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optical thin system

optical thin system, Total:494 items.

In the international standard classification, optical thin system involves: Testing of metals, Optics and optical measurements, Linear and angular measurements, Optical equipment, Organic chemicals, Technical drawings, Production in the chemical industry, Paper products, Radiation measurements, Optoelectronics. Laser equipment, Surface treatment and coating, Solar energy engineering, Vocabularies, Graphic technology, Telecommunication systems, Medical equipment, Rubber and plastics products, Lamps and related equipment, Character sets and information coding, Installations in buildings, Materials for aerospace construction, Fibre optic communications, Paper and board, Data storage devices, Products of non-ferrous metals, Plastics, Particle size analysis. Sieving, Audio, video and audiovisual engineering.


International Organization for Standardization (ISO), optical thin system

  • ISO 16808:2022 Metallic materials — Sheet and strip — Determination of biaxial stress-strain curve by means of bulge test with optical measuring systems
  • ISO 21094:2008 Optics and photonics - Telescopic systems - Specifications for night vision devices
  • ISO 20711:2017 Optics and photonics - Environmental requirements - Test requirements for telescopic systems
  • ISO/TR 21477:2017 Optics and photonics — Preparation of drawings for optical elements and systems — Surface imperfection specification and measurement systems
  • ISO 9039:1994 Optics and optical instruments - Quality evaluation of optical systems - Determination of distortion
  • ISO/TR 16743:2013 Optics and photonics - Wavefront sensors for characterising optical systems and optical components
  • ISO 10110-1:2019 Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • ISO/TR 14999-1:2005 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 1: Terms, definitions and fundamental relationships
  • ISO 8576:1996 Optics and optical instruments - Microscopes - Reference system of polarized light microscopy
  • ISO 10110-1:2006 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General
  • ISO 10110-12:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces
  • ISO 10110-1:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 1: General
  • ISO 23216:2021 Carbon based films — Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry
  • ISO 9358:1994 Optics and optical instruments - Veiling glare of image-forming systems - Definitions and methods of measurement
  • ISO 10110-12:2019 Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
  • ISO 10110-6:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances
  • ISO/TR 14999-2:2019 Optics and photonics — Interferometric measurement of optical elements and optical systems — Part 2: Measurement and evaluation techniques
  • ISO 10109-4:2001 Optics and optical instruments - Environmental requirements - Part 4: Test requirements for telescopic systems
  • ISO 9039:1994/Cor 1:2004 Optics and optical instruments - Quality evaluation of optical systems - Determination of distortion; Technical Corrigendum 1
  • ISO 10110-6:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances
  • ISO/FDIS 10110-16 Optics and photonics — Preparation of drawings for optical elements and systems — Part 16: Diffractive surfaces
  • ISO 1011:1973 Optics and photonics — Preparation of drawings for optical elements and systems — Part 8: Surface texture
  • ISO 10110-8:2019 Optics and photonics — Preparation of drawings for optical elements and systems — Part 8: Surface texture
  • ISO 10110-16:2023 Optics and photonics — Preparation of drawings for optical elements and systems — Part 16: Diffractive surfaces
  • ISO/TR 14999-2:2005 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 2: Measurement and evaluation techniques
  • ISO 10110-17:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17: Laser irradiation damage threshold
  • ISO 10110-5:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances
  • ISO 10110-11:1996 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data
  • ISO/CD 10110-11.2 Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data
  • ISO 10110-5:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances
  • ISO 10110-11:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data
  • ISO 10110-7:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 7: Surface imperfection tolerances
  • ISO 10110-5:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances
  • ISO 10110-9:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating
  • ISO 10110-10:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 10: Table representing data of optical elements and cemented assemblies
  • ISO 10110-14:2003 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance
  • ISO 10110-14:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance
  • ISO 10110-9:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating
  • ISO/CD 10110-6 Optics and photonics — Preparation of drawings for optical elements and systems — Part 6: Centring and tilt tolerances
  • ISO 10110-7:2017 Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 7: Surface imperfection tolerances
  • ISO 10110-14:2018 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance
  • ISO 14490-2:2005 Optics and optical instruments - Test methods for telescopic systems - Part 2: Test methods for binocular systems
  • ISO 14132-3:2014 Optics and photonics - Vocabulary for telescopic systems - Part 3: Terms for telescopic sights
  • ISO 15795:2002 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations
  • ISO 10110-12:2007/Amd 1:2013 Optics and photonics.Preparation of drawings for optical elements and systems.Part 12: Aspheric surfaces; Amendment 1
  • ISO 10110-10:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 10: Table representing data of a lens element
  • ISO 10110-19:2015 Optics and photonics — Preparation of drawings for optical elements and systems — Part 19: General description of surfaces and components
  • ISO 15529:2007 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • ISO 15529:2010 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • ISO 14999-4:2007 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110
  • ISO 14999-4:2015 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110
  • ISO 10110-6:1996/Cor 1:1999 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances; Technical Corrigendum 1
  • ISO 15529:1999 Optics and optical instruments - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • ISO/TR 14999-3:2005 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 3: Calibration and validation of interferometric test equipment and measurements
  • ISO 8624:2002 Ophthalmic optics - Spectacle frames - Measuring system and terminology
  • ISO 8624:2011 Ophthalmic optics - Spectacle frames - Measuring system and terminology
  • ISO 9334:2007 Optics and photonics - Optical transfer function - Definitions and mathematical relationships
  • ISO 9334:2012 Optics and photonics - Optical transfer function - Definitions and mathematical relationships
  • ISO 10110-11:1996/cor 1:2006 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data; Technical Corrigendum 1
  • ISO 9345-2:2003 Optics and optical instruments - Microscopes: Imaging distances related to mechanical reference planes - Part 2: Infinity-corrected optical systems
  • ISO 10110-2:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 2: Material imperfections - Stress birefringence
  • ISO 10110-3:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 3: Material imperfections - Bubbles and inclusions
  • ISO 15559:1998 Practice for use of a radiochromic optical waveguide dosimetry system

