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Chromatic optical system

Chromatic optical system, Total:494 items.

In the international standard classification, Chromatic optical system involves: Optical equipment, Technical drawings, Optics and optical measurements, Graphic technology, Optoelectronics. Laser equipment, Linear and angular measurements, Paints and varnishes, Radiation measurements, Fibre optic communications, Quality, (No title), Solar energy engineering, Vocabularies, Glass, Telecontrol. Telemetering, Telecommunication systems, Medical equipment, Pipeline components and pipelines, Colour coding, Production in the chemical industry, Lamps and related equipment, Character sets and information coding, Installations in buildings, Data storage devices, Particle size analysis. Sieving, Audio, video and audiovisual engineering.


British Standards Institution (BSI), Chromatic optical system

  • BS ISO 15795:2002 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations
  • BS ISO 10110-7:2008 Optics and photonics - Preparation of drawings for optical elements and systems - Surface imperfection tolerances
  • BS ISO 10110-5:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Surface form tolerances
  • BS ISO 10110-11:1996 Optics and photonics - Preparation of drawings for optical elements and systems - Non-toleranced data
  • BS ISO 10110-6:2015 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Centring tolerances
  • BS ISO 10110-6:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Centring tolerances
  • BS ISO 10110-11:2016 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Non-toleranced data
  • BS ISO 10110-14:2018 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Wavefront deformation tolerance
  • BS ISO 10110-5:2015 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Surface form tolerances
  • BS ISO 14999-4:2007 Optics and photonics - Interferometric measurement of optical elements and optical systems - Interpretation and evaluation of tolerances specified in ISO 10110
  • BS ISO 14999-4:2015 Tracked Changes. Optics and photonics. Interferometric measurement of optical elements and optical systems. Interpretation and evaluation of tolerances specified in ISO 10110
  • BS EN ISO 14880-2:2007 Optics and photonics - Microlens arrays - Test methods for wavefront aberrations
  • BS ISO 14490-10:2021 Optics and photonics. Test methods for telescopic systems. Test methods for axial colour performance
  • BS EN ISO 14880-3:2006 Optics and photonics - Microlens arrays - Test methods for optical properties other than wavefront aberrations
  • BS 3900-D8:1986 Methods of test for paints. Optical tests on paint films. Determination of colour and colour difference: principles
  • BS 3900-D9:1986 Methods of test for paints. Optical tests on paint films. Determination of colour and colour difference: measurement
  • BS ISO 9039:2007 Optics and photonics - Quality evaluation of optical systems - Determination of distortion
  • BS ISO 10110-1:2006 Optics and photonics - Preparation of drawings for optical elements and systems - General
  • BS ISO 9039:2008 Optics and photonics. Quality evaluation of optical systems. Determination of distortion
  • PD ISO/TR 21477:2017 Optics and photonics. Preparation of drawings for optical elements and systems. Surface imperfection specification and measurement systems
  • PD ISO/TR 14999-1:2005 Optics and photonics. Interferometric measurement of optical elements and optical systems. Terms, definitions and fundamental relationships
  • BS ISO 10110-1:2019 Optics and photonics. Preparation of drawings for optical elements and systems - General
  • PD ISO/TR 16743:2013 Optics and photonics. Wavefront sensors for characterising optical systems and optical components
  • BS ISO 10110-12:2019 Optics and photonics. Preparation of drawings for optical elements and systems - Aspheric surfaces
  • BS ISO 15559:1998 Practice for use of a radiochromic optical waveguide dosimetry system
  • BS ISO 15559:1999 Practice for use of a radiochromic optical waveguide dosimetry system
  • BS ISO 10110-12:2008 Optics and photonics. Preparation of drawings for optical elements and systems. Aspheric surfaces
  • BS ISO 10110-12:2007+A1:2013 Optics and photonics. Preparation of drawings for optical elements and systems. Aspheric surfaces
  • BS ISO 10110-8:2019 Optics and photonics. Preparation of drawings for optical elements and systems - Surface texture
  • BS ISO 10110-16:2023 Optics and photonics. Preparation of drawings for optical elements and systems. Diffractive surfaces
  • BS ISO 10110-17:2004 Optics and optical instruments - Preparation of drawings for optical elements and systems - Laser irradiation damage threshold
  • PD IEC TS 62977-3-1:2019 Electronic displays. Evaluation of optical performances. Colour difference based viewing direction dependence
  • BS ISO 10110-8:1998 Optics and optical instruments - Preparation of drawings for optical elements and systems - Surface texture
  • BS ISO 10110-8:2010 Optics and photonics. Preparation of drawings for optical elements and systems. Surface texture; roughness and waviness
  • PD IEC TS 62989:2018 Primary optics for concentrator photovoltaic systems
