DIN 50455-2-1999
半导体技术用材料的试验.表征光敏抗蚀剂的方法.第2部分:阳极光敏抗蚀剂的光敏度的测定
Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresists
DIN 50455-2-1999 发布历史
The method according to the document covers the characterization of photoresists by comparison of the determined photosensitivity of a single-layer positive photoresist on silicon wafers with a reference photoresist.
DIN 50455-2-1999由德国标准化学会 DE-DIN 发布于 1999-11。
DIN 50455-2-1999 在中国标准分类中归属于: H80 半金属与半导体材料综合，在国际标准分类中归属于: 29.045 半导体材料。
DIN 50455-2-1999的历代版本如下：
- 1999年11月 DIN 50455-2-1999 半导体技术用材料的试验.表征光敏抗蚀剂的方法.第2部分:阳极光敏抗蚀剂的光敏度的测定
- 适用范围
- The method according to the document covers the characterization of photoresists by comparison of the determined photosensitivity of a single-layer positive photoresist on silicon wafers with a reference photoresist.