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, optical thin system

  • GB/T 26332.8-2022 Optics and photonics—Optical coatings—Part 8: Minimum requirements for coatings used for laser optics
  • GB/T 26332.2-2015 Optics and photonics.Optical coatings.Part 2:Optical properties
  • GB/T 26332.1-2010 Optics and optical instruments.Optical coatings.Part 1:Definitions
  • GB/T 26332.3-2015 Optics and photonics.Optical coatings.Part 3:Environmental durability
  • GB/T 20151-2006 Photometry.The CIE system of physical photometry
  • GB/T 26332.6-2022 Optics and photonics—Optical coatings—Part 6: Minimum requirements for reflecting coatings
  • GB/T 26332.4-2015 Optics and photonics.Optical coatings.Part 4:Specific test methods
  • GB/T 10988-1989 Veiling glare of optical systems--Methods of measurement
  • GB/T 10988-2009 Veiling glare of optical systems.Methods of measurement
  • GB/T 26332.5-2022 Optics and photonics—Optical coatings—Part 5: Minimum requirements for antireflecting coatings
  • GB/T 26332.7-2022 Optics and photonics—Optical coatings—Part 7: Minimum requirements for neutral beam splitter coatings
  • GB/T 10987-1989 Optical systems--Determination of parameters
  • GB/T 10987-2009 Optical systems.Determination of parameters
  • GB/T 11168-1989 Image quality of optical systems--Method of determination
  • GB/T 11168-2009 Image quality of optical systems.Method of determination
  • GB/T 27583-2011 Optical functional films.Determination of reflected glare
  • GB/T 25257-2010 Optical functional films.Determination of warping degree
  • GB/T 26598-2011 Transparent conductive thin film speciation for optical instruments
  • GB/T 1315-1977 Thin-film coatings on optical parts--Classification,symbols and designations
  • GB/T 20145-2006 Photobiological safety of lamps and lamp systems
  • GB/T 27667-2011 Quality evaluation of optical systems.Determination of distortion
  • GB/T 26331-2010 Optical coatings environmental durability test methods
  • GB/T 42674-2023 Optical Functional Thin Film Microstructure Thickness Test Method

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会, optical thin system

  • GB/T 26332.1-2018 Optics and photonics—Optical coatings—Part 1: Definitions
  • GB/T 34261-2017 Optical film for polarizer—Test method for the anti-scratch
  • GB/T 33376-2016 Terms and definitions for optical functional films
  • GB/T 33049-2016 Polarizing optical film—Determination for adhesion of coating
  • GB/T 33051-2016 Optical functional films—Superficial hardening film—Determination of thickness of hardening coating

Association of German Mechanical Engineers, optical thin system

Korean Agency for Technology and Standards (KATS), optical thin system

  • KS B ISO 21094:2011 Optics and photonics-Telescopic systems-Specifications for night vision devices
  • KS B ISO 9039:2013 Optics and optical instruments ― Quality evaluation of optical systems ― Determination of distortion
  • KS B ISO 9039:2003 Optics and optical instruments-Quality evaluation of optical systems-Determination of distortion
  • KS B ISO 9039:2018 Optics and photonics — Quality evaluation of optical systems — Determination of distortion
  • KS B ISO TR 14999-1-2011(2021) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 1:Terms, definitions and fundamental relationships
  • KS B ISO TR 14999-1-2011(2016) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 1:Terms, definitions and fundamental relationships
  • KS B ISO 10110-1:2017 Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • KS B ISO 21094-2011(2021) Optics and photonics-Telescopic systems-Specifications for night vision devices
  • KS B ISO 21094-2011(2016) Optics and photonics-Telescopic systems-Specifications for night vision devices
  • KS B ISO 8576:2006 Optics and optical instruments-Microscopes-Reference system of polarized light microscopy
  • KS B ISO 10110-1:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 1:General
  • KS B ISO 10110-1-2017(2022) Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • KS B ISO 9358-2006(2016) Optics and optical instruments -- Veiling glare of image forming systems -- Definitions and methods of measurement
  • KS B ISO 9358:2006 Optics and optical instruments Veiling glare of image-forming systems - Definitions and methods of measurement
  • KS B ISO 8576-2006(2021) Optics and optical instruments — Microscopes —Reference system of polarized light microscopy
  • KS B ISO 10110-12:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
  • KS B ISO TR 14999-2-2011(2021) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 2:Measurement and evaluation techniques
  • KS B ISO TR 14999-2-2011(2016) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 2:Measurement and evaluation techniques
  • KS B ISO 10109-4:2006 Optics and optical instruments-Environmental requirements-Part 4:Test requirements for telescopic systems
  • KS B ISO 10110-6:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 9358-2006(2021) Optics and optical instruments -- Veiling glare of image forming systems -- Definitions and methods of measurement
  • KS B ISO 10110-11:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 11: Non-toleranced data
  • KS B ISO 10110-12:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 12:Aspheric surfaces
  • KS B ISO 10110-12:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 12: Aspheric surfaces
  • KS B ISO 10110-11:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 11:Non-toleranced data
  • KS B ISO 10110-8:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 8:Surface texture
  • KS B ISO 10110-6:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 10110-6-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 10110-8-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 8:Surface texture
  • KS B ISO 10110-17:2006 Optics and photonics-Preparation of drawings for optical elements and systems-Part 17:Laser irradiation damage threshold
  • KS B ISO 10110-17-2006(2016) Optics and photonics — Preparation of drawings for optical elements and systems —Part 17: Laser irradiation damage threshold
  • KS B ISO 10110-17-2006(2021) Optics and photonics — Preparation of drawings for optical elements and systems —Part 17: Laser irradiation damage threshold
  • KS B ISO 10110-5:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 5: Surface form tolerances
  • KS B ISO 10110-5:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 5:Surface form tolerances
  • KS B ISO 10110-14-2010(2020) Optics and photonics-Preparation of drawings for optical elements and systems-Part 14:Wavefront deformation tolerance
  • KS B ISO 10110-5:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 5: Surface form tolerances
  • KS B ISO 10110-10:2008 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 10:Table representing data of a lens element
  • KS B ISO 10110-10:2013 Optics and optical instruments ― Preparation of drawings for optical elements and systems ― Part 10: Table representing data of a lens element
  • KS B ISO 10110-9:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 10110-14:2010 Optics and photonics-Preparation of drawings for optical elements and systems-Part 14:Wavefront deformation tolerance
  • KS B ISO 10110-7:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 7:Surface imperfection tolerances
  • KS B ISO 10110-7-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 7:Surface imperfection tolerances
  • KS B ISO 14132-3:2019 Optics and photonics — Vocabulary for telescopic systems — Part 3: Terms for telescopic sights
  • KS B ISO 15795:2011 Optics and photonics-Quality evaluation of optical systems-Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 10110-9-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 10110-9:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 15529-2011(2021) Optics and photonics — Optical transfer function — Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • KS B ISO 15795-2011(2016) Optics and photonics — Quality evaluation of optical systems —Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 15795-2011(2021) Optics and photonics — Quality evaluation of optical systems —Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 15529:2011 Optics and photonics-Optical transfer function-Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • KS B ISO 15529-2011(2016) Optics and photonics — Optical transfer function — Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • KS B ISO 10110-11:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data
  • KS B ISO 14999-4-2016(2021) Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS B ISO 9334:2001 Optics and optical instruments-Optical transfer function-Definitions and mathematical relationships
  • KS B ISO 9334-2016(2021) Optics and optical instruments-Optical transfer function-Definitions and mathematical relationships
  • KS B ISO 9334:2016 Optics and optical instruments-Optical transfer function-Definitions and mathematical relationships
  • KS B ISO 9345-2:2006 Optics and optical instruments-Microscopes:Imaging distances related to mechanical reference planes-Part 2:Infinity-corrected optical systems
  • KS B ISO 10110-2-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 10110-2:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 9345-2:2016 Optics and optical instruments-Microscopes:Imaging distances related to mechanical reference planes-Part 2:Infinity-corrected optical systems
  • KS B ISO 10109-4-2006(2021) Optics and optical instruments — Environmental requirements —Part 4: Test requirements for telescopic systems
  • KS B ISO 14132-4:2019 Optics and photonics — Vocabulary for telescopic systems — Part 4: Terms for astronomical telescope
  • KS B ISO 14999-4:2011 Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS B ISO 10110-10:2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 10: Table representing data of optical elements and cemented assemblies
  • KS B ISO 14999-4:2016 Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS G ISO 8624:2011 Ophthalmic optics-Spectacle frames-Measuring system and terminology
  • KS G ISO 8624-2011(2021) Ophthalmic optics-Spectacle frames-Measuring system and terminology
  • KS G ISO 8624-2011(2016) Ophthalmic optics-Spectacle frames-Measuring system and terminology
  • KS B ISO 10110-2:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 10110-3:2007 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions
  • KS B ISO 10110-3-2017(2022) Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions
  • KS B ISO 10110-3:2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions

RO-ASRO, optical thin system

  • STAS SR ISO 8624:1993 Optics and optical instruments. Ophthalmic optics. Measuring system for spectacle frames

工业和信息化部, optical thin system

  • HG/T 4185-2022 Polyvinyl alcohol optical film
  • JB/T 13358-2018 Optical thin film bandpass interference filter
  • HG/T 5855-2021 Optical functional film triacetylcellulose (TAC) anti-glare film
  • HG/T 5858-2021 Optical grade polyester film (PET) polarizer protective film
  • HG/T 5856-2021 Optical functional film antifouling hardened film
  • HG/T 5675-2020 Optical functional film self-healing hardened film
  • HG/T 5854-2021 Optical functional thin film coating type reflective film
  • HG/T 5880-2021 Optical functional film thermal bending molding protective film
  • HG/T 5659-2019 Method for measuring yellowing of optically functional films
  • HG/T 5857-2021 Transparent cured film for optical functional film cover
  • HG/T 5507-2018 Optical functional thin film liquid crystal display backlight module uses diffusion film
  • HG/T 5657-2019 Optical functional film covered protective film prism brightness enhancement film

国家市场监督管理总局、中国国家标准化管理委员会, optical thin system

  • GB/T 40293-2021 Test method for refractive index of infrared optical chalcogenide films
  • GB/T 37384-2019 Cellulose triacetate for optical function film
  • GB/T 37382-2019 Optical functional films—Films for backlight unit of liquid crystal display—High temperature and high humidity aging measurement

