UVISEL Plus椭偏仪

仪器简介：
 椭圆偏振光谱是一种无损无接触的光学测量技术，基于测量线偏振光经过薄膜样品反射后偏振状态发生的改变，通过模型拟合后得到薄膜、界面和表面粗糙层的厚度以及光学性质等等，可测厚度范围为几埃至几十微米。此外，还可以测试材料的反射率及透过率。

技术参数：

       * 光谱范围: 190-885 nm（可扩展至2100nm）
       * 微光斑可选50µm-100µm-1mm
       * 探测器：分别针对紫外，可见和近红外提供优化的PMT和IGA探测器
       * 自动样品台尺寸：多种样品台可选
       * 自动量角器：变角范围40° - 90°，全自动调整，小步长0.01°

主要特点：
       * 50KHz 高频PEM 相调制技术，测量光路中无运动部件
       * 具备超薄膜所需的测量精度，超厚膜所需的高光谱分辨率
       * 具有毫秒级超快动态采集模式，可用于在线实时监测
       * 自动平台样品扫描成像、变温台、电化学反应池、液体池、密封池等多种附件
       * 配置灵活  

HORIBA推出新的模块化椭偏仪Uvisel Plus

分析测试百科网讯 近日，HORIBA公司宣布推出新的模块化椭偏仪——Uvisel Plus，旨在提高薄膜测量的灵活性。

　　该设备配备了尖端的FastAcq采集技术，利用新的电子数据处理和高速单色仪，可以在三分钟内完成190到2100nm范围内的样品高分辨率测量。

　　该设计的另一个关键因素是其在光路中不包含旋转元件或附加组件，为精确的椭偏参数测量提供最纯净和高效的偏振调制。

　　Uvisel Plus为图案样本的微孔提供低至50μm，可变角度从40°到90°的自动水平绘图阶段和附件，以满足各种应用和预算需求。

　　该公司表示：“Uvisel Plus及FastAcq技术是材料研究和加工、平板显示器、微电子和光伏领域薄膜厚度和光学常数测量中最多功能的光谱椭偏仪。”

UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

The Reference Ellipsometer for Thin Film Measurements

The UVISEL Plus ellipsometer offers the best combination of modularity and performance for advanced thin film, surface and interface characterization.

The new UVISEL Plus includes the newest acquisition technology designed to measure faster and more accurately than ever. FastAcq, the newest acquisition technology, is based on double modulation, designed for real world thin film characterization. Based on a new electronic, data processing and high speed monochromator, the new FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution.

Based on phase modulation technology, the UVISEL Plus ellipsometer provides a powerful optical design to continuously cover the spectral range from 190 to 2100 nm. High quality data are delivered across the whole spectral range in terms of high accuracy, high resolution measurements and excellent signal to noise ratio.

The phase modulation technology characterizes polarization changes at high frequency (50 kHz), and without any mechanical movement. It results in:

• High accuracy measurements for all values of (Ψ,Δ)

• Excellent signal/noise ratio from the FUV to NIR

• Very fast data acquisition speed at up to 50 ms/point ideal for kinetic studies and in-situ real-time measurements

The UVISEL Plus phase modulated ellipsometer achieves higher sensitivity and accuracy for characterizing thin films when compared to conventional ellipsometers using rotating elements. It enables the detection of very thin films or interfaces that no other ellipsometers can see as well as the characterization of thick layers up to 50µm. The measurement and characterization of transparent samples with backside reflections are simple and accurate and doesn't require the scratch of the backside.

Designed for enhanced flexibility for thin film measurements, the UVISEL Plus offers microspots for patterned samples, variable angle, automatic mapping stage and a variety of accessories, making it scalable to meet all of your application and budget needs.
The modular design of the UVISEL Plus makes it possible to be used either as a benchtop metrology tool, or for in-situ integration on process chambers. or roll to roll machines.

The UVISEL Plus is controlled by either the DeltaPsi2 software platform or the Auto-Soft interface that are common to all HORIBA ellipsometers. DeltaPsi2 provides a complete measurement and modelling package allowing to address both routine and advanced thin film applications, while the Auto-Soft interface features an intuitive worksflow to speed up data collection and analysis.

The UVISEL Plus and its FastAcq technology is the most versatile spectroscopic ellipsometer for thin film thickness and optical constant measurementsin the fields of materials research and processing, flat panel displays, microelectronics and photovoltaics.

The UVISEL Plus is considered a Reference ellipsometer for ultimate materials science.

Segment: Scientific

Division: Surface Characterization

Manufacturing Company: HORIBA France SAS

特点：

Product benefits

• Highest accuracy and sensitivity

• Modular design

• Large spectral range: 190-2100 nm

• Fully integrated software package for measurement, modelling and automatic operations

Obtained information

• Thin film thickness from 1Å to 50 µm

• Surface and interface roughness

• Optical constants (n,k) for isotropic, anisotropic and graded films

• Derived optical data such as: absorption coefficient α, optical bandgap Eg

• Material properties: compound alloy composition, porosity, crystallinity, morphology and more

• Mueller matrix

• Depolarization