ASTM E983-2005
俄歇电子光谱仪中干扰电子束效应最小化的标准指南

Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy

ASTM E983-2005 发布历史

1.1 This guide outlines the origins and manifestations of unwanted electron beam effects in Auger electron spectroscopy (AES).

1.2 Some general guidelines are provided concerning the electron beam parameters which are most likely to produce these effects and suggestions are offered on how to minimize them.

1.3 General classes of materials are identified which are most likely to exhibit unwanted electron beam effects. In addition, a tabulation of some specific materials which have been observed to undergo electron damage effects is provided.

1.4 A simple method is outlined for establishing the existence and extent of these effects during routine AES analysis.

1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

ASTM E983-2005由美国材料与试验协会 US-ASTM 发布于 2005。

ASTM E983-2005 在中国标准分类中归属于: N51 物性分析仪器。

ASTM E983-2005的历代版本如下：

• 2005年07月25日 ASTM E983-05 俄歇电子光谱法中最小化不需要的电子束效应的标准指南
• 2010年11月01日 ASTM E983-10 俄歇电子光谱法中最小化不需要的电子束效应的标准指南
• 2018年11月01日 ASTM E983-10(2018) 俄歇电子光谱法中最小化不需要的电子束效应的标准指南
• 2019年04月01日 ASTM E983-19 俄歇电子光谱法中最小化不需要的电子束效应的标准指南
• 1994年 ASTM E983-1994(1999)
• 2005年 ASTM E983-2005 俄歇电子光谱仪中干扰电子束效应最小化的标准指南
• 2010年 ASTM E983-2010 在俄歇电子谱法中测定化学效应和基质效应的标准指南
• 1999年09月10日 ASTM E983-94(1999) 俄歇电子光谱法中最小化不需要的电子束效应的标准指南

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标准号

ASTM E983-2005

发布日期

2005年

实施日期

废止日期

无

中国标准分类号

N51

国际标准分类号

17.180.30 (Optical measuring instruments)

发布单位

US-ASTM

适用范围

1.1 This guide outlines the origins and manifestations of unwanted electron beam effects in Auger electron spectroscopy (AES).

1.2 Some general guidelines are provided concerning the electron beam parameters which are most likely to produce these effects and suggestions are offered on how to minimize them.

1.3 General classes of materials are identified which are most likely to exhibit unwanted electron beam effects. In addition, a tabulation of some specific materials which have been observed to undergo electron damage effects is provided.

1.4 A simple method is outlined for establishing the existence and extent of these effects during routine AES analysis.

1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

ASTM E983-2005 中可能用到的仪器设备