DIN 50451-2:2003
半导体工艺材料测试.液体中痕量元素测定.第2部分:用等离子感应发射分光光度测定法测定氢氟酸中钴(Co)、铬(Cr)、铜(Ca)、铁(Fe)和镍(Ni)的含量

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectros


DIN 50451-2:2003


标准号
DIN 50451-2:2003
发布
2003年
发布单位
德国标准化学会
当前最新
DIN 50451-2:2003
 
 
被代替标准
DIN 50451-2:1990 DIN 50451-2:2002
适用范围
The document specifies a method for testing hydrofluoric acid for the metal traces of cobalt (Co), chromium (Cr), copper (Cu), iron (Fe), and nickel (Ni) relevant to semiconductor technology. Emission spectroscopy with plasma excitation (for example, inductively coupled plasma (ICP) or direct current plasma (DCP)) is used for the determination. The range of application covers trace element mass fractions from 1 ng/g to 1000 ng/g.#,,#

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