中国第一届ALD学术交流会即将在上海隆重举行

2010-9-17 12:05 来源: 北京正通远恒科技有限公司
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尊敬的老师,您好!

   我们非常真诚的邀请您及您的科研团队参加将于2010年10月18日-10月19日在上海举行的第一届ALD学术交流会

   这次大会是由芬兰PICOSUN公司和复旦大学主办,南京大学、中国科学院上海技术物理研究所、上海纳米技术及应用国家工程研究中心和我们北京正通远恒科技有限公司联合承办,旨在方便中国优秀科研工作者交流分享ALD技术的最新研究进展和相关领域的研究成果。

   报告人介绍

   这次会议我们非常荣幸得邀请到ALD技术方面很多资深的教授及研究者来做报告,简介如下:

   张卫教授:1995年6月毕业于西安交通大学,获博士学位。1995-1997年在复旦大学做博士后,1997年起任教于复旦大学,1999年晋升为教授。现任复旦大学微电子学系系主任、复旦-Novellus互连研究中心主任,“极大规模集成电路制造装备及成套工艺”国家重大专项(02专项)总体组专家、上海市科学技术预见专家。在Applied Physics Letters、Journal of Applied Physics等国际期刊和会议上发表论文180多篇,申请专利15项,合作出版学术著作1部。曾获得教育部二等奖。

  研究方向:集成电路工艺、微细加工技术和半导体器件。具体包括(1)先进铜互连工艺研究。如超低k互连介质,新型超薄扩散阻挡层,以及纳米尺度Via填充工艺等;(2)原子层淀积(ALD)工艺研究。如ALD高k栅介质,基于ALD工艺的高密度MIM电容等;(3)新型存储器。如纳米晶存储器、RRAM等;(4)基于纳米线和纳米管的晶体管,以及隧穿场效应晶体管(TFET)等新结构器件研究。

   Prof. Lauri Niinistö: was born in Helsinki, Finland, in 1941. He received his M.Sc. and D. Techn. Degrees from Helsinki University of Technology in 1968 and 1973, respectively. His doctoral research on the synthesis and crystal structures of metal sulfates and sulfides was partly conducted at the University of Stockholm in 1971-1972. Since 1977 he has been Professor of Inorganic Chemistry at TKK but also worked in France, USA, Austria, and Hungary. He started the world first academic research on ALD technology (originally known as ALE) in 198? and was instrumental in ALD technology development over three decays.

   Prof. Mikko Ritala: (born 1968) received his M.Sc. degree in 1991 from University of Turku, and Ph.D. degree in 1994 from University of Helsinki, both in inorganic chemistry. During 1995  -2003 he worked at University of Helsinki, first as a postdoctoral researcher and then as an academy research fellow, both posts granted by Academy of Finland. In 2003 he was nominated as a professor of inorganic materials chemistry at University of Helsinki.

   His main research activity is in Atomic Layer Deposition (ALD) of thin films for microelectronics and other applications. Real time reaction mechanism studies form an important part of this research. Another research area is preparation of nanostructured materials by for example templating with ALD and electrodeposition, and electrospinning of nanofibres. He has published about 280 papers and holds several patents. In 2007 he was nominated as ISI Highly Cited Author in the field of materials science. He is an instructor of the American Vacuum Society’s short course on Atomic layer Deposition and has given tutorials on the same topic also in other occasions. He has also given numerous invited talks in international conferences and has participated in organization of numerous international conferences.

  Mikko Ritala is active in Finnish chemical societies. He has been a member of the board of the Finnish Chemical Society since 1999 (chairman 2002-2003, vice chairman 2000-2001), and a member of the board of the Association of Finnish Chemical Societies since 2001. Mikko Ritala is also a member of Finnish Academy of Science and Letters (2009).

   李爱东教授: 1988年在浙江大学化工系获学士学位。1988-1994年在哈尔滨工业大学应用化学系工作,1993年获得化学系硕士学位。1996年获南京大学物理系理学博士学位。1996年至今,在南京大学材料系工作,从事科研和教学工作。2000年香港理工大学的访问学者,2005年加州大学伯克利分校访问学者。入选2004年教育部新世纪优秀人才计划。主持和参与了国家自然科学基金、“973”、教育部、江苏省和与国外公司的合作项目等多项课题。已在国际学术期刊上发表SCI论文90余篇。获得中国发明专利10项。研究方向:化学法制备科学(溶胶凝胶法、金属有机气相沉积法、原子层化学沉积法):薄膜生长工艺、动力学、机理和微结构;自聚集制备科学;集成铁电学基础:铁电薄膜和栅介电薄膜与硅的集成;有机极化功能聚合物材料的制备与极化特性。

   Dr. Wei-Min Li(黎微明博士):(born 1967) received his M.Sc. and Ph.D. degrees in inorganic chemistry from University of Helsinki in 1994, and 2000 respectively. After graduation, he joined ASM Microchemistry Ltd. as a Senior Process Engineer for R&D of ALD technology. In 2006, he joined Silecs Oy and worked on process and development of siloxane polymers. He has held multiple managerial roles in process/application management, sales and marketing, product platform development and project management. With Picosun he holds the position of Application Director with emphasis on industrial applications of ALD technology.

   Dr. Wei-Min Li started work with ALD technology over fifteen years ago and was among the first Chinese worked in the field of ALD technology. He has gained experiences in thin film materials, processes and equipments for a wide range of applications in semiconductor, CMOS image sensor, flat panel display, and photovoltaic industries. He is an author or co-author of over 30 publications and an inventor of more than 10 patents/applications in the field of ALD.

   关于Picosun Oy

   Picosun是一家致力于开发和生产原子层沉积系统(ALD)的公司。ALD主要应用于微米和纳米技术方面。在芬兰,Picosun公司连续拥有ALD反应器生产的专有技术已经长达三十多年。Picosun公司坐落于芬兰的Espoo,其美国总部在底特律。使用SUNALE型ALD系统的用户遍布全球,包括顶级高校与科研机构。

   ALD技术背景介绍

   ALD技术于1974年由芬兰PICOSUN公司的董事Tuomo Suntola博士发明,国外已经实现产业化,比如英特尔公司研发的45/32纳米芯片中的高介电薄膜。由于该发明及其在ALD研究方面的杰出贡献,Tuomo Suntola博士2004年荣获欧洲SEMI奖。

   我们热切的希望能够给您提供一个与专家和同行交流的平台。会议详情请参阅附件,谢谢您的支持!

   报名方式:您可以回复邮件填写报名回执或者通过电话与李晓明小姐联系,报名参会。

   联系电话:010-64415767-21,010-64448295-21,13810030243。

   邮箱:xmli@honoprof.com

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