DIN 50455-2-1999 半导体技术用材料的试验.表征光敏抗蚀剂的方法.第2部分:阳极光敏抗蚀剂的光敏度的测定
Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresists
The method according to the document covers the characterization of photoresists by comparison of the determined photosensitivity of a single-layer positive photoresist on silicon wafers with a reference photoresist.