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Titanium ion sputtering apparatus
Titanium ion sputtering apparatus, Total:103 items.
In the international standard classification, Titanium ion sputtering apparatus involves: Vacuum technology, Products of non-ferrous metals, FLUID SYSTEMS AND COMPONENTS FOR GENERAL USE, Electronic display devices, Body care equipment, Analytical chemistry, Non-ferrous metals, Semiconducting materials, Radiation protection, Radiation measurements, Pumps, Ferroalloys, Optics and optical measurements, Electricity. Magnetism. Electrical and magnetic measurements, Non-metalliferous minerals, Testing of metals, Iron and steel products, Electronic components in general, Coals, Metalliferous minerals.
Professional Standard - Electron, Titanium ion sputtering apparatus
- SJ 1781-1981 Sputtering ion pump--Testing methods
- SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series
- SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification
Professional Standard - Machinery, Titanium ion sputtering apparatus
Professional Standard - Non-ferrous Metal, Titanium ion sputtering apparatus
- YS/T 893-2013 High-purity sputtering titanium target used in electronic film
German Institute for Standardization, Titanium ion sputtering apparatus
- DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps
- DIN IEC/TS 62743:2013 Radiation protection instrumentation - Electronic counting dosemeters for pulsed fields of ionizing radiation (IEC/TS 62743:2012)
American Society for Testing and Materials (ASTM), Titanium ion sputtering apparatus
- ASTM F1709-97 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2016) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2002) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2008) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
- ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
- ASTM E1162-11(2019) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1162-06 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E2371-04 Standard Test Method for Analysis of Titanium and Titanium Alloys by Atomic Emission Plasma Spectrometry
- ASTM E2371-13 Standard Test Method for Analysis of Titanium and Titanium Alloys by Direct Current Plasma and Inductively Coupled Plasma Atomic Emission Spectrometry (Performance-Based Test Methodology)
- ASTM E2371-21 Standard Test Method for Analysis of Titanium and Titanium Alloys by Direct Current Plasma and Inductively Coupled Plasma Atomic Emission Spectrometry (Performance-Based Test Methodology)
- ASTM E2371-21a Standard Test Method for Analysis of Titanium and Titanium Alloys by Direct Current Plasma and Inductively Coupled Plasma Atomic Emission Spectrometry (Performance-Based Test Methodology)
- ASTM E1832-08 Standard Practice for Describing and Specifying a Direct Current Plasma Atomic Emission Spectrometer
- ASTM E1832-08(2017) Standard Practice for Describing and Specifying a Direct Current Plasma Atomic Emission Spectrometer
- ASTM E684-95(2000) Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
- ASTM E684-04 Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
- ASTM E1479-16 Standard Practice for Describing and Specifying Inductively Coupled Plasma Atomic Emission Spectrometers
- ASTM F1467-99(2005)e1 Standard Guide for Use of an X-Ray Tester ([approximate]10 keV Photons) in Ionizing Radiation Effects Testing of Semiconductor Devices and Microcircuits
Group Standards of the People's Republic of China, Titanium ion sputtering apparatus
- T/QGCML 018-2020 Negative ion emitter
- T/CNIA 0012-2019 Determination of Boron, Phosphorus, Iron, Aluminum, Calcium, Titanium Content in Silicon Powder - Inductively Coupled Plasma Atomic Emission Spectrometry
- T/NAIA 0157-2022 Determination of Titanium in Carburizer by Inductively Coupled Plasma Emission Spectrometry (ICP-AES)
Japanese Industrial Standards Committee (JISC), Titanium ion sputtering apparatus
- JIS H 1632-3:2014 Titanium.ICP atomic emission spectrometry.Part 3: Determination of boron
- JIS H 1632-1:2014 Titanium.ICP atomic emission spectrometry.Part 1: General requirements and sample decomposition
- JIS H 1632-2:2014 Titanium.ICP atomic emission spectrometry.Part 2: Determination of palladium, manganese, iron, magnesium, silicon, aluminium, vanadium, nickel, chromium, tin, copper, molybdenum, zirconium, niobium, tantalum, cobalt and yttrium
General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Titanium ion sputtering apparatus
- GB/T 25755-2010 Vacuum technology.Sputter-ion pumps.Measurement of performance characteristics
- GB/T 36244-2018 Inductively coupled plasma atomic emission spectrometer
- GB/T 24194-2009 Ferrosilicon.Determination of aluminium,clacium,managanese,chromium,titanium,copper,phosphorus and nickel content.Inductively coupled plasma atomic emission spectrometric method