  • 20/30388069 DC BS ISO 14490-10. Optics and photonics. Test methods for telescopic systems. Part 10. Test methods for axial colour performance
  • BS ISO 14490-2:2005 Optics and optical instruments. Test methods for telescopic systems - Test methods for binocular systems
  • BS ISO 14132-3:2014 Optics and photonics. Vocabulary for telescopic systems. Terms for telescopic sights
  • BS ISO 14132-3:2021 Optics and photonics. Vocabulary for telescopic systems. Terms for telescopic sights
  • BS ISO 10110-13:1998 Optics and optical instruments. Preparation of drawings for optical elements and systems. Laser irradiation damage threshold
  • BS 7012-12:1997 Light microscopes. Reference system of polarized light microscopy
  • PD ISO/TR 14999-2:2019 Tracked Changes. Optics and photonics. Interferometric measurement of optical elements and optical systems. Measurement and evaluation techniques
  • BS ISO 10110-7:2017 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Surface imperfections
  • BS ISO 20711:2017 Optics and photonics. Environmental requirements. Test requirements for telescopic systems
  • PD IEC TR 61282-7:2003 Fibre optic communication system design guides. Statistical calculation of chromatic dispersion
  • BS ISO 14490-2:2006 Optics and optical instruments - Test methods for telescopic systems - Test methods for binocular systems
  • BS ISO 10109-4:2001 Optics and optical instruments - Environmental requirements - Test requirements for telescopic systems
  • BS ISO 14490-8:2011 Optics and optical instruments. Test methods for telescopic systems. Test methods for night-vision devices
  • PD ISO/TR 14999-3:2005 Optics and photonics. Interferometric measurement of optical elements and optical systems. Calibration and validation of interferometric test equipment and measurements
  • BS ISO 10110-10:2005 Optics and photonics. Preparation of drawings for optical elements and systems. Table representing data of optical elements and cemented assemblies
  • BS ISO 9345-2:2003 Optics and optical instruments - Microscopes - Imaging distances related to mechanical reference planes - Infinity-corrected optical systems
  • BS ISO 10110-10:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Table representing data of optical elements and cemented assemblies
  • BS ISO 10110-19:2015 Optics and photonics. Preparation of drawings for optical elements and systems. General description of surfaces and components
  • BS ISO 10110-9:2016 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Surface treatment and coating
  • 18/30332797 DC BS ISO 10110-12. Optics and photonics. Preparation of drawings for optical elements and systems. Part 12. Aspheric surfaces
  • BS ISO 9358:1994 Optics and optical instruments. Veiling glare of image forming systems. Definitions and methods of measurement
  • BS ISO 14490-9:2019 Optics and photonics. Test methods for telescopic systems - Test methods for field curvature
  • 16/30324510 DC BS ISO 20711. Optics and photonics. Environmental requirements. Test requirements for telescopic systems
  • BS ISO 10110-9:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Surface treatment and coating
  • 22/30430316 DC BS ISO 10110-16. Optics and photonics. Preparation of drawings for optical elements and systems - Part 16. Diffractive surfaces
  • BS EN 61280-2-2:2012 Fibre optic communication subsystem test procedures. Digital systems. Optical eye pattern, waveform and extinction ratio measurement
  • BS 4301:1991 Recommendations for preparation of drawings for optical elements and systems
  • BS ISO 14490-1:2005 Optics and optical instruments. Test methods for telescopic systems - Test methods for basic characteristics
  • BS ISO 14490-6:2005 Optics and optical instruments - Test methods for telescopic systems - Test methods for veiling glare index
  • BS ISO 14490-6:2014 Optics and photonics. Test methods for telescopic systems. Test methods for veiling glare index
  • BS ISO 10110-2:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Material imperfections - Stress birefringence
  • BS ISO 10110-3:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Material imperfections - Bubbles and inclusions
  • BS ISO 15529:2010 Optics and photonics. Optical transfer function. Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • BS EN ISO 8624:2011 Ophthalmic optics. Spectacle frames. Measuring system and terminology
  • BS ISO 13099-2:2012 Colloidal systems. Methods for zetapotential determination. Optical methods
  • BS EN ISO 8624:2020 Ophthalmic optics. Spectacle frames. Measuring system and vocabulary
  • BS 4995:1973 Recommendations for measurement of the veiling glare index of lenses and optical systems
  • BS ISO 14490-5:2006 Optics and optical instruments - Test methods for telescopic systems - Test methods for transmittance
  • BS ISO 14490-4:2006 Optics and optical instruments - Test methods for telescopic systems - Test methods for astronomical telescopes
  • BS ISO 14490-4:2005 Optics and optical instruments. Test methods for telescopic systems - Test methods for astronomical telescopes
  • BS ISO 10110-4:1997 Optics and optical instruments - Preparation of drawings for optical elements and systems - Material imperfections - Inhomogeneity and striae