British Standards Institution (BSI), optical thin system

  • BS ISO 9039:2007 Optics and photonics - Quality evaluation of optical systems - Determination of distortion
  • BS ISO 10110-1:2006 Optics and photonics - Preparation of drawings for optical elements and systems - General
  • BS ISO 9039:2008 Optics and photonics. Quality evaluation of optical systems. Determination of distortion
  • PD ISO/TR 21477:2017 Optics and photonics. Preparation of drawings for optical elements and systems. Surface imperfection specification and measurement systems
  • PD ISO/TR 14999-1:2005 Optics and photonics. Interferometric measurement of optical elements and optical systems. Terms, definitions and fundamental relationships
  • BS ISO 10110-1:2019 Optics and photonics. Preparation of drawings for optical elements and systems - General
  • PD ISO/TR 16743:2013 Optics and photonics. Wavefront sensors for characterising optical systems and optical components
  • BS ISO 10110-7:2008 Optics and photonics - Preparation of drawings for optical elements and systems - Surface imperfection tolerances
  • BS ISO 10110-12:2019 Optics and photonics. Preparation of drawings for optical elements and systems - Aspheric surfaces
  • BS EN ISO 12625-7:2007 Tissue paper and tissue products - Determination of optical properties
  • BS ISO 10110-12:2008 Optics and photonics. Preparation of drawings for optical elements and systems. Aspheric surfaces
  • BS ISO 10110-12:2007+A1:2013 Optics and photonics. Preparation of drawings for optical elements and systems. Aspheric surfaces
  • BS ISO 10110-16:2023 Optics and photonics. Preparation of drawings for optical elements and systems. Diffractive surfaces
  • BS ISO 10110-8:2019 Optics and photonics. Preparation of drawings for optical elements and systems - Surface texture
  • BS ISO 10110-17:2004 Optics and optical instruments - Preparation of drawings for optical elements and systems - Laser irradiation damage threshold
  • BS EN ISO 23216:2022 Carbon based films. Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry
  • BS ISO 23216:2021 Carbon based films. Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry
  • BS ISO 10110-8:1998 Optics and optical instruments - Preparation of drawings for optical elements and systems - Surface texture
  • BS ISO 10110-5:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Surface form tolerances
  • BS ISO 10110-8:2010 Optics and photonics. Preparation of drawings for optical elements and systems. Surface texture; roughness and waviness
  • PD IEC TS 62989:2018 Primary optics for concentrator photovoltaic systems
  • BS ISO 10110-11:1996 Optics and photonics - Preparation of drawings for optical elements and systems - Non-toleranced data
  • BS ISO 14490-2:2005 Optics and optical instruments. Test methods for telescopic systems - Test methods for binocular systems
  • BS ISO 14132-3:2014 Optics and photonics. Vocabulary for telescopic systems. Terms for telescopic sights
  • BS ISO 14132-3:2021 Optics and photonics. Vocabulary for telescopic systems. Terms for telescopic sights
  • BS ISO 10110-13:1998 Optics and optical instruments. Preparation of drawings for optical elements and systems. Laser irradiation damage threshold
  • BS 7012-12:1997 Light microscopes. Reference system of polarized light microscopy
  • PD ISO/TR 14999-2:2019 Tracked Changes. Optics and photonics. Interferometric measurement of optical elements and optical systems. Measurement and evaluation techniques
  • 20/30400316 DC BS ISO 23216. Carbon based films. Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry
  • BS ISO 10110-6:2015 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Centring tolerances
  • BS ISO 10110-7:2017 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Surface imperfections
  • BS ISO 20711:2017 Optics and photonics. Environmental requirements. Test requirements for telescopic systems
  • BS ISO 10110-6:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Centring tolerances
  • BS ISO 10110-11:2016 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Non-toleranced data
  • BS ISO 14490-2:2006 Optics and optical instruments - Test methods for telescopic systems - Test methods for binocular systems
  • BS ISO 14999-4:2007 Optics and photonics - Interferometric measurement of optical elements and optical systems - Interpretation and evaluation of tolerances specified in ISO 10110
  • BS ISO 15795:2002 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations
  • BS ISO 10110-5:2015 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Surface form tolerances
  • BS ISO 10110-14:2018 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Wavefront deformation tolerance
  • BS ISO 10109-4:2001 Optics and optical instruments - Environmental requirements - Test requirements for telescopic systems
  • BS ISO 14490-8:2011 Optics and optical instruments. Test methods for telescopic systems. Test methods for night-vision devices
  • PD ISO/TR 14999-3:2005 Optics and photonics. Interferometric measurement of optical elements and optical systems. Calibration and validation of interferometric test equipment and measurements
  • BS ISO 10110-10:2005 Optics and photonics. Preparation of drawings for optical elements and systems. Table representing data of optical elements and cemented assemblies
  • BS ISO 9345-2:2003 Optics and optical instruments - Microscopes - Imaging distances related to mechanical reference planes - Infinity-corrected optical systems
  • BS ISO 10110-10:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Table representing data of optical elements and cemented assemblies
  • BS ISO 10110-19:2015 Optics and photonics. Preparation of drawings for optical elements and systems. General description of surfaces and components
  • 18/30332797 DC BS ISO 10110-12. Optics and photonics. Preparation of drawings for optical elements and systems. Part 12. Aspheric surfaces
  • BS ISO 10110-9:2016 Tracked Changes. Optics and photonics. Preparation of drawings for optical elements and systems. Surface treatment and coating
  • BS ISO 14490-9:2019 Optics and photonics. Test methods for telescopic systems - Test methods for field curvature
  • BS ISO 9358:1994 Optics and optical instruments. Veiling glare of image forming systems. Definitions and methods of measurement
  • 16/30324510 DC BS ISO 20711. Optics and photonics. Environmental requirements. Test requirements for telescopic systems
  • BS ISO 10110-9:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Surface treatment and coating
  • 22/30430316 DC BS ISO 10110-16. Optics and photonics. Preparation of drawings for optical elements and systems - Part 16. Diffractive surfaces
  • BS ISO 9334:2012 Optics and photonics. Optical transfer function. Definitions and mathematical relationships
  • BS EN 61280-2-2:2012 Fibre optic communication subsystem test procedures. Digital systems. Optical eye pattern, waveform and extinction ratio measurement
  • BS 4301:1991 Recommendations for preparation of drawings for optical elements and systems
  • BS ISO 14490-1:2005 Optics and optical instruments. Test methods for telescopic systems - Test methods for basic characteristics
  • BS ISO 14999-4:2015 Tracked Changes. Optics and photonics. Interferometric measurement of optical elements and optical systems. Interpretation and evaluation of tolerances specified in ISO 10110
  • BS ISO 9334:1996 Optics and optical instruments - Optical transfer function - Definitions and mathematical relationships
  • BS ISO 14490-6:2005 Optics and optical instruments - Test methods for telescopic systems - Test methods for veiling glare index
  • BS ISO 14490-6:2014 Optics and photonics. Test methods for telescopic systems. Test methods for veiling glare index
  • BS ISO 10110-2:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Material imperfections - Stress birefringence
  • BS ISO 10110-3:1996 Optics and optical instruments - Preparation of drawings for optical elements and systems - Material imperfections - Bubbles and inclusions
  • BS ISO 15529:2010 Optics and photonics. Optical transfer function. Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • BS EN ISO 8624:2011 Ophthalmic optics. Spectacle frames. Measuring system and terminology
  • BS ISO 13099-2:2012 Colloidal systems. Methods for zetapotential determination. Optical methods
  • BS EN ISO 8624:2020 Ophthalmic optics. Spectacle frames. Measuring system and vocabulary
  • BS 4995:1973 Recommendations for measurement of the veiling glare index of lenses and optical systems

GOSTR, optical thin system

  • GOST R 58566-2019 Optics and photonics. Lenses for optical electronic systems. Test methods

