张卫教授：1995年6月毕业于西安交通大学，获博士学位。1995-1997年在复旦大学做博士后，1997年起任教于复旦大学，1999年晋升为教授。现任复旦大学微电子学系系主任、复旦-Novellus互连研究中心主任，“极大规模集成电路制造装备及成套工艺”国家重大专项(02专项)总体组专家、上海市科学技术预见专家。在Applied Physics Letters、Journal of Applied Physics等国际期刊和会议上发表论文180多篇，申请专利15项，合作出版学术著作1部。曾获得教育部二等奖。
Prof. Lauri Niinistö: was born in Helsinki, Finland, in 1941. He received his M.Sc. and D. Techn. Degrees from Helsinki University of Technology in 1968 and 1973, respectively. His doctoral research on the synthesis and crystal structures of metal sulfates and sulfides was partly conducted at the University of Stockholm in 1971-1972. Since 1977 he has been Professor of Inorganic Chemistry at TKK but also worked in France, USA, Austria, and Hungary. He started the world first academic research on ALD technology (originally known as ALE) in 198? and was instrumental in ALD technology development over three decays.
Prof. Mikko Ritala: (born 1968) received his M.Sc. degree in 1991 from University of Turku, and Ph.D. degree in 1994 from University of Helsinki, both in inorganic chemistry. During 1995 -2003 he worked at University of Helsinki, first as a postdoctoral researcher and then as an academy research fellow, both posts granted by Academy of Finland. In 2003 he was nominated as a professor of inorganic materials chemistry at University of Helsinki.
His main research activity is in Atomic Layer Deposition (ALD) of thin films for microelectronics and other applications. Real time reaction mechanism studies form an important part of this research. Another research area is preparation of nanostructured materials by for example templating with ALD and electrodeposition, and electrospinning of nanofibres. He has published about 280 papers and holds several patents. In 2007 he was nominated as ISI Highly Cited Author in the field of materials science. He is an instructor of the American Vacuum Society’s short course on Atomic layer Deposition and has given tutorials on the same topic also in other occasions. He has also given numerous invited talks in international conferences and has participated in organization of numerous international conferences.
Mikko Ritala is active in Finnish chemical societies. He has been a member of the board of the Finnish Chemical Society since 1999 (chairman 2002-2003, vice chairman 2000-2001), and a member of the board of the Association of Finnish Chemical Societies since 2001. Mikko Ritala is also a member of Finnish Academy of Science and Letters (2009).
Dr. Wei-Min Li（黎微明博士）：(born 1967) received his M.Sc. and Ph.D. degrees in inorganic chemistry from University of Helsinki in 1994, and 2000 respectively. After graduation, he joined ASM Microchemistry Ltd. as a Senior Process Engineer for R&D of ALD technology. In 2006, he joined Silecs Oy and worked on process and development of siloxane polymers. He has held multiple managerial roles in process/application management, sales and marketing, product platform development and project management. With Picosun he holds the position of Application Director with emphasis on industrial applications of ALD technology.
Dr. Wei-Min Li started work with ALD technology over fifteen years ago and was among the first Chinese worked in the field of ALD technology. He has gained experiences in thin film materials, processes and equipments for a wide range of applications in semiconductor, CMOS image sensor, flat panel display, and photovoltaic industries. He is an author or co-author of over 30 publications and an inventor of more than 10 patents/applications in the field of ALD.
ALD技术于1974年由芬兰PICOSUN公司的董事Tuomo Suntola博士发明，国外已经实现产业化，比如英特尔公司研发的45/32纳米芯片中的高介电薄膜。由于该发明及其在ALD研究方面的杰出贡献，Tuomo Suntola博士2004年荣获欧洲SEMI奖。