German Institute for Standardization, Chromatic optical system

  • DIN ISO 15795:2008-04 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations (ISO 15795:2002+Cor. 1:2007)
  • DIN ISO 15795:2008 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations (ISO 15795:2002+Cor. 1:2007);English version of DIN ISO 15795:2008-04
  • DIN ISO 15795:2006 Optics and optical instruments - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations (ISO 15795:2002);English version of DIN ISO 15795-2006-03
  • DIN 58172-1:1982 Testing of optical systems; deviations from symmetry
  • DIN ISO 10110-6:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances (ISO 10110-6:2015)
  • DIN ISO 10110-6:2016-06 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances (ISO 10110-6:2015)
  • DIN ISO 10110-6:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances (ISO 10110-6:1996)
  • DIN 58172-1:2007 Testing of optical systems - Part 1: Deviations from symmetry
  • DIN 58172-1:2007-07 Testing of optical systems - Part 1: Deviations from symmetry
  • DIN ISO 10110-11:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data (ISO 10110-11:1996)
  • DIN ISO 10110-14:2019-09 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance (ISO 10110-14:2018)
  • DIN ISO 10110-5:2016-04 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances (ISO 10110-5:2015)
  • DIN ISO 10110-5 Bb.1:2003 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances; Surface form tolerance inspection using testing glasses
  • DIN ISO 10110-11:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data (ISO 10110-11:2016)
  • DIN ISO 10110-5:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances (ISO 10110-5:2015)
  • DIN ISO 10110-14:2019 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance (ISO 10110-14:2018)
  • DIN ISO 14999-4 Beiblatt 1:2020-04 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110; Supplement 1
  • DIN 58170-54:1980 Inscription of dimensions and tolerances for optical systems; blemishes
  • DIN ISO 14999-4:2016 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110 (ISO 14999-4:2015)
  • DIN ISO 14999-4:2016-04 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110 (ISO 14999-4:2015)
  • DIN ISO 10110-5:2008 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances (ISO 10110-5:2007); English version of DIN ISO 10110-5:2008-12
  • DIN ISO/TR 21477:2018-08*DIN SPEC 13477:2018-08 Optics and photonics - Preparation of drawings for optical elements and systems - Surface imperfection specification and measurement Systems (ISO/TR 21477:2017)
  • DIN ISO 9039:2008-08 Optics and photonics - Quality evaluation of optical systems - Determination of distortion (ISO 9039:2008)
  • DIN ISO 10110-7:2009 Optics and photonics - Preparation of drawings for optical elements and systems - Part 7: Surface imperfection tolerances (ISO 10110-7:2008); English version of DIN ISO 10110-7:2009-06
  • DIN ISO 10110-14:2008 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance (ISO 10110-14:2007); English version of DIN ISO 10110-14:2008-12
  • DIN ISO 14999-4:2008 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110 (ISO 14999-4:2007); English version of DIN ISO 14999-4:2008-12
  • DIN ISO 8576:2002-06 Optics and optical instruments - Microscopes - Reference system of polarized light microscopy (ISO 8576:1996)
  • DIN ISO 14490 Beiblatt 1:2016-06 Optics and optical instruments - Test methods for telescopic systems; Supplement 1: Guide for shortened test methods and exemplary test report
  • DIN ISO 10110-1:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General (ISO 10110-1:2006); English version of DIN ISO 10110-1:2007-08
  • DIN ISO 10110-1:2020-09 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General (ISO 10110-1:2019)
  • DIN EN ISO 14880-3:2006 Optics and photonics - Microlens arrays - Part 3: Test methods for optical properties other than wavefront aberrations (ISO 14880-3:2006) English version of DIN EN ISO 14880-3:2006-08
  • DIN ISO 9358:2021-08 Optics and optical instruments - Veiling glare of image-forming systems - Definitions and methods of measurement (ISO 9358:1994)
  • DIN ISO 10110-12:2021-09 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces (ISO 10110-12:2019)
  • DIN 58186:1982 Quality evaluation of optical systems; determination of veiling glare
  • DIN ISO 10110-17:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17: Laser irradiation damage threshold (ISO 10110-17:2004)
  • DIN ISO 20711:2018-01 Optics and photonics - Environmental requirements - Test requirements for telescopic systems (ISO 20711:2017)
  • DIN ISO 8576:2002 Optics and optical instruments - Microscopes - Reference system of polarized light microscopy (ISO 8576:1996)
  • DIN ISO 10110-12:2009 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces (ISO 10110-12:2007); English version of DIN ISO 10110-12:2009-01
  • DIN ISO 10110-17:2004-12 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17: Laser irradiation damage threshold (ISO 10110-17:2004)
  • DIN ISO 10110-10:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 10: Table representing data of optical elements and cemented assemblies (ISO 10110-10:2004)
  • DIN ISO 10110-1:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General (ISO 10110-1:2019)
  • DIN ISO 10110-12:2021 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces (ISO 10110-12:2019)
  • DIN ISO 20711:2018 Optics and photonics - Environmental requirements - Test requirements for telescopic systems (ISO 20711:2017)
  • DIN ISO 10110-7:2018 Optics and photonics - Preparation of drawings for optical elements and systems - Part 7: Surface imperfections (ISO 10110-7:2017)
  • DIN ISO 10110-8:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 8: Surface texture (ISO 10110-8:2019); Text in German and English
  • DIN ISO 10110-9:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating (ISO 10110-9:1996)
  • DIN ISO 10109-7:2002 Optics and optical instruments - Environmental requirements - Part 7: Test requirements for optical measuring systems (ISO 10109-7:2001)
  • DIN ISO 15529:2010-11 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems (ISO 15529:2010)
  • DIN EN 61280-2-9:2009 Fibre optic communication subsystem test procedures - Part 2-9: Digital systems - Optical signal-to-noise ratio measurement for dense wavelength-division multiplexed systems (IEC 61280-2-9:2009); German version EN 61280-2-9:2009
  • DIN EN 60856/A2:1998-08 Pre-recorded optical reflective videodisk system "Laser vision" 50 Hz/625 lines; PAL (IEC 60856:1986/A2:1997); Amendment A2; German version EN 60856:1993/A2:1997
  • DIN ISO 10110-2:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 2: Material imperfections; stress birefringence (ISO 10110-2:1996)
  • DIN ISO 10110-9:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating (ISO 10110-9:2016)
  • DIN ISO 10110-3:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 3: Material imperfections; bubbles and inclusions (ISO 10110-3:1996)
  • DIN ISO 9345-2:2005 Optics and optical instruments - Microscopes - Imaging distances related to mechanical reference planes - Part 2: Infinity-corrected optical systems (ISO 9345-2:2003)
  • DIN ISO 10110-19:2016-04 Optics and photonics - Preparation of drawings for optical elements and systems - Part 19: General description of surfaces and components (ISO 10110-19:2015)
  • DIN ISO 14132-4:2016-07 Optics and photonics - Vocabulary for telescopic systems - Part 4: Terms for astronomical telescopes (ISO 14132-4:2015); Text in German and English
  • DIN ISO 9358:2021 Optics and optical instruments - Veiling glare of image-forming systems - Definitions and methods of measurement (ISO 9358:1994)
  • DIN ISO 14490-5:2007 Optics and optical instruments - Test methods for telescopic systems - Part 5: Test methods for transmittance (ISO 14490-5:2005);English version of DIN ISO 14490-5:2007-06
  • DIN ISO 9358:2020 Optics and optical instruments - Veiling glare of image forming systems - Definitions and methods of measurement (ISO 9358:1994); Text in German and English
  • DIN EN ISO 8624:2020-11 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary (ISO 8624:2020); German version EN ISO 8624:2020
  • DIN ISO 15529:2010 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems (ISO 15529:2010)
  • DIN ISO 14490-2:2006 Optics and optical instruments - Test methods for telescopic systems - Part 2: Test methods for binocular systems (ISO 14490-2:2005) English version of DIN ISO 14490-2:2006-08
  • DIN EN 60856:1994 Pre-recorded optical reflective videodisk system "Laser vision" 50 Hz/625 lines; PAL (IEC 60856:1986 + A1:1993); German version EN 60856:1993 + A1:1993