German Institute for Standardization, optical thin system

  • DIN ISO/TR 21477:2018-08*DIN SPEC 13477:2018-08 Optics and photonics - Preparation of drawings for optical elements and systems - Surface imperfection specification and measurement Systems (ISO/TR 21477:2017)
  • DIN ISO 9039:2008-08 Optics and photonics - Quality evaluation of optical systems - Determination of distortion (ISO 9039:2008)
  • DIN ISO 8576:2002-06 Optics and optical instruments - Microscopes - Reference system of polarized light microscopy (ISO 8576:1996)
  • DIN ISO 14490 Beiblatt 1:2016-06 Optics and optical instruments - Test methods for telescopic systems; Supplement 1: Guide for shortened test methods and exemplary test report
  • DIN EN ISO 23216:2023-01 Carbon based films - Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry (ISO 23216:2021); German version EN ISO 23216:2022
  • DIN ISO 10110-1:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General (ISO 10110-1:2006); English version of DIN ISO 10110-1:2007-08
  • DIN ISO 10110-1:2020-09 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General (ISO 10110-1:2019)
  • DIN ISO 9358:2021-08 Optics and optical instruments - Veiling glare of image-forming systems - Definitions and methods of measurement (ISO 9358:1994)
  • DIN ISO 10110-12:2021-09 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces (ISO 10110-12:2019)
  • DIN 58186:1982 Quality evaluation of optical systems; determination of veiling glare
  • DIN ISO 10110-17:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17: Laser irradiation damage threshold (ISO 10110-17:2004)
  • DIN ISO 20711:2018-01 Optics and photonics - Environmental requirements - Test requirements for telescopic systems (ISO 20711:2017)
  • DIN ISO 10110-6:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances (ISO 10110-6:2015)
  • DIN ISO 10110-6:2016-06 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances (ISO 10110-6:2015)
  • DIN ISO 8576:2002 Optics and optical instruments - Microscopes - Reference system of polarized light microscopy (ISO 8576:1996)
  • DIN EN ISO 23216:2023 Carbon based films - Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry (ISO 23216:2021)
  • DIN ISO 10110-6:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 6: Centring tolerances (ISO 10110-6:1996)
  • DIN ISO 10110-12:2009 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces (ISO 10110-12:2007); English version of DIN ISO 10110-12:2009-01
  • DIN ISO 10110-17:2004-12 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17: Laser irradiation damage threshold (ISO 10110-17:2004)
  • DIN 58739-2:2002-01 Production in optical engineering - Workpiece receptions for optics - Part 2: Chucks with membranes
  • DIN ISO 10110-10:2004 Optics and photonics - Preparation of drawings for optical elements and systems - Part 10: Table representing data of optical elements and cemented assemblies (ISO 10110-10:2004)
  • DIN ISO 10110-1:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1: General (ISO 10110-1:2019)
  • DIN ISO 10110-11:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data (ISO 10110-11:1996)
  • DIN ISO 15795:2008-04 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations (ISO 15795:2002+Cor. 1:2007)
  • DIN ISO 10110-14:2019-09 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance (ISO 10110-14:2018)
  • DIN ISO 10110-5:2016-04 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances (ISO 10110-5:2015)
  • DIN 58172-1:1982 Testing of optical systems; deviations from symmetry
  • DIN ISO 15795:2008 Optics and photonics - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations (ISO 15795:2002+Cor. 1:2007);English version of DIN ISO 15795:2008-04
  • DIN ISO 10110-12:2021 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: Aspheric surfaces (ISO 10110-12:2019)
  • DIN ISO 20711:2018 Optics and photonics - Environmental requirements - Test requirements for telescopic systems (ISO 20711:2017)
  • DIN ISO 10110-7:2018 Optics and photonics - Preparation of drawings for optical elements and systems - Part 7: Surface imperfections (ISO 10110-7:2017)
  • DIN ISO 10110-8:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 8: Surface texture (ISO 10110-8:2019); Text in German and English
  • DIN ISO 10110-9:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating (ISO 10110-9:1996)
  • DIN ISO 15529:2010-11 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems (ISO 15529:2010)
  • DIN ISO 10109-7:2002 Optics and optical instruments - Environmental requirements - Part 7: Test requirements for optical measuring systems (ISO 10109-7:2001)
  • DIN ISO 10110-11:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11: Non-toleranced data (ISO 10110-11:2016)
  • DIN ISO 14999-4 Beiblatt 1:2020-04 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110; Supplement 1
  • DIN EN 61280-2-9:2009 Fibre optic communication subsystem test procedures - Part 2-9: Digital systems - Optical signal-to-noise ratio measurement for dense wavelength-division multiplexed systems (IEC 61280-2-9:2009); German version EN 61280-2-9:2009
  • DIN EN ISO 12625-16:2023-06 Tissue paper and tissue products - Part 16: Determination of optical properties - Opacity (paper backing) - Diffuse reflectance method (ISO/DIS 12625-16:2023); German and English version prEN ISO 12625-16:2023 / Note: Date of issue 2023-05-12*Intended ...
  • DIN EN 60856/A2:1998-08 Pre-recorded optical reflective videodisk system "Laser vision" 50 Hz/625 lines; PAL (IEC 60856:1986/A2:1997); Amendment A2; German version EN 60856:1993/A2:1997
  • DIN ISO 9334:2008 Optics and photonics - Optical transfer function - Definitions and mathematical relationships (ISO 9334:2007); Text in German and English
  • DIN ISO 10110-5:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances (ISO 10110-5:2015)
  • DIN ISO 10110-2:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 2: Material imperfections; stress birefringence (ISO 10110-2:1996)
  • DIN ISO 10110-9:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 9: Surface treatment and coating (ISO 10110-9:2016)
  • DIN ISO 10110-3:2000 Optics and optical instruments - Preparation of drawings for optical elements and systems - Part 3: Material imperfections; bubbles and inclusions (ISO 10110-3:1996)
  • DIN ISO 9345-2:2005 Optics and optical instruments - Microscopes - Imaging distances related to mechanical reference planes - Part 2: Infinity-corrected optical systems (ISO 9345-2:2003)
  • DIN ISO 10110-14:2019 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14: Wavefront deformation tolerance (ISO 10110-14:2018)
  • DIN ISO 10110-19:2016-04 Optics and photonics - Preparation of drawings for optical elements and systems - Part 19: General description of surfaces and components (ISO 10110-19:2015)
  • DIN 58196-4:1996 Optical coatings - Part 4: Testing of the abrasion resistance with eraser
  • DIN ISO 14132-4:2016-07 Optics and photonics - Vocabulary for telescopic systems - Part 4: Terms for astronomical telescopes (ISO 14132-4:2015); Text in German and English
  • DIN ISO 9358:2021 Optics and optical instruments - Veiling glare of image-forming systems - Definitions and methods of measurement (ISO 9358:1994)
  • DIN ISO 14490-5:2007 Optics and optical instruments - Test methods for telescopic systems - Part 5: Test methods for transmittance (ISO 14490-5:2005);English version of DIN ISO 14490-5:2007-06
  • DIN ISO 9358:2020 Optics and optical instruments - Veiling glare of image forming systems - Definitions and methods of measurement (ISO 9358:1994); Text in German and English
  • DIN ISO 14999-4:2016 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4: Interpretation and evaluation of tolerances specified in ISO 10110 (ISO 14999-4:2015)
  • DIN EN ISO 8624:2020-11 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary (ISO 8624:2020); German version EN ISO 8624:2020
  • DIN ISO 15529:2010 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems (ISO 15529:2010)
  • DIN ISO 14490-2:2006 Optics and optical instruments - Test methods for telescopic systems - Part 2: Test methods for binocular systems (ISO 14490-2:2005) English version of DIN ISO 14490-2:2006-08
  • DIN EN 60856:1994 Pre-recorded optical reflective videodisk system "Laser vision" 50 Hz/625 lines; PAL (IEC 60856:1986 + A1:1993); German version EN 60856:1993 + A1:1993

