DIN 50443-1:1988
半导体工艺使用材料的检验.第1部分:用X射线外形测量法检测半导体单晶硅中晶体缺陷和不均匀性
Testing of materials for use in semiconductor technology; detection of crystal defects and inhomogeneities in silicon single crystals by X-ray topography
- 标准号
- DIN 50443-1:1988
- 发布
- 1988年
- 发布单位
- 德国标准化学会
- 当前最新
- DIN 50443-1:1988
- 适用范围
- This standard determines the methods for the recognition of defects and inhomogeneities in semiconductor silicon single crystals by x-ray topography.