Association Francaise de Normalisation, Chromatic optical system

  • NF ISO 15795:2002 Optique et photonique - Évaluation de la qualité des systèmes optiques - Estimation de la dégradation de la qualité de l'image due à des aberrations chromatiques
  • NF S10-008-5:2008 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5 : surface form tolerances.
  • NF S10-008-5*NF ISO 10110-5:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5 : surface form tolerances
  • NF ISO 10110-6:2015 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 6 : tolérances de centrage
  • NF S10-008-6*NF ISO 10110-6:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6 : centring tolerances
  • NF S10-008-11*NF ISO 10110-11:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11 : Non-toleranced data
  • NF S10-008-6:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 6 : centring tolerances.
  • NF ISO 10110-5:2015 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 5 : tolérances de forme de surface
  • NF S10-051*NF ISO 15795:2002 Optics and optical instruments - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations
  • NF S10-008-11:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 11 : non-toleranced data.
  • NF S10-008-14*NF ISO 10110-14:2018 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14 : wavefront deformation tolerance
  • NF ISO 10110-14:2018 Optique et photonique - Préparation des dessins pour éléments et systèmes optiques - Partie 14 : tolérance de déformation du front d'onde
  • NF S10-008-14:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14 : wavefront deformation tolerance.
  • NF S10-008-5:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 5 : surface form tolerances.
  • NF S10-008-7:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 7 : surface imperfection tolerances.
  • NF S10-009-4:2007 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4 : interpretation and evaluation of tolerances specified in ISO 10110.
  • NF S10-009-4*NF ISO 14999-4:2015 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4 : interpretation and evaluation of tolerances specified in ISO 10110
  • NF ISO 14999-4:2015 Optique et photonique - Mesurage interférométrique de composants et de systèmes optiques - Partie 4 : directives pour l'évaluation des tolérances spécifiées dans l'ISO 10110
  • NF S10-042:1998 Optics and optical instruments. Quality evaluation of optical systems. Determination of distorsion.
  • NF ISO 9039:2009 Optique et photonique - Évaluation de la qualité des systèmes optiques - Détermination de la distorsion
  • NF ISO 10110-1:2020 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 1 : généralités
  • NF ISO 10110-8:2020 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 8 : état de surface
  • NF S10-008-1:2006 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1 : general.
  • NF S10-008-1*NF ISO 10110-1:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1 : general
  • NF S10-008-1:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 1 : general.
  • NF ISO 10110-12:2020 Optique et photonique - Préparation des dessins pour éléments et systèmes optiques - Partie 12 : surfaces asphériques
  • NF ISO 10110-7:2017 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 7 : imperfection de surface
  • NF S10-008-17*NF ISO 10110-17:2005 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17 : laser irradiation damage threshold
  • NF S10-008-7*NF ISO 10110-7:2017 Optics and photonics - Preparation of drawings for optical elements and systems - Part 7 : surface imperfections
  • NF S10-008-8*NF ISO 10110-8:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 8 : surface texture
  • NF X08-105:1986 Colours. Chemical factories. Marking of fluids in pipes.
  • NF S10-043*NF ISO 9358:1998 Optics and optical instruments. Veiling glare of image-forming systems. Definitions and methods of measurement.
  • NF S10-008-12:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12 : aspheric surfaces.
  • NF ISO 10110-17:2005 Optique et photonics - Préparation des dessins pour éléments et systèmes optiques - Partie 17 : seuil de dommage au rayonnement laser
  • NF S10-008-10:2005 Optics and photonics - Preparation of drawings for optical elements and systems - Part 10 : table representing data of optical elements and cemented assemblies.
  • NF S10-008-12/A1:2013 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: aspheric surfaces - AMENDMENT 1
  • NF ISO 10110-11:2016 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 11 : données non tolérancées
  • NF ISO 10110-9:2016 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 9 : traitement de surface et revêtement
  • NF C43-890*NF EN 62471:2008 Photobiological safety of lamps and lamp systems.
  • NF S10-132-2*NF EN ISO 14880-2:2007 Optics and photonics - Microlens arrays - Part 2 : test methods for wavefront aberrations
  • NF S10-008-9*NF ISO 10110-9:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 9 : surface treatment and coating
  • FD ISO/TR 14999-2:2019 Optique et photonique - Mesurage interférométrique de composants et systèmes optiques - Partie 2 : mesurage et techniques d'évaluation
  • NF S10-008-9:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 9 : surface treatment and coating.
  • NF ISO 9358:1998 Optique et instruments d'optique - Lumière parasite diffuse des systèmes d'imagerie - Définitions et méthodes de mesure.
  • NF S10-050*NF ISO 15529:2011 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • NF ISO 10110-19:2015 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 19 : description générale des surfaces et des composants
  • NF ISO 15529:2011 Optique et photonique - Fonction de transfert optique - Principes de mesure de la fonction de transfert de modulation (MTF) des systèmes de formation d'image échantillonnés
  • NF S10-008-3:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 3 : material imperfections. Bubbles and inclusions.
  • NF S11-520*NF EN ISO 8624:2020 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary
  • NF EN ISO 8624:2020 Optique ophtalmique - Montures de lunettes - Système de mesure et terminologie
  • NF S10-008-19*NF ISO 10110-19:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 19 : general description of surfaces and components
  • NF S10-008-2:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 2 : material imperfections. Stress birefringence.
  • NF EN 60856/A2:1997 Système de vidéodisque optique réfléchissant préenregistré - "Laser vision" 50 Hz/625 lignes - PAL.
  • NF EN 60856:1993 Système de vidéodisque optique réfléchissant préenregistré - "Laser vision" 50 Hz/625 lignes - PAL.
  • NF EN 60856/A1:1993 Système de vidéodisque optique réfléchissant préenregistré - "Laser vision" 50 Hz/625 lignes - PAL.
  • NF C93-807-2-2:2008 Fibre optic communication subsystem test procedures - Part 2-2 : digital systems - Optical eye pattern, waveform and extinction ratio measurement.
  • NF S10-008-8:2010 Optics and photonics - Preparation of drawings for optical elements and systems - Part 8 : surface texture - Roughness and waviness.

