GL纳米压印机 GL4/6 ，GL6/8/12

产品描述

GL4/6 R&D

Multi-functional NIL machine for R&D

➢Multi-function NIL machine for R&D and small

volume production

➢Easy switch between different NIL configurations,

flxibilities for R&D

➢Functions: High resolution NIL on spin-coated

substrates, Puddle dispensed NIL for Micro

molding processes, NIL on curved or spherical

surfaces

GL6/8/12 CLIV

High resolution NIL machine for mass production

➢NIL machine equipped with GermanLitho patented

CILV technology for mass production

➢NIL on spin-coated substrates for high resolution

and high aspect ratio nanostructures

➢Automatic working stamp replication, imprinting

and demolding processes, excelent imprint

uniformity over large area

➢Better than 40nm resolution, 10:1 aspectration,

20nm residual layer thickness

GL8 MLA

NIL machine for microlens array production

➢Mass production NIL machine for micro-molding of

microlens array or diffuser processes

➢Automatic working stamp replication, imprinting

and demolding processes, resist dispense

integrated

➢Active control of gap and parallelism between

stamp and substrate, excelent TTV

➢Alignment for wafer stacking processes

GL纳米压印机 GL4/6 ，GL6/8/12信息由上海螣芯电子科技有限公司为您提供，如您想了解更多关于 GL纳米压印机 GL4/6 ，GL6/8/12报价、型号、参数等信息，欢迎来电或留言咨询。

注：该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案，不可用于临床诊断或治疗等相关用途