- GB/T 4698.4-2017 Methods for chemical analysis of titanium sponge,titanium and titanium alloys.Part 4:Determination of manganese content.Potassium periodate spectrophotometry and inductively coupled plasma atomic emission spectrometry
- GB/T 4698.10-2020 Methods for chemical analysis of titanium sponge, titanium and titanium alloys—Part 10：Determination of chromium content—Ammonium ferrous sulfate titration and inductively coupled plasma atomic emission spectrometry（with vanadium）
RU-GOST R, Titanium ion sputtering apparatus
- GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products
- GOST 5.413-1970 The mater cooled diode type sputter-ion pump NMDI-01-1 (NIRD-100) with the power supply BP-150. Quality requirements for certified products
Korean Agency for Technology and Standards (KATS), Titanium ion sputtering apparatus
- KS D ISO 22962:2010 Titanium and titanium alloys－Determination of iron－Inductively coupled plasma atomic emission spectrometry
- KS D ISO 22962-2010(2020) Titanium and titanium alloys－Determination of iron－Inductively coupled plasma atomic emission spectrometry
International Organization for Standardization (ISO), Titanium ion sputtering apparatus
- ISO 22962:2008 Titanium and titanium alloys - Determination of iron - Inductively coupled plasma atomic emission spectrometry
- ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- ISO/PRF 21339:2023 Titanium and titanium alloys — Ti-6Al-4V — Determination of aluminium and vanadium contents — Inductively coupled plasma atomic emission spectrometric method
- ISO/DIS 21339:1972 Titanium and titanium alloys — Ti-6Al-4V — Determination of aluminium and vanadium contents — Inductively coupled plasma atomic emission spectrometric method
- ISO 21339:2023 6Al-4V titanium alloys — Determination of aluminium and vanadium contents — Inductively coupled plasma atomic emission spectrometric method
- ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
- ISO 22415:2019 Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
AENOR, Titanium ion sputtering apparatus
- UNE 38863:2012 Titanium and titanium alloys. Determination of iron. Inductively coupled plasma atomic emission spectrometry.
British Standards Institution (BSI), Titanium ion sputtering apparatus
- BS ISO 22962:2008 Titanium and titanium alloys - Determination of iron - Inductively coupled plasma atomic emission spectrometry
- BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
- 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
- PD IEC/TS 62743:2012 Radiation protection instrumentation. Electronic counting dosemeters for pulsed fields of ionizing radiation
- 23/30454447 DC BS ISO 21339. Titanium and titanium alloys. Ti-6Al-4V. Determination of aluminium and vanadium contents. Inductively coupled plasma atomic emission spectrometric method
- BS ISO 21339:2023 6Al-4V titanium alloys. Determination of aluminium and vanadium contents. Inductively coupled plasma atomic emission spectrometric method
- BS ISO 22415:2019 Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
Professional Standard - Agriculture, Titanium ion sputtering apparatus
- JJG(教委) 015-1996 Verification Regulations for Inductively Coupled Plasma Atomic Emission Spectrometer
Professional Standard - Commodity Inspection, Titanium ion sputtering apparatus
- SN/T 3367-2012 Determination of titanium,aluminum,silicon,phosphor,copper and manganese content in ferrotitanium.Inductively coupled plasma atomic emission spectrometry
- SN/T 3910-2014 Determination of manganese,chromium,nickel,aluminum,molybdenum,tin, vanadium, copper in sponge titanium, titanium and titanium alloys.Inductively coupled plasma atomic emission spectrometry
- SN/T 2493-2010 Determination of Ca,Fe,Na,Ni,Si,Ti,V in coal tar pitch by inductively coupled plasma atomic emission spectrometry
- SN/T 2264-2009 Determination of Cu,Fe,Mg,Mn,Si,Ti,V,Zn and Zr in aluminun alloys.Inductively coupled plasma atomic emission spectrometry
- SN/T 3365-2012 Determination of lead,iron,titanium,copper,manganese,zinc,chromium,aluminium content in quartz sand.Inductively couple plasma atomic emission spectrometric method
- SN/T 2049-2008 Determination of copper,nickel,lead,manganese,cadmium,titanium in food grade of phosphoric acid for import and export.Inductively coupled plasma atomic emission spectrometric method
- SN/T 3319.1-2012 Ferrophosphorus for import and export.Part 1:Determination of phosphorus、 manganese silicon、titanium、vanadium、chromium.Inductively coupled plasma atomic emission spectrometric method
- SN/T 3343-2012 Determination of manganese,phosphorus,silicon,chromium,nickel,copper,molybdenum,and titanium in Stainless steel.Inductively coupled plasma atomic emission spectrometry
Association Francaise de Normalisation, Titanium ion sputtering apparatus
- NF A08-920:2008 Nickel alloys - Determination of tantalum - Inductively coupled plasma atomic emission spectrometric method.