Korean Agency for Technology and Standards (KATS), Chromatic optical system

  • KS B ISO 15795:2011 Optics and photonics-Quality evaluation of optical systems-Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 15795-2011(2016) Optics and photonics — Quality evaluation of optical systems —Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 15795-2011(2021) Optics and photonics — Quality evaluation of optical systems —Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 10110-6:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 10110-11:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 11: Non-toleranced data
  • KS B ISO 10110-11:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 11:Non-toleranced data
  • KS B ISO 10110-6:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 10110-6-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 10110-5:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 5: Surface form tolerances
  • KS B ISO 10110-5:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 5:Surface form tolerances
  • KS B ISO 10110-14-2010(2020) Optics and photonics-Preparation of drawings for optical elements and systems-Part 14:Wavefront deformation tolerance
  • KS B ISO 10110-5:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 5: Surface form tolerances
  • KS B ISO 10110-14:2010 Optics and photonics-Preparation of drawings for optical elements and systems-Part 14:Wavefront deformation tolerance
  • KS B ISO 10110-7:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 7:Surface imperfection tolerances
  • KS B ISO 10110-7-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 7:Surface imperfection tolerances
  • KS B ISO 10110-11:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data
  • KS B ISO 14999-4-2016(2021) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS B ISO 14999-4:2011 Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS B ISO 14999-4:2016 Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS B ISO 21094:2011 Optics and photonics-Telescopic systems-Specifications for night vision devices
  • KS B ISO 14880-2:2013 Optics and photonics ― Microlens arrays ― Part 2: Test methods for wavefront aberrations
  • KS B ISO 14880-2:2008 Optics and photonics-Microlens arrays-Part 2:Test methods for wavefront aberrations
  • KS B ISO 9039:2013 Optics and optical instruments ― Quality evaluation of optical systems ― Determination of distortion
  • KS B ISO 9039:2003 Optics and optical instruments-Quality evaluation of optical systems-Determination of distortion
  • KS B ISO 9039:2018 Optics and photonics — Quality evaluation of optical systems — Determination of distortion
  • KS B ISO TR 14999-1-2011(2021) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 1:Terms, definitions and fundamental relationships
  • KS B ISO TR 14999-1-2011(2016) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 1:Terms, definitions and fundamental relationships
  • KS B ISO 10110-1:2017 Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • KS B ISO 21094-2011(2021) Optics and photonics-Telescopic systems-Specifications for night vision devices
  • KS B ISO 21094-2011(2016) Optics and photonics-Telescopic systems-Specifications for night vision devices
  • KS B ISO 8576:2006 Optics and optical instruments-Microscopes-Reference system of polarized light microscopy
  • KS B ISO 10110-1:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 1:General
  • KS B ISO 10110-1-2017(2022) Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • KS B ISO 9358-2006(2016) Optics and optical instruments -- Veiling glare of image forming systems -- Definitions and methods of measurement
  • KS B ISO 9358:2006 Optics and optical instruments Veiling glare of image-forming systems - Definitions and methods of measurement
  • KS B ISO 8576-2006(2021) Optics and optical instruments — Microscopes —Reference system of polarized light microscopy
  • KS B ISO 10110-12:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
  • KS B ISO TR 14999-2-2011(2021) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 2:Measurement and evaluation techniques
  • KS B ISO TR 14999-2-2011(2016) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 2:Measurement and evaluation techniques
  • KS B ISO 10109-4:2006 Optics and optical instruments-Environmental requirements-Part 4:Test requirements for telescopic systems
  • KS B ISO 9358-2006(2021) Optics and optical instruments -- Veiling glare of image forming systems -- Definitions and methods of measurement
  • KS B ISO 10110-12:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 12:Aspheric surfaces
  • KS B ISO 10110-12:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 12: Aspheric surfaces
  • KS B ISO 10110-8:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 8:Surface texture
  • KS B ISO 10110-8-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 8:Surface texture
  • KS B ISO 10110-17:2006 Optics and photonics-Preparation of drawings for optical elements and systems-Part 17:Laser irradiation damage threshold
  • KS B ISO 10110-17-2006(2016) Optics and photonics — Preparation of drawings for optical elements and systems —Part 17: Laser irradiation damage threshold
  • KS B ISO 10110-17-2006(2021) Optics and photonics — Preparation of drawings for optical elements and systems —Part 17: Laser irradiation damage threshold
  • KS B ISO 10110-10:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 10:Table representing data of a lens element
  • KS B ISO 10110-10:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 10: Table representing data of a lens element
  • KS B ISO 10110-9:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 14132-3:2019 Optics and photonics — Vocabulary for telescopic systems — Part 3: Terms for telescopic sights
  • KS B ISO 10110-9-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 10110-9:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 15529-2011(2021) Optics and photonics — Optical transfer function — Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • KS B ISO 15529:2011 Optics and photonics-Optical transfer function-Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • KS B ISO 15529-2011(2016) Optics and photonics — Optical transfer function — Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • KS B ISO 9345-2:2006 Optics and optical instruments-Microscopes:Imaging distances related to mechanical reference planes-Part 2:Infinity-corrected optical systems
  • KS B ISO 10110-2-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 10110-2:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 9345-2:2016 Optics and optical instruments-Microscopes:Imaging distances related to mechanical reference planes-Part 2:Infinity-corrected optical systems
  • KS B ISO 10109-4-2006(2021) Optics and optical instruments — Environmental requirements —Part 4: Test requirements for telescopic systems
  • KS B ISO 14132-4:2019 Optics and photonics — Vocabulary for telescopic systems — Part 4: Terms for astronomical telescope
  • KS B ISO 10110-10:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 10: Table representing data of optical elements and cemented assemblies
  • KS G ISO 8624:2011 Ophthalmic optics-Spectacle frames-Measuring system and terminology
  • KS G ISO 8624-2011(2021) Ophthalmic optics-Spectacle frames-Measuring system and terminology
  • KS G ISO 8624-2011(2016) Ophthalmic optics-Spectacle frames-Measuring system and terminology
  • KS B ISO 10110-2:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 10110-3:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions
  • KS B ISO 10110-3-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions
  • KS B ISO 10110-3:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions
  • KS B ISO 10109-4-2006(2016) Optics and optical instruments — Environmental requirements —Part 4: Test requirements for telescopic systems
  • KS C IEC 61280-2-2:2022 Fibre optic communication subsystem test procedures — Part 2-2: Digital systems — Optical eye pattern, waveform and extinction ratio measurement
  • KS C IEC 61280-2-9-2003(2018)

