400-6699-117转1000
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上海螣芯电子科技有限公司
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| 参考报价： | ￥300000 RMB（人民币） | 型号： | EVG®610 |
| 品牌： | EVG | 产地： | 奥地利 |
| 关注度： | 52 | 信息完整度： |  |
| 样本： | 典型用户： | 暂无 |
400-6699-117转1000
产品描述 Features Wafer/substrate size from pieces up to 200 mm/8’’ Top-side and bottom-side alignment capability High-precision alignment stage Automated wedge compensation sequence Motorized and recipe-controlled exposure gap Supports the latest UV-LED technology Minimized system footprint and facility requirements Step-by-step process guidance Remote tech support Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages) Agile processing and conversion re-tooling Table top or stand-alone version with anti-vibration granite table Additional capabilities: Bond alignment IR alignment Nanoimprint lithography (NIL) Technical DataAlignment modes Top side alignment: ≤ ± 0,5 µm Bottom side aligment: ≤ ± 2,0 µm IR alignment: ≤ ± 2,0 µm/ substrate material depending Bond alignment: ≤ ± 2,0 µm NIL alignment: ≤ ± 2,0 µm Exposure source Mercury light source / UV LED light source Wedge compensation Fully automatic - SW controlled Wafer diameter (substrate size) Up to 100 / 150 / 200 mm Exposure setup Vacuum contact / hard contact / soft contact / proximity mode Exposure options Interval exposure / flood exposure / sector exposure Advanced alignment features Manual alignment / in-situ alignment verification Manual cross correction Large gap alignment System control Operation system: Windows File sharing & back-up solution / unlimited no. recipes & parameters Multi-language user GUI & support: CN, DE, FR, IT, JP, KR Real-time remote access, diagnostics & troubleshooting Nanoimprint lithography technology UV-NIL 
接触式双面光刻机 EVG®610信息由上海螣芯电子科技有限公司为您提供，如您想了解更多关于 接触式双面光刻机 EVG®610报价、型号、参数等信息，欢迎来电或留言咨询。
注：该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案，不可用于临床诊断或治疗等相关用途