- A08-652:1994 Chemical analysis of titanium and titanium alloys. Rules to be followed for plasma emission spectrometrie analysis.
SE-SIS, Titanium ion sputtering apparatus
- SIS SS IEC 731:1988 Medical electrical equipment — Dos/meters with ionization chambers as used in radiotherapy
工业和信息化部, Titanium ion sputtering apparatus
- YS/T 1262-2018 Chemical analysis methods for titanium sponge, titanium and titanium alloys. Determination of multi-element content by inductively coupled plasma atomic emission spectrometry.
- YB/T 4983-2022 Determination of phosphorus, iron, phosphorus, silicon, manganese and titanium content by inductively coupled plasma atomic emission spectrometry
- YB/T 4739-2019 Determination of chromium, iron, phosphorus, aluminum, titanium, copper, manganese and calcium content by inductively coupled plasma atomic emission spectrometry
International Electrotechnical Commission (IEC), Titanium ion sputtering apparatus
- IEC TS 62743:2012 Radiation protection instrumentation - Electronic counting dosemeters for pulsed fields of ionizing radiation
- IEC 45B/706/DTS:2011 IEC/TS 62743, Ed. 1: Radiation protection instrumentation - Electronic counting dosemeters for pulsed fields of ionizing radiation
中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会, Titanium ion sputtering apparatus
- GB/T 4698.28-2017 Methods for chemical analysis of titanium sponge, titanium and titanium alloys—Part 28：Determination of ruthenium content—Inductively coupled plasma atomic emission spectrometry
- GB/T 4698.27-2017 Methods for chemical analysis of titanium sponge, titanium and titanium alloys—Part 27：Determination of neodymium content—Inductively coupled plasma atomic emission spectrometry
- GB/T 4698.8-2017 Methods for chemical analysis of titanium sponge, titanium and titanium alloys—Part 8：Determination of aluminum content—Separation with sodium hydroxide-EDTA complex-metric titration and inductively coupled plasma atomic emission spectrometry
- GB/T 4698.13-2017 Methods for chemical analysis of titanium sponge,titanium and titanium alloys—Part 13：Determination of zirconium content—EDTA complexometric titration and inductively coupled plasma atomic emission spectrometry
- GB/T 4698.9-2017 Methods for chemical analysis of titanium sponge,titanium and titanium alloys—Part 9：Determination of tin content—Potassium iodate titration and inductively coupled plasma atomic emission spectrometry
- GB/T 5195.16-2017 Fluorspar—Determination of silicon, aluminum, iron, potassium, magnesium and titanium content—Inductively coupled plasma atomic emission spectrometry
- GB/T 4698.12-2017 Methods for chemical analysis of titanium sponge, titanium and titanium alloys—Part 12：Determination of vanadium content—Ammonium ferrous sulfate titration and inductively coupled plasma atomic emission spectrometry
- GB/T 4698.22-2017 Methods for chemical analysis of titanium sponge ,titanium and titanium alloys—Part 22：Determination of niobium content—5-Br-PADAP spectrophotometry and inductively coupled plasma atomic emission spectrometry
- GB/T 4698.5-2017 Methods for chemical analysis of titanium sponge, titanium and titanium alloys—Part 5：Determination of molybdenum content—Thiocyanate spectrophotometry and inductively coupled plasma atomic emission spectrometry
- GB/T 4698.24-2017 Methods for chemical analysis of titanium sponge, titanium and titanium alloys—Part 24：Determination of nickel content—Dimethylglyoxime spectrophotometry and inductively coupled plasma atomic emission spectrometry