International Organization for Standardization (ISO), Chromatic optical system

  • ISO 15795:2002 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations
  • ISO 15795:2002/cor 1:2007 Optics and optical instruments - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations; Technical Corrigendum 1
  • ISO 10110-6:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances
  • ISO 10110-6:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances
  • ISO 10110-5:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances
  • ISO 10110-11:1996 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data
  • ISO/CD 10110-11.2 Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data
  • ISO 10110-5:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances
  • ISO 10110-11:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data
  • ISO 10110-7:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 7: Surface imperfection tolerances
  • ISO 10110-5:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances
  • ISO 19012-2:2009 Optics and photonics - Designation of microscope objectives - Part 2: Chromatic correction
  • ISO 10110-14:2003 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance
  • ISO 10110-14:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance
  • ISO/CD 10110-6 Optics and photonics — Preparation of drawings for optical elements and systems — Part 6: Centring and tilt tolerances
  • ISO 10110-7:2017 Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 7: Surface imperfection tolerances
  • ISO 10110-14:2018 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance
  • ISO 10110-6:1996/Cor 1:1999 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances; Technical Corrigendum 1
  • ISO 14999-4:2007 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110
  • ISO 14999-4:2015 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110
  • ISO 10110-11:1996/cor 1:2006 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data; Technical Corrigendum 1
  • ISO 10110-5:1996/Cor 1:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances; Technical Corrigendum 1
  • ISO 21094:2008 Optics and photonics - Telescopic systems - Specifications for night vision devices
  • ISO/CD 6760-1.2 Optics and photonics — Test method for temperature coefficient of refractive index of optical glasses — Part 1: Minimum deviation method
  • ISO/DIS 6760-1:2014 Optics and photonics — Test method for temperature coefficient of refractive index of optical glasses — Part 1: Minimum deviation method
  • ISO 20711:2017 Optics and photonics - Environmental requirements - Test requirements for telescopic systems
  • ISO 14880-2:2006 Optics and photonics - Microlens arrays - Part 2: Test methods for wavefront aberrations
  • ISO/TR 21477:2017 Optics and photonics — Preparation of drawings for optical elements and systems — Surface imperfection specification and measurement systems
  • ISO 9039:1994 Optics and optical instruments - Quality evaluation of optical systems - Determination of distortion
  • ISO 14880-3:2006 Optics and photonics - Microlens arrays - Part 3: Test methods for optical properties other than wavefront aberrations
  • ISO/TR 16743:2013 Optics and photonics - Wavefront sensors for characterising optical systems and optical components
  • ISO 14490-10:2021 Optics and photonics — Test methods for telescopic systems — Part 10: Test methods for axial colour performance
  • ISO 10110-1:2019 Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • ISO/TR 14999-1:2005 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 1: Terms, definitions and fundamental relationships
  • ISO 8576:1996 Optics and optical instruments - Microscopes - Reference system of polarized light microscopy
  • ISO 10110-1:2006 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General
  • ISO 10110-12:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces
  • ISO 10110-1:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 1: General
  • ISO 9358:1994 Optics and optical instruments - Veiling glare of image-forming systems - Definitions and methods of measurement
  • ISO 10110-12:2019 Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
  • ISO/TR 14999-2:2019 Optics and photonics — Interferometric measurement of optical elements and optical systems — Part 2: Measurement and evaluation techniques
  • ISO 10109-4:2001 Optics and optical instruments - Environmental requirements - Part 4: Test requirements for telescopic systems
  • ISO 9039:1994/Cor 1:2004 Optics and optical instruments - Quality evaluation of optical systems - Determination of distortion; Technical Corrigendum 1
  • ISO/FDIS 10110-16 Optics and photonics — Preparation of drawings for optical elements and systems — Part 16: Diffractive surfaces
  • ISO 1011:1973 Optics and photonics — Preparation of drawings for optical elements and systems — Part 8: Surface texture
  • ISO 10110-8:2019 Optics and photonics — Preparation of drawings for optical elements and systems — Part 8: Surface texture
  • ISO 10110-16:2023 Optics and photonics — Preparation of drawings for optical elements and systems — Part 16: Diffractive surfaces
  • ISO/TR 14999-2:2005 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 2: Measurement and evaluation techniques
  • ISO 10110-17:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17: Laser irradiation damage threshold
  • ISO 10110-9:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating
  • ISO 10110-10:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 10: Table representing data of optical elements and cemented assemblies
  • ISO 10110-9:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating
  • ISO 14490-2:2005 Optics and optical instruments - Test methods for telescopic systems - Part 2: Test methods for binocular systems
  • ISO 14132-3:2014 Optics and photonics - Vocabulary for telescopic systems - Part 3: Terms for telescopic sights
  • ISO 10110-12:2007/Amd 1:2013 Optics and photonics.Preparation of drawings for optical elements and systems.Part 12: Aspheric surfaces; Amendment 1
  • ISO 10110-10:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 10: Table representing data of a lens element
  • ISO 10110-19:2015 Optics and photonics — Preparation of drawings for optical elements and systems — Part 19: General description of surfaces and components
  • ISO 17123-8:2007 Optics and optical instruments - Field procedures for testing geodetic and surveying instruments - Part 8: GNSS field measurement systems in real-time kinematic (RTK)
  • ISO 17123-8:2015 Optics and optical instruments - Field procedures for testing geodetic and surveying instruments - Part 8: GNSS field measurement systems in real-time kinematic (RTK)
  • ISO 15529:2007 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • ISO 15529:2010 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • ISO 15529:1999 Optics and optical instruments - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • ISO/TR 14999-3:2005 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 3: Calibration and validation of interferometric test equipment and measurements
  • ISO 8624:2002 Ophthalmic optics - Spectacle frames - Measuring system and terminology
  • ISO 8624:2011 Ophthalmic optics - Spectacle frames - Measuring system and terminology
  • ISO 9345-2:2003 Optics and optical instruments - Microscopes: Imaging distances related to mechanical reference planes - Part 2: Infinity-corrected optical systems
  • ISO 10110-2:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 2: Material imperfections - Stress birefringence
  • ISO 10110-3:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 3: Material imperfections - Bubbles and inclusions
  • ISO 15559:1998 Practice for use of a radiochromic optical waveguide dosimetry system

KR-KS, Chromatic optical system

  • KS B ISO 15795-2023 Optics and optical instruments — Quality evaluation of optical systems — Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 10110-6-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 10110-5-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 5: Surface form tolerances
  • KS B ISO 10110-7-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 7:Surface imperfection tolerances
  • KS B ISO 10110-11-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data
  • KS B ISO 14999-4-2016 Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS B ISO 9039-2018 Optics and photonics — Quality evaluation of optical systems — Determination of distortion
  • KS B ISO 10110-1-2017 Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • KS B ISO 8576-2023 Optics and optical instruments — Microscopes — Reference system of polarized light microscopy
  • KS B ISO 10110-12-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
  • KS B ISO 10110-8-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 8:Surface texture
  • KS B ISO 10110-17-2023 Optics and photonics — Preparation of drawings for optical elements and systems — Part 17: Laser irradiation damage threshold
  • KS B ISO 9358-2023 Optics and optical instruments — Veiling glare of image forming systems — Definitions and methods of measurement
  • KS B ISO 14132-3-2019 Optics and photonics — Vocabulary for telescopic systems — Part 3: Terms for telescopic sights
  • KS B ISO 10110-9-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 15529-2023 Optics and photonics — Optical transfer function — Principles of measurement of modulation transfer function(MTF) of sampled imaging systems
  • KS B ISO 10110-2-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 14132-4-2019 Optics and photonics — Vocabulary for telescopic systems — Part 4: Terms for astronomical telescope
  • KS B ISO 10109-4-2023 Optics and optical instruments — Environmental requirements — Part 4: Test requirements for telescopic systems
  • KS B ISO 10110-10-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 10: Table representing data of optical elements and cemented assemblies
  • KS G ISO 8624-2022 Ophthalmic optics — Spectacle frames — Measuring system and vocabular
  • KS B ISO 10110-3-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions
  • KS C IEC 61280-2-2-2022 Fibre optic communication subsystem test procedures — Part 2-2: Digital systems — Optical eye pattern, waveform and extinction ratio measurement

Association of German Mechanical Engineers, Chromatic optical system

American Society for Testing and Materials (ASTM), Chromatic optical system

  • ASTM E1360-90(2000)e1 Standard Practice for Specifying Color by Using the Optical Society of America Uniform Color Scales System
  • ASTM E1360-05(2019) Standard Practice for Specifying Color by Using the Optical Society of America Uniform Color Scales System
  • ASTM E1360-05(2015) Standard Practice for Specifying Color by Using the Optical Society of America Uniform Color Scales System
  • ASTM E1360-05 Standard Practice for Specifying Color by Using the Optical Society of America Uniform Color Scales System
  • ASTM E1360-05(2010) Standard Practice for Specifying Color by Using the Optical Society of America Uniform Color Scales System

