ZH
RU
ES
Secondary ion mass spectrometry depth profiling
Secondary ion mass spectrometry depth profiling, Total:7 items.
In the international standard classification, Secondary ion mass spectrometry depth profiling involves: Analytical chemistry.
国家市场监督管理总局、中国国家标准化管理委员会, Secondary ion mass spectrometry depth profiling
- GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- GB/T 40109-2021 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of boron in silicon
International Organization for Standardization (ISO), Secondary ion mass spectrometry depth profiling
- ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon
- ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
British Standards Institution (BSI), Secondary ion mass spectrometry depth profiling
- BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
- BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Secondary ion mass spectrometry depth profiling
- GB/T 32495-2016 Surface chemical analysis.Secondary-ion mass spectrometry.Method for depth profiling of arsenic in silicon