DIN ISO 10110-14-2008
光学和光子学.光学元件和系统的图形制备.第14部分:波阵面变形公差(ISO 10110-14-2007).英文版本DIN ISO 10110-14-2008

Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance (ISO 10110-14:2007); English version of DIN ISO 10110-14:2008-12


DIN ISO 10110-14-2008 发布历史

The ISO 10110 series applies to the presentation of design and functional requirements for optical elements and assemblies in technical drawings used for manufacturing and inspection. This part of ISO 10110 gives rules for the indication of the permissible deformation of a wavefront transmitted through or, in the case of reflective optics, reflected from an optical element or assembly. The deformation of the wavefront refers to its departure from the desired shape. The tilt of the wavefront with respect to a given reference surface is excluded from the scope of this part of ISO 10110. There is no requirement that a tolerance for wavefront deformation be indicated. If such a tolerance is specified, it does not take precedence over a tolerance for the surface form according to ISO 10110-5. If tolerances for both the surface form and the wavefront deformation are given, they must both be upheld.

DIN ISO 10110-14-2008由德国标准化学会 DE-DIN 发布于 2008-12。

DIN ISO 10110-14-2008 在中国标准分类中归属于: N30 光学仪器综合,在国际标准分类中归属于: 01.100.20 机械工程制图,37.020 光学设备。

DIN ISO 10110-14-2008 发布之时,引用了标准

  • ISO 10110-1-2006 光学和光学仪器.光学元件和系统制图准备.第1部分:总则
  • ISO/TR 14999-2 光学和光子学 - 光学元件和光学系统的干涉测量 - 第2部分:测量和评估技术*2019-07-22 更新
  • ISO 14999-4-2007 光学和光子学.光学元件和光学系统的干涉仪测量.第4部分:ISO 10110中指定公差的注释和评定

* 在 DIN ISO 10110-14-2008 发布之后有更新,请注意新发布标准的变化。

DIN ISO 10110-14-2008的历代版本如下:

  • 2008年12月 DIN ISO 10110-14-2008 光学和光子学.光学元件和系统的图形制备.第14部分:波阵面变形公差(ISO 10110-14-2007).英文版本DIN ISO 10110-14-2008

 

 

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标准号
DIN ISO 10110-14-2008
发布日期
2008年12月
实施日期
废止日期
中国标准分类号
N30
国际标准分类号
01.100.20;37.020
发布单位
DE-DIN
引用标准
ISO 10110-1-2006 ISO/TR 14999-2 ISO 14999-4-2007
被代替标准
DIN ISO 10110-14-2004
适用范围
The ISO 10110 series applies to the presentation of design and functional requirements for optical elements and assemblies in technical drawings used for manufacturing and inspection. This part of ISO 10110 gives rules for the indication of the permissible deformation of a wavefront transmitted through or, in the case of reflective optics, reflected from an optical element or assembly. The deformation of the wavefront refers to its departure from the desired shape. The tilt of the wavefront with respect to a given reference surface is excluded from the scope of this part of ISO 10110. There is no requirement that a tolerance for wavefront deformation be indicated. If such a tolerance is specified, it does not take precedence over a tolerance for the surface form according to ISO 10110-5. If tolerances for both the surface form and the wavefront deformation are given, they must both be upheld.

DIN ISO 10110-14-2008系列标准

DIN ISO 10110-1-2007 光学和光子学.光学元件和系统制图的准备.第1部分:总则 DIN ISO 10110-10-2004 光学和光子学.光学元件和系统图形制备.第10部分:光学元件和粘结组件的数据表 DIN ISO 10110-11-2016 光学和光子学.光学元件和系统用图纸制备.第11部分:非公差数据(ISO 10110-11-2016) DIN ISO 10110-12-2021 DIN ISO 10110-17-2004 光学和光子学.光学元件和系统制图准备.第17部分:激光辐照损伤阈 DIN ISO 10110-2-2000 光学和光学仪器.光学元件和系统的图形制备.第2部分:材料缺陷.应力双折射 DIN ISO 10110-3-2000 光学和光学仪器.光学元件和系统的图形制备.第3部分:材料缺陷.气泡和杂质 DIN ISO 10110-4-2000 光学和光学仪器.光学元件和系统的图形制备.第4部分:材料缺陷.不均匀性和划痕 DIN ISO 10110-5 Bb.1-2003 光学及光学仪器.光学元件和系统图样绘制.第5部分:表面形状公差.用检验镜检验表面形状公差 DIN ISO 10110-5-2016 光学和光子学.光学元件和系统的图形制备.第5部分:表面形状公差(ISO 10110-5-2015) DIN ISO 10110-6-2016 光学和光子学.光学元件和系统图形的制备.第6部分:中心公差 DIN ISO 10110-7-2018 光学和光子学.光学元件和系统的制图准备.第7部分:表面缺陷(ISO 10110-7-2017) DIN ISO 10110-8-2012 光学及光学仪器.光学元件和系统图形的制备.第8部分:表面构造.粗糙度和波纹(ISO 10110-8-2010) DIN ISO 10110-9-2016 光学和光子学.光学元件和系统制图准备.第9部分:表面处理和镀层(ISO 10110-9-2016)

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