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Sputtering Coater
Sputtering Coater, Total:39 items.
In the international standard classification, Sputtering Coater involves: Vacuum technology, Products of non-ferrous metals, Medical equipment, Surface treatment and coating, Optics and optical measurements, Glass, Electronic display devices, Non-ferrous metals, Jewellery, Linear and angular measurements, Organic chemicals.
Professional Standard - Machinery, Sputtering Coater
Group Standards of the People's Republic of China, Sputtering Coater
- T/GVS 002-2021 Generic specification for high precision magnetron sputtering coating plant
- T/CSEA 15-2021 Vacuum Magnetron Sputtering Silver Plating Technology and Quality Inspection
- T/ZZB 1790-2020 Sputter equipment for Cu-In-Ga-Se thin film solar cells
- T/SZS 4034-2021 Process specification of rhodium film deposited on precious metals jewelry surface by magnetron sputtering
- T/ZZB 2003-2020 Low emissivity coated glass for building
- T/ZBH 005-2018 Anti-reflective coated glass for building
Society of Automotive Engineers (SAE), Sputtering Coater
Professional Standard - Non-ferrous Metal, Sputtering Coater
- YS/T 819-2012 High-purity sputtering copper target used in electronic film
- YS/T 893-2013 High-purity sputtering titanium target used in electronic film
- YS/T 718-2009 Flat magneting sputtering target.Niobium target for optical coating
- YS/T 719-2009 Flat magneting sputtering target.Silicon target for optical coating
- YS/T 1025-2015 High-purity tungsten and tungsten alloy sputtering target used in electronic film
American Society for Testing and Materials (ASTM), Sputtering Coater
- ASTM F136-98e1 Standard Specification for Wrought Titanium-6 Aluminum-4 Vanadium ELI (Extra Low Interstitial) Alloy (UNS R56401) for Surgical Implant Applications
- ASTM F136-08 Standard Specification for Wrought Titanium-6 Aluminum-4 Vanadium ELI (Extra Low Interstitial) Alloy for Surgical Implant Applications (UNS R56401)
- ASTM F136-13(2021)e1 Standard Specification for Wrought Titanium-6Aluminum-4Vanadium ELI (Extra Low Interstitial) Alloy for Surgical Implant Applications (UNS R56401)
- ASTM F1367-98(2011) Standard Specification for Chromium Sputtering Targets for Thin Film Applications
- ASTM F1709-97 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2016) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2002) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2008) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Sputtering Coater
- GB/T 18915.2-2002 Coated glass--Part2: Low emissivity coated glass
- GB/T 18915.2-2013 Coated glass.Part 2:Low emissivity coated glass
- GB/T 29658-2013 High-purity sputtering aluminium and aluminium alloy target used in electronic film
- GB/T 31227-2014 Test method for the surface roughness by atomic force microscope for sputtered thin films
Military Standard of the People's Republic of China-General Armament Department, Sputtering Coater
- GJB 3032-1997 Specification for sputtered molybdenum disulfide-based self-lubricating solid films
RU-GOST R, Sputtering Coater
Professional Standard - Building Materials, Sputtering Coater
U.S. Military Regulations and Norms, Sputtering Coater
Professional Standard - Light Industry, Sputtering Coater
- QB 2682-2005 Properties and quality requirement for anti-reflection coating of spectacles lenses
工业和信息化部, Sputtering Coater
- HG/T 5300-2018 Refractive index matching hardened film for indium tin oxide (ITO) coating