alloys