Association Francaise de Normalisation, optical thin system

  • NF S10-042:1998 Optics and optical instruments. Quality evaluation of optical systems. Determination of distorsion.
  • NF ISO 9039:2009 Optique et photonique - Évaluation de la qualité des systèmes optiques - Détermination de la distorsion
  • NF EN ISO 23216:2022 Films à base de carbone - Détermination des propriétés optiques des films de carbone amorphe par ellipsométrie spectroscopique
  • NF ISO 10110-1:2020 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 1 : généralités
  • NF ISO 10110-8:2020 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 8 : état de surface
  • NF S10-008-1:2006 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1 : general.
  • NF S10-008-1*NF ISO 10110-1:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 1 : general
  • NF S10-008-5:2008 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5 : surface form tolerances.
  • NF S10-008-5*NF ISO 10110-5:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 5 : surface form tolerances
  • NF S10-008-1:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 1 : general.
  • NF ISO 10110-12:2020 Optique et photonique - Préparation des dessins pour éléments et systèmes optiques - Partie 12 : surfaces asphériques
  • NF ISO 10110-7:2017 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 7 : imperfection de surface
  • NF ISO 10110-6:2015 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 6 : tolérances de centrage
  • NF S10-008-17*NF ISO 10110-17:2005 Optics and photonics - Preparation of drawings for optical elements and systems - Part 17 : laser irradiation damage threshold
  • NF A91-156*NF ISO 23216:2021 Carbon based films - Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry
  • NF S10-008-6*NF ISO 10110-6:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 6 : centring tolerances
  • NF S10-008-7*NF ISO 10110-7:2017 Optics and photonics - Preparation of drawings for optical elements and systems - Part 7 : surface imperfections
  • NF S10-008-8*NF ISO 10110-8:2020 Optics and photonics - Preparation of drawings for optical elements and systems - Part 8 : surface texture
  • NF S10-043*NF ISO 9358:1998 Optics and optical instruments. Veiling glare of image-forming systems. Definitions and methods of measurement.
  • NF S10-008-12:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12 : aspheric surfaces.
  • NF S10-008-11*NF ISO 10110-11:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 11 : Non-toleranced data
  • NF S10-008-6:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 6 : centring tolerances.
  • NF ISO 10110-5:2015 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 5 : tolérances de forme de surface
  • NF ISO 10110-17:2005 Optique et photonics - Préparation des dessins pour éléments et systèmes optiques - Partie 17 : seuil de dommage au rayonnement laser
  • NF S10-008-10:2005 Optics and photonics - Preparation of drawings for optical elements and systems - Part 10 : table representing data of optical elements and cemented assemblies.
  • NF S10-008-12/A1:2013 Optics and photonics - Preparation of drawings for optical elements and systems - Part 12: aspheric surfaces - AMENDMENT 1
  • NF S10-008-11:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 11 : non-toleranced data.
  • NF S10-008-14*NF ISO 10110-14:2018 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14 : wavefront deformation tolerance
  • NF ISO 10110-14:2018 Optique et photonique - Préparation des dessins pour éléments et systèmes optiques - Partie 14 : tolérance de déformation du front d'onde
  • NF ISO 10110-11:2016 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 11 : données non tolérancées
  • NF ISO 10110-9:2016 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 9 : traitement de surface et revêtement
  • NF C43-890*NF EN 62471:2008 Photobiological safety of lamps and lamp systems.
  • NF Q34-030-7:2007 Tissue paper and tissue products - Part 7 : determination of optical properties.
  • NF S10-008-14:2007 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14 : wavefront deformation tolerance.
  • NF S10-008-9*NF ISO 10110-9:2016 Optics and photonics - Preparation of drawings for optical elements and systems - Part 9 : surface treatment and coating
  • NF S10-008-5:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 5 : surface form tolerances.
  • NF S10-008-7:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 7 : surface imperfection tolerances.
  • FD ISO/TR 14999-2:2019 Optique et photonique - Mesurage interférométrique de composants et systèmes optiques - Partie 2 : mesurage et techniques d'évaluation
  • NF ISO 15795:2002 Optique et photonique - Évaluation de la qualité des systèmes optiques - Estimation de la dégradation de la qualité de l'image due à des aberrations chromatiques
  • NF S10-051*NF ISO 15795:2002 Optics and optical instruments - Quality evaluation of optical systems - Assessing the image quality degradation due to chromatic aberrations
  • NF S10-008-9:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 9 : surface treatment and coating.
  • NF ISO 9358:1998 Optique et instruments d'optique - Lumière parasite diffuse des systèmes d'imagerie - Définitions et méthodes de mesure.
  • NF S10-050*NF ISO 15529:2011 Optics and photonics - Optical transfer function - Principles of measurement of modulation transfer function (MTF) of sampled imaging systems
  • NF ISO 10110-19:2015 Optique et photonique - Indications sur les dessins pour éléments et systèmes optiques - Partie 19 : description générale des surfaces et des composants
  • NF ISO 15529:2011 Optique et photonique - Fonction de transfert optique - Principes de mesure de la fonction de transfert de modulation (MTF) des systèmes de formation d'image échantillonnés
  • NF S10-009-4:2007 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4 : interpretation and evaluation of tolerances specified in ISO 10110.
  • NF S10-009-4*NF ISO 14999-4:2015 Optics and photonics - Interferometric measurement of optical elements and optical systems - Part 4 : interpretation and evaluation of tolerances specified in ISO 10110
  • NF S10-008-3:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 3 : material imperfections. Bubbles and inclusions.
  • NF S10-040:1998 Optics and optical instruments. Optical transfer function. Definitions and mathematical relationships.
  • NF S11-520*NF EN ISO 8624:2020 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary
  • NF EN ISO 8624:2020 Optique ophtalmique - Montures de lunettes - Système de mesure et terminologie
  • NF S10-008-19*NF ISO 10110-19:2015 Optics and photonics - Preparation of drawings for optical elements and systems - Part 19 : general description of surfaces and components
  • NF S10-008-2:1996 Optics and optical instruments. Preparation of drawings for optical elements and systems. Part 2 : material imperfections. Stress birefringence.
  • NF Q34-030-15*NF EN ISO 12625-15:2015 Tissue paper and tissue products - Part 15 : determination of optical properties - Measurement of brightness and colour with C/2o (indoor daylight) illuminant
  • NF EN ISO 12625-15:2022 Papier tissue et produits tissue - Partie 15 : Détermination des propriétés optiques - Mesurage du degré de blancheur et de la couleur avec l'illuminant C/2o (lumière du jour à l'intérieur)
  • NF EN 60856/A2:1997 Système de vidéodisque optique réfléchissant préenregistré - "Laser vision" 50 Hz/625 lignes - PAL.
  • NF EN 60856:1993 Système de vidéodisque optique réfléchissant préenregistré - "Laser vision" 50 Hz/625 lignes - PAL.