HU-MSZT, Chromatic optical system

Japanese Industrial Standards Committee (JISC), Chromatic optical system

  • JIS B 0090-6:2021 Preparation of drawings for optical elements and systems -- Part 6: Centring tolerances
  • JIS B 0090-11:2021 Preparation of drawings for optical elements and systems -- Part 11: Non-toleranced data
  • JIS B 0090-5:2001 Preparation of drawings for optical elements and systems -- Part 5: Surface form tolerances
  • JIS B 0090-6:2001 Preparation of drawings for optical elements and systems -- Part 6: Centring tolerances
  • JIS B 0090-7:2001 Preparation of drawings for optical elements and systems -- Part 7: Surface imperfection tolerances
  • JIS B 0090-11:2001 Preparation of drawings for optical elements and systems -- Part 11: Non-toleranced data
  • JIS B 0090-7:2012 Preparation of drawings for optical elements and systems -- Part 7: Surface imperfections
  • JIS B 0090-14:2010 Preparation of drawings for optical elements and systems -- Part 14: Wavefront deformation tolerance
  • JIS B 0090-5:2010 Preparation of drawings for optical elements and systems -- Part 5 : Surface form tolerances
  • JIS B 0091:2010 Interferometric measurement of optical elements and systems -- Terms and definitions of surface form and wavefront deformation tolerances
  • JIS B 7263-10:2023 Optics and photonics -- Test methods for telescopic systems -- Part 10: Test methods for axial colour performance
  • JIS Z 4339:2004 Optically stimulated luminescence dosimetry systems
  • JIS B 7261:2005 Optics and optical instruments -- Environmental requirements -- Test requirements for telescopic systems
  • JIS B 7263-2:2007 Optics and optical instruments -- Test methods for telescopic systems -- Part 2: Test methods for binocular systems
  • JIS C 61281-1:2010 Generic specification for fiber optic communication subsystems
  • JIS C 7550:2011 Photobiological safety of lamps and lamp systems
  • JIS B 7281:2003 Ophthalmic optics -- Spectacle frames -- Measuring system and terminology

ES-AENOR, Chromatic optical system

RO-ASRO, Chromatic optical system

  • STAS SR ISO 8624:1993 Optics and optical instruments. Ophthalmic optics. Measuring system for spectacle frames
  • STAS 11632-1983 Optical sins DETERMINATION WITH REFRAC- TOMETEROF REFRACTION INDEX AND DISPERSSION

American National Standards Institute (ANSI), Chromatic optical system

  • ANSI/ISO/ASTM 51310E 1310:2004 Practice for Use of a Radiochromic Optical Waveguide Dosimetry System
  • ANSI/TIA TR-1028-2004 IEC 61282-7 Optic Communication System Design Guides - Part 7: Statistical Calculation of Chromatic Dispersion
  • ANSI/OEOSC OP1.0110-1-2011 Optics and Electro-Optical Instruments - Preparation of drawings for optical elements and systems - Part 1: General
  • ANSI X3.62-1987 Information Systems - Optical Character Recognition (OCR) - Paper Used in OCR Systems
  • ANSI/TIA-1026-2004 IEC 61282-5 Fibre Optic Communication System Design Guides - Part 5: Accommodation and Compensation of Dispersion
  • ANSI/TIA TR-1029-2004 IEC 61282-3 Fibre Optic Communication System Design Guides - Part 3: Calculation of Polarization Mode Dispersion
  • ANSI/INCITS 62AMD 1-1999 Information Systems - Optical Character Recognition (OCR) - Paper Used in OCR Systems Amendment 1
  • ANSI/INCITS 62-1987/AM1-1999 Information Systems - Optical Character Recognition (OCR) - Paper Used in OCR Systems Amendment 1
  • ANSI/INCITS 62-1987*AM1-1999(S2007) Information Systems - Optical Character Recognition (OCR) - Paper Used in OCR Systems Amendment 1

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Chromatic optical system

  • GB/T 20151-2006 Photometry.The CIE system of physical photometry
  • GB/T 10988-1989 Veiling glare of optical systems--Methods of measurement
  • GB/T 10988-2009 Veiling glare of optical systems.Methods of measurement
  • GB/T 10987-1989 Optical systems--Determination of parameters
  • GB/T 10987-2009 Optical systems.Determination of parameters
  • GB/T 11168-1989 Image quality of optical systems--Method of determination
  • GB/T 11168-2009 Image quality of optical systems.Method of determination
  • GB/T 7962.9-1987 Colourless optical glass test methods--Coefficient of optical absorption
  • GB/T 7962.9-2010 Test methods of colourless optical glass.Part 9:Ceofficient of optical absorption
  • GB/T 7962.1-1987 Colourless optical glass test methods--Refractive index and coefficient of dispersion
  • GB/T 7962.1-2010 Test methods of colourless optical glass.Part 1:Refractive index and coefficient of dispersion
  • GB/T 7962.13-1987 Colourless optical glass test methods--Coefficient of thermal conductivity
  • GB 7962.13-1987 Colorless optical glass test method thermal conductivity test method
  • GB/T 20145-2006 Photobiological safety of lamps and lamp systems
  • GB/T 27667-2011 Quality evaluation of optical systems.Determination of distortion

GOSTR, Chromatic optical system

  • GOST R 58566-2019 Optics and photonics. Lenses for optical electronic systems. Test methods

European Committee for Standardization (CEN), Chromatic optical system

  • EN ISO 14880-2:2006 Optics and photonics - Microlens arrays - Part 2: Test methods for wavefront aberrations
  • EN ISO 14880-3:2006 Optics and phonotics - Microlens arrays - Part 3: Test methods for optical properties other than wavefront aberrations
  • EN ISO 8624:1996 Optics and Optical Instruments - Opthalmic Optics - Measuring System for Spectacle Frames
  • EN ISO 8624:2020 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary (ISO 8624:2020)
  • EN ISO 8624:2011 Ophthalmic optics - Spectacle frames - Measuring system and terminology (ISO 8624:2011)

Group Standards of the People's Republic of China, Chromatic optical system

International Telecommunication Union (ITU), Chromatic optical system

  • ITU-T G.697 SPANISH-2004 Optical monitoring for DWDM systems Supervisi髇 髉tica para sistemas de multiplexaci髇 por divisi髇 en longitud de onda densa
  • ITU-T G.664 CHINESE-2006 Optical safety procedures and requirements for optical transport systems
  • ITU-T G.664 FRENCH-2006 Optical safety procedures and requirements for optical transport systems Proc閐ures et prescriptions de s閏urit?optique applicables aux syst鑝es de transport optiques
  • ITU-T G.664 RUSSIAN-2006 Optical safety procedures and requirements for optical transport systems
  • ITU-T G SUPP 39-2016 Optical system design and engineering considerations
  • ITU-T G.664 SPANISH-2006 Optical safety procedures and requirements for optical transport systems Procedimientos y requisitos de seguridad 髉tica para sistemas 髉ticos de transporte
  • ITU-T G.664-2012 Optical safety procedures and requirements for optical transmission systems (Study Group 15)

