DIN ISO 10110-7-2009
光学和光子学.光学元件和系统的制图准备.第7部分:表面缺陷公差(ISO 10110-7:2008),DIN ISO 10110-7:2009-06的英文版本

Optics and photonics - Preparation of drawings for optical elements and systems - Part 7: Surface imperfection tolerances (ISO 10110-7:2008); English version of DIN ISO 10110-7:2009-06


 

 

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标准号
DIN ISO 10110-7-2009
发布日期
2009年06月
实施日期
废止日期
中国标准分类号
N30
国际标准分类号
01.100.20;37.020
发布单位
DE-DIN
引用标准
ISO 10110-1-2006 ISO 14997-2003
代替标准
DIN ISO 10110-7-2018
被代替标准
DIN 58170-54-1980 DIN ISO 10110-7-2008 DIN ISO 10110-7-2000
适用范围
ISO 10110 specifies the presentation of design and functional requirements for single optical elements and for optical assemblies in technical drawings used for their manufacture and inspection. This part of ISO 10110 specifies the indication of the level of acceptability of surface imperfections within the effective aperture of individual optical elements and optical assemblies. These include localized surface imperfections, edge chips and long scratches. It is to be noted that the acceptance level for localized imperfections is specified taking into account functional effects (affecting image formation or durability of the optical element) as well as cosmetic (appearance) effects. This part of ISO 10110 applies to transmitting and reflecting surfaces of finished optical elements, whether or not they are coated, and to optical assemblies. It recognizes that permissible imperfections may be specified according to the area affected by imperfections on components or in optical assemblies.

DIN ISO 10110-7-2009系列标准

DIN ISO 10110-1-2007 光学和光子学.光学元件和系统制图的准备.第1部分:总则 DIN ISO 10110-10-2004 光学和光子学.光学元件和系统图形制备.第10部分:光学元件和粘结组件的数据表 DIN ISO 10110-11-2016 光学和光子学.光学元件和系统用图纸制备.第11部分:非公差数据(ISO 10110-11-2016) DIN ISO 10110-12-2021 DIN ISO 10110-14-2008 光学和光子学.光学元件和系统的图形制备.第14部分:波阵面变形公差(ISO 10110-14-2007).英文版本DIN ISO 10110-14-2008 DIN ISO 10110-17-2004 光学和光子学.光学元件和系统制图准备.第17部分:激光辐照损伤阈 DIN ISO 10110-2-2000 光学和光学仪器.光学元件和系统的图形制备.第2部分:材料缺陷.应力双折射 DIN ISO 10110-3-2000 光学和光学仪器.光学元件和系统的图形制备.第3部分:材料缺陷.气泡和杂质 DIN ISO 10110-4-2000 光学和光学仪器.光学元件和系统的图形制备.第4部分:材料缺陷.不均匀性和划痕 DIN ISO 10110-5 Bb.1-2003 光学及光学仪器.光学元件和系统图样绘制.第5部分:表面形状公差.用检验镜检验表面形状公差 DIN ISO 10110-5-2016 光学和光子学.光学元件和系统的图形制备.第5部分:表面形状公差(ISO 10110-5-2015) DIN ISO 10110-6-2016 光学和光子学.光学元件和系统图形的制备.第6部分:中心公差 DIN ISO 10110-8-2012 光学及光学仪器.光学元件和系统图形的制备.第8部分:表面构造.粗糙度和波纹(ISO 10110-8-2010) DIN ISO 10110-9-2016 光学和光子学.光学元件和系统制图准备.第9部分:表面处理和镀层(ISO 10110-9-2016)

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