KR-KS, optical thin system

  • KS B ISO 9039-2018 Optics and photonics — Quality evaluation of optical systems — Determination of distortion
  • KS B ISO 10110-1-2017 Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
  • KS B ISO 8576-2023 Optics and optical instruments — Microscopes — Reference system of polarized light microscopy
  • KS B ISO 10110-12-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
  • KS B ISO 10110-6-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 6:Centering tolerances
  • KS B ISO 10110-8-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 8:Surface texture
  • KS B ISO 10110-17-2023 Optics and photonics — Preparation of drawings for optical elements and systems — Part 17: Laser irradiation damage threshold
  • KS B ISO 10110-5-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 5: Surface form tolerances
  • KS B ISO 10110-7-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 7:Surface imperfection tolerances
  • KS B ISO 9358-2023 Optics and optical instruments — Veiling glare of image forming systems — Definitions and methods of measurement
  • KS B ISO 14132-3-2019 Optics and photonics — Vocabulary for telescopic systems — Part 3: Terms for telescopic sights
  • KS B ISO 10110-9-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 9:Surface treatment and coating
  • KS B ISO 9334-2023 Optics and photonics — Optical transfer function — Definitions and mathematical relationships
  • KS B ISO 10110-11-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data
  • KS B ISO 15795-2023 Optics and optical instruments — Quality evaluation of optical systems — Assessing the image quality degradation due to chromatic aberrations
  • KS B ISO 15529-2023 Optics and photonics — Optical transfer function — Principles of measurement of modulation transfer function(MTF) of sampled imaging systems
  • KS B ISO 14999-4-2016 Optics and photonics-Interferometric measurement of optical elements and optical systems-Part 4:Interpretation and evaluation of tolerances specified in KS B ISO 10110
  • KS B ISO 9334-2016 Optics and optical instruments-Optical transfer function-Definitions and mathematical relationships
  • KS B ISO 10110-2-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 2:Material imperfections-Stress birefringence
  • KS B ISO 14132-4-2019 Optics and photonics — Vocabulary for telescopic systems — Part 4: Terms for astronomical telescope
  • KS B ISO 10109-4-2023 Optics and optical instruments — Environmental requirements — Part 4: Test requirements for telescopic systems
  • KS B ISO 10110-10-2018 Optics and photonics — Preparation of drawings for optical elements and systems — Part 10: Table representing data of optical elements and cemented assemblies
  • KS G ISO 8624-2022 Ophthalmic optics — Spectacle frames — Measuring system and vocabular
  • KS B ISO 10110-3-2017 Optics and optical instruments-Preparation of drawings for optical elements and systems-Part 3:Material imperfections-Bubbles and inclusions

Group Standards of the People's Republic of China, optical thin system

  • T/SGMY 0001-2021 Self-healing Optical Film Coatings
  • T/NDAS 41-2021 Optical vibration sensing system
  • T/SZIEIA 02-2022 AOI automatic optical inspection system
  • T/CEC 727-2022 Testing specification for thin-film components of household photovoltaic power generation system
  • T/CEC 470-2021 Guidelines for Selection of Thin Film Modules for Household Photovoltaic Power Generation Systems
  • T/CEC 471-2021 Household Thin Film Photovoltaic Power Generation System Operation and Maintenance Regulations
  • T/GDSBME 007-2023
  • T/CSTM 00313-2021 Testing method of optical constants for 0ptical thin films based on spectro-photo-metric method
  • T/ZZB 0696-2018 Optical grade blue biaxially stretched polyester film
  • T/CECS 630-2019 Application technical specification for architectural copper indium gallium selenide thin film photovoltaic system
  • T/CEC 5043-2021 Technical specifications for the installation of thin-film modules for household photovoltaic power generation systems
  • T/GDMDMA 0003-2021 Vision care lighting system in primary and secondary school classrooms
  • T/ZS 0110-2020 Optical Measuring System for Structural Geometric Parameters
  • T/CEC 728-2022 Operation and maintenance rules for household wall thin-film photovoltaic power generation system
  • T/CEC 5081-2022 Specifications for installation and commissioning of household wall thin film photovoltaic power generation systems
  • T/CPIA 0036.1-2022 Retroreflective optical films for photovoltaic modules Part 1: Films for tinned ribbon surfaces
  • T/ZZB 0514-2018 Optical Reflector Film for TFT-LCD Panel Display

International Telecommunication Union (ITU), optical thin system

  • ITU-T G.697 SPANISH-2004 Optical monitoring for DWDM systems Supervisi髇 髉tica para sistemas de multiplexaci髇 por divisi髇 en longitud de onda densa
  • ITU-T G.664 CHINESE-2006 Optical safety procedures and requirements for optical transport systems
  • ITU-T G.664 FRENCH-2006 Optical safety procedures and requirements for optical transport systems Proc閐ures et prescriptions de s閏urit?optique applicables aux syst鑝es de transport optiques
  • ITU-T G.664 RUSSIAN-2006 Optical safety procedures and requirements for optical transport systems
  • ITU-T G SUPP 39-2016 Optical system design and engineering considerations
  • ITU-T G.664 SPANISH-2006 Optical safety procedures and requirements for optical transport systems Procedimientos y requisitos de seguridad 髉tica para sistemas 髉ticos de transporte
  • ITU-T G.664-2012 Optical safety procedures and requirements for optical transmission systems (Study Group 15)

Japanese Industrial Standards Committee (JISC), optical thin system

  • JIS Z 4339:2004 Optically stimulated luminescence dosimetry systems
  • JIS B 7261:2005 Optics and optical instruments -- Environmental requirements -- Test requirements for telescopic systems
  • JIS B 7263-2:2007 Optics and optical instruments -- Test methods for telescopic systems -- Part 2: Test methods for binocular systems
  • JIS C 61281-1:2010 Generic specification for fiber optic communication subsystems
  • JIS C 7550:2011 Photobiological safety of lamps and lamp systems
  • JIS B 7281:2003 Ophthalmic optics -- Spectacle frames -- Measuring system and terminology