- GB/T 4698.23-2017 Methods for chemical analysis of titanium sponge，titanium and titanium alloys—Part 23：Determination of palladium content—Stannous choride-potassium iodide spectrophotometry and inductively coupled plasma atomic emission spectrometry
IEC - International Electrotechnical Commission, Titanium ion sputtering apparatus
- TS 62743-2012 Radiation protection instrumentation – Electronic counting dosemeters for pulsed fields of ionizing radiation (Edition 1.0)
Yunnan Provincial Standard of the People's Republic of China, Titanium ion sputtering apparatus
- DB53/T 422-2012 Determination of Phosphorus, Manganese, Titanium, Chromium, Copper, Vanadium in Ferrophosphorus - Inductively Coupled Plasma Atomic Emission Spectrometry
- DB53/T 880-2018 Determination of phosphorus magnesium iron aluminum silicon calcium manganese sulfur titanium strontium in phosphate rock Inductively coupled plasma atomic emission spectrometry
国家市场监督管理总局、中国国家标准化管理委员会, Titanium ion sputtering apparatus
- GB/T 5687.12-2020 Ferrochromium—Determination of phosphorus, aluminum, titanium, copper, manganese, calcium content—Inductively coupled plasma atomic emission spectrometric method
- GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- GB/T 8704.10-2020 Ferrovanadium—Determination of silicon, manganese, phosphorus, aluminum, copper, chromium, nickel and titanium contents— Inductively coupled plasma atomic emission spectrometric method
- GB/T 4698.6-2019 Methods for chemical analysis of titanium sponge,titanium and titanium alloys—Part 6:Determination of boron content—Methylene blue spectrophotometry and inductively coupled plasma atomic emission spectrometry
- GB/T 37667-2019 Determination of iron,calcium,magnesium,potassium,sodium,manganese,phosphorus,aluminum,titanium,strontium and barium in coal ash—Inductively coupled plasma-atomic emission spectrometry
Hebei Provincial Standard of the People's Republic of China, Titanium ion sputtering apparatus
- DB13/T 5589-2022 Determination of phosphorus, titanium, manganese, chromium, potassium and sodium content in steel slag by inductively coupled plasma atomic emission spectrometry
- DB13/T 5590-2022 Determination of phosphorus, titanium, manganese, zinc, potassium and sodium in iron-containing dust and sludge - Inductively coupled plasma atomic emission spectrometry
Professional Standard - Ferrous Metallurgy, Titanium ion sputtering apparatus
- YB/T 6088-2023 Determination of ferrosilicon nitride calcium, aluminum, chromium, manganese, titanium, phosphorus content by inductively coupled plasma atomic emission spectrometry
国家质量监督检验检疫总局, Titanium ion sputtering apparatus
- SN/T 4757-2017 Determination of silicon, aluminum, manganese, phosphorus, copper, nickel, chromium and titanium in exported ferrovanadium by inductively coupled plasma atomic emission spectrometry
Inner Mongolia Provincial Standard of the People's Republic of China, Titanium ion sputtering apparatus
- DB15/T 1240-2017 Determination of Iron, Aluminum, Calcium, Titanium, Boron, Phosphorus in Silicon Powder by Inductively Coupled Plasma Emission Spectrometry
海关总署, Titanium ion sputtering apparatus
- SN/T 5347.2-2021 Determination of lead, zinc, phosphorus, titanium and nickel content in chromium ore by inductively coupled plasma optical emission spectrometry