IEC - International Electrotechnical Commission, Chromatic optical system

  • TS 62989-2018 Primary optics for concentrator photovoltaic systems (Edition 1.0)
  • TS 62977-3-1-2019 Electronic displays – Part 3-1: Evaluation of optical performances – Colour difference based viewing direction dependence (Edition 1.0)

International Electrotechnical Commission (IEC), Chromatic optical system

  • IEC TS 62989:2018 Primary optics for concentrator photovoltaic systems
  • IEC 61280-2-4:1998 Fibre optic communication subsystem basic test procedures - Part 2-4: Test procedures for digital systems - Bit-rate tolerance measurement
  • IEC TR 61282-10:2013/COR1:2013 Fibre optic communication system design guides - Part 10: Characterization of the quality of optical vector-modulated signals with the error vector magnitude
  • IEC TS 62977-3-1:2019 Electronic displays - Part 3-1: Evaluation of optical performances – Colour difference based viewing direction dependence
  • IEC TR 61282-10:2013 Fibre optic communication system design guides - Part 10: Characterization of the quality of optical vector-modulated signals with the error vector magnitude

IT-UNI, Chromatic optical system

未注明发布机构, Chromatic optical system

  • BS ISO 9358:1994(2000) Optics and optical instruments — Veiling glare of image - forming systems — Definitions and methods of measurement
  • BS ISO 10110-13:1997(1999) Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 13 : Laser irradiation damage threshold
  • BS 4995:1973(2011) Recommendations for Measurement ofthe veiling glare index of lenses and optical systems
  • BS ISO 10110-2:1996(1999) Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 2 : Material imperfections — Stress birefringence
  • BS ISO 10110-3:1996(1999) Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 3 : Material imperfections — Bubbles and inclusions

CZ-CSN, Chromatic optical system

SAE - SAE International, Chromatic optical system

International Commission on Illumination (CIE), Chromatic optical system

Society of Automotive Engineers (SAE), Chromatic optical system

US-FCR, Chromatic optical system

Military Standard of the People's Republic of China-General Armament Department, Chromatic optical system

  • GJB 9791-2020 Specification for chalcogenide glass materials for use in optical systems

ITU-T - International Telecommunication Union/ITU Telcommunication Sector, Chromatic optical system

  • ITU-T G.664-2003 Optical safety procedures and requirements for optical transport systems SERIES G: TRANSMISSION SYSTEMS AND MEDIA@ DIGITAL SYSTEMS AND NETWORKS Transmission media characteristics – Characteristics of optical components and subsystems (Study Group 15)
  • ITU-T G.697-2004 Optical monitoring for DWDM systems SERIES G: TRANSMISSION SYSTEMS AND MEDIA@ DIGITAL SYSTEMS AND NETWORKS Transmission media characteristics – Characteristics of optical components and subsystems
  • ITU-T G.664 AMD 1-2005 Optical safety procedures and requirements for optical transport systems Amendment 1 SERIES G: TRANSMISSION SYSTEMS AND MEDIA@ DIGITAL SYSTEMS AND NETWORKS Transmission media characteristics – Characteristics of optical components and subsystems (Study Gr
  • ITU-T G.664-1999 Optical Safety Procedures and Requirements for Optical Transport Systems Series G: Transmission Systems and Media@ Digital Systems and Networks Transmission Media Characteristics - Characteristics of Optical Components and SubSystems (Study Group 15; 18 p
  • ITU-T G.693-2001 Optical Interfaces for Intra-Office Systems Series G: Transmission Systems and Media@ Digital Systems and Networks Transmission Media Characteristics - Characteristics of Optical Components and Subsystems (Study Group 15)

RU-GOST R, Chromatic optical system

  • GOST R 8.743-2011 State system for ensuring the uniformity of measurements. Optics and photonics. Interferometric measurement of optical elements and systems. Part 1. Terms, definitions and fundamental relationships
  • GOST R 8.745-2011 State system for ensuring the uniformity of measurements. Optics and photonics. Interferometric measurement of optical elements and optical systems. Part 2. Measurement and evaluation techniques
  • GOST 8.499-1984 State system for ensuring the uniformity of measurements. State verification schedule for means of measurement of illumination effective time of exposure and colour temperature in sensitometry

Aerospace Industries Association, Chromatic optical system

AIA/NAS - Aerospace Industries Association of America Inc., Chromatic optical system

  • NAS881-1982 Index Bar - Optical Tooling Tooling Bar System
  • NAS882-2012 BAR - OPTICAL TOOLING TOOLING BAR SYSTEM (Rev 1)

(U.S.) Telecommunications Industries Association , Chromatic optical system

  • TIA SP 3-0142-2003 IEC 61282-6 ?Fibre Optic Communication System Design Guides ?Part 6: Skew Design in Parallel Optical Interconnection To be published as TIA/TR-1027
  • TIA/TR-1028-2004 TR 61280-7 Fibre Optic Communication System Design Guides - Part 7: Statistical Calculation of Chromatic Dispersion

CU-NC, Chromatic optical system

  • NC 90-17-01-1985 Metrological Assurance. Photometry Relative Spectral Luminous E fficiency. Colorimetric Functions Trichromatic Coordinates

Professional Standard - Medicine, Chromatic optical system

  • YY/T 0942-2014 Ophthalmic optics.Injection system of intraocular lenses

North Atlantic Treaty Organization Standards Agency, Chromatic optical system

ANSI - American National Standards Institute, Chromatic optical system

  • INCITS 62-2017 Information Systems – Optical Character Recognition (OCR) – Paper Used in OCR Systems
  • X3.62-1979 PAPER USED IN OPTICAL CHARACTER RECOGNITION (OCR) SYSTEMS

Military Standard of the People's Republic of China-Commission of Science,Technology and Industry for National Defence, Chromatic optical system

  • GJB 5437-2005 General design requirements for optical system of targeting pod

Danish Standards Foundation, Chromatic optical system

IN-BIS, Chromatic optical system

Aerospace Industries Association/ANSI Aerospace Standards, Chromatic optical system

Standard Association of Australia (SAA), Chromatic optical system

ES-UNE, Chromatic optical system

  • UNE-EN ISO 8624:2021 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary (ISO 8624:2020)

Defense Logistics Agency, Chromatic optical system





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