European Committee for Standardization (CEN), optical thin system

  • EN ISO 16808:2022 Metallic materials - Sheet and strip - Determination of biaxial stress-strain curve by means of bulge test with optical measuring systems (ISO 16808:2022)
  • EN ISO 23216:2022 Carbon based films - Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry (ISO 23216:2021)
  • EN ISO 16808:2014 Metallic materials - Sheet and strip - Determination of biaxial stress-strain curve by means of bulge test with optical measuring systems
  • EN 12625-7:2000 Tissue Paper and Tissue Products - Part 7: Determination of Optical Properties
  • EN ISO 8624:1996 Optics and Optical Instruments - Opthalmic Optics - Measuring System for Spectacle Frames
  • EN ISO 8624:2020 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary (ISO 8624:2020)
  • EN ISO 8624:2011 Ophthalmic optics - Spectacle frames - Measuring system and terminology (ISO 8624:2011)

IEC - International Electrotechnical Commission, optical thin system

  • TS 62989-2018 Primary optics for concentrator photovoltaic systems (Edition 1.0)

International Electrotechnical Commission (IEC), optical thin system

ES-UNE, optical thin system

  • UNE-EN ISO 23216:2023 Carbon based films - Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry (ISO 23216:2021)
  • UNE-EN ISO 8624:2021 Ophthalmic optics - Spectacle frames - Measuring system and vocabulary (ISO 8624:2020)

未注明发布机构, optical thin system

  • BS ISO 9358:1994(2000) Optics and optical instruments — Veiling glare of image - forming systems — Definitions and methods of measurement
  • BS ISO 10110-13:1997(1999) Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 13 : Laser irradiation damage threshold
  • BS 4995:1973(2011) Recommendations for Measurement ofthe veiling glare index of lenses and optical systems
  • BS ISO 10110-2:1996(1999) Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 2 : Material imperfections — Stress birefringence
  • BS ISO 10110-3:1996(1999) Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 3 : Material imperfections — Bubbles and inclusions

CZ-CSN, optical thin system

SAE - SAE International, optical thin system

Society of Automotive Engineers (SAE), optical thin system

International Commission on Illumination (CIE), optical thin system

American National Standards Institute (ANSI), optical thin system

Military Standard of the People's Republic of China-General Armament Department, optical thin system

  • GJB 9791-2020 Specification for chalcogenide glass materials for use in optical systems

Danish Standards Foundation, optical thin system

ITU-T - International Telecommunication Union/ITU Telcommunication Sector, optical thin system

  • ITU-T G.664-2003 Optical safety procedures and requirements for optical transport systems SERIES G: TRANSMISSION SYSTEMS AND MEDIA@ DIGITAL SYSTEMS AND NETWORKS Transmission media characteristics – Characteristics of optical components and subsystems (Study Group 15)
  • ITU-T G.697-2004 Optical monitoring for DWDM systems SERIES G: TRANSMISSION SYSTEMS AND MEDIA@ DIGITAL SYSTEMS AND NETWORKS Transmission media characteristics – Characteristics of optical components and subsystems
  • ITU-T G.664 AMD 1-2005 Optical safety procedures and requirements for optical transport systems Amendment 1 SERIES G: TRANSMISSION SYSTEMS AND MEDIA@ DIGITAL SYSTEMS AND NETWORKS Transmission media characteristics – Characteristics of optical components and subsystems (Study Gr
  • ITU-T G.664-1999 Optical Safety Procedures and Requirements for Optical Transport Systems Series G: Transmission Systems and Media@ Digital Systems and Networks Transmission Media Characteristics - Characteristics of Optical Components and SubSystems (Study Group 15; 18 p
  • ITU-T G.693-2001 Optical Interfaces for Intra-Office Systems Series G: Transmission Systems and Media@ Digital Systems and Networks Transmission Media Characteristics - Characteristics of Optical Components and Subsystems (Study Group 15)

Professional Standard - Military and Civilian Products, optical thin system

CU-NC, optical thin system

  • NC 39-04-1987 National System for Scientific and Technical Information International Standardized Numbering for Books

RU-GOST R, optical thin system

  • GOST R 8.743-2011 State system for ensuring the uniformity of measurements. Optics and photonics. Interferometric measurement of optical elements and systems. Part 1. Terms, definitions and fundamental relationships
  • GOST R 8.745-2011 State system for ensuring the uniformity of measurements. Optics and photonics. Interferometric measurement of optical elements and optical systems. Part 2. Measurement and evaluation techniques
  • GOST R 8.829-2013 State system for ensuring the uniformity of measurements. Method for the determination of optical density (transmittance coefficient) and haze of polymeric plates and films

Professional Standard - Chemical Industry, optical thin system

  • HG/T 4608-2014 Optical functional films.Color measurement
  • HG/T 4951-2016 Optical functional films.Determination of contrast ratio
  • HG/T 5077-2016 Optical functional films.Measuring method of the near infrared spectral transmittance

Aerospace Industries Association, optical thin system

AIA/NAS - Aerospace Industries Association of America Inc., optical thin system

  • NAS881-1982 Index Bar - Optical Tooling Tooling Bar System
  • NAS882-2012 BAR - OPTICAL TOOLING TOOLING BAR SYSTEM (Rev 1)

(U.S.) Telecommunications Industries Association , optical thin system

  • TIA SP 3-0142-2003 IEC 61282-6 ?Fibre Optic Communication System Design Guides ?Part 6: Skew Design in Parallel Optical Interconnection To be published as TIA/TR-1027

Professional Standard - Machinery, optical thin system

  • JB/T 10569-2006 Thin-film coatings on optical parts - Classification symbols and designations

Professional Standard - Medicine, optical thin system

  • YY/T 0942-2014 Ophthalmic optics.Injection system of intraocular lenses

North Atlantic Treaty Organization Standards Agency, optical thin system

Lithuanian Standards Office , optical thin system

  • LST EN ISO 12625-7:2007 Tissue paper and tissue products - Part 7: Determination of optical properties (ISO 12625-7:2007)

ANSI - American National Standards Institute, optical thin system

  • INCITS 62-2017 Information Systems – Optical Character Recognition (OCR) – Paper Used in OCR Systems
  • X3.62-1979 PAPER USED IN OPTICAL CHARACTER RECOGNITION (OCR) SYSTEMS

Professional Standard - Non-ferrous Metal, optical thin system

  • YS/T 718-2009 Flat magneting sputtering target.Niobium target for optical coating
  • YS/T 719-2009 Flat magneting sputtering target.Silicon target for optical coating

American Society for Testing and Materials (ASTM), optical thin system

Military Standard of the People's Republic of China-Commission of Science,Technology and Industry for National Defence, optical thin system

  • GJB 5437-2005 General design requirements for optical system of targeting pod

IT-UNI, optical thin system

IN-BIS, optical thin system

Aerospace Industries Association/ANSI Aerospace Standards, optical thin system

Standard Association of Australia (SAA), optical thin system

Defense Logistics Agency, optical thin system





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