H17 半金属及半导体材料分析方法 标准查询与下载
共找到 210 条与 半金属及半导体材料分析方法 相关的标准，共 14 页
本标准规定了高纯锑中镁、锰、铁、镍、铜、锌、砷、硒、银、镉、金、铅、铋含量的测定方法。 本标准适用于高纯锑中镁、锰、铁、镍、铜、锌、砷、硒、银、镉、金、铅、铋含量的测定。各元素测定范围为 0.000 1%～0.010%。
Test methods for chemical analysis of high purity antimony.Determination of magnesium, manganese, iron,nickel, copper, zinc,arsenic, selenium,silver,cadmium,gold,lead and bismuth content.Inductively coupled plasma-mass spectrum method
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2015-04-30
- 实施
- 2015-10-01
YS/T 981的本部分规定了高纯铟中铊含量的测定方法。本部分适用于99.999 9%高纯铟中铊含量的测定。测定范围为5×10~3×10%。
Methods for chemical analysis of high pure indium.Determination of thallium content.Rhodamine B spectrophotometric method
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
本标准规定了硅粉中硼含量、磷含量的测定方法。本标准适用于硅粉中硼含量、磷含量的测定。测定范围为硼0.000 10%~0.010 00%,磷0.000 50%~0.015 00%。
Determination of boron and phosphorus concent in silicon powder by chemical analysis
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
本标准规定了高纯三氧化二镓中杂质元素含量的测定方法。本标准适用于高纯三氧化二镓中钠、镁、钙、钛、钒、铬、锰、铁、镍、钴、铜、锌、锡、铅、铟含量的测定。各元素测定范围为(1×10)%~(4×10)%。
Determination of impurities of high purity gallium oxide.Inductively coupled plasma-mass spectrmetry
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
本标准规定了氯硅烷中碳杂质的测定方法,主要包括三氯氢硅中甲基二氯氢硅的测定和四氯化硅中甲基二氯氢硅的测定。本标准适用于三氯氢硅中甲基二氯氢硅的测定和四氯化硅中甲基二氯氢硅的测定。三氯氢硅、四氯化硅中甲基二氯氢硅的检测范围均为0.000 01%~1.00%。
Test method for measuring carbon containing compound in chlorosilane.Determination of methyldichlorosilane
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
YS/T 981的本部分规定了 99.999%~99.999 9%高纯铟中镁、铝、铁、镍、铜、锌、银、镉、锡、铅元素含量的测定方法。本部分适用于高纯铟中镁、铝、铁、镍、铜、锌、银、镉、锡、铅含量的测定。各元素的测定范围见表1。
Methods for chemical analysis of high purity indium.Determination of magnesium,aluminum,iron,nickel,copper,zinc,silver,cadmium,tin and lead.Inductively coupled plasma mass spectrometry
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
YS/T 981的本部分规定了高纯铟中硅含量的测定方法。本部分适用于99.999 9%高纯铟中硅含量的测定。测定范围为5×10%~2×10%。
Methods for chemical analysis of high pure indium.Determination of silicon content.Molybdenum blue spectrophotometric method
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
本标准规定了多晶硅还原炉和氢化炉尾气成分的测定方法。本标准适用于改良西门子法工艺还原炉和氢化炉尾气成分(氢气、氯化氢、三氯氢硅、二氯二氢硅和四氯化硅)的测定。检测范围为体积分数0.1%~100%。
Test method for measuring composition of polysilicon deposition reactor and TCS to STC converter vent gas
- ICS
- 77.040
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
YS/T 981的本部分规定了高纯铟中锡含量的测定方法。本部分适用于99.999 9%高纯铟中锡含量的测定。测定范围为5×10%~2×10%。
Method for chemical analysis of high pure indium.Determination of tin content.Benzfluorenone-cetyltrimethylammonium bromide spectrophotometric method
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
YS/T 981的本部分规定了采用高质量分辨率辉光放电质谱法测定99.999%以上高纯铟中镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅元素含量的方法。本部分适用于高纯铟中镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅的测定,各元素测定范围为5.0×10%~1.0×10%。
Methods for chemical analysis of high purity indium.Determination of magnesium,aluminum,silicon,sulphur,iron,nickel,copper, zinc, arsenic, silver, cadmium, tin, thallium, lead content.High mass resolution glow discharge mass specrometry
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2014-10-14
- 实施
- 2015-04-01
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
- ICS
- 71.040.40
- CCS
- H17
- 发布
- 2014-07-31
- 实施
- 2014-07-31
이 표준은 구리 및 구리 합금(신동품, 형동, 주물용 구리 지금 및 구리 주물)의 인 정량 방법에 대하여 규정한다.
Methods for determination of phosphorus in copper and copper alloys
- ICS
- 71.040.40
- CCS
- H17
- 发布
- 2013-12-25
- 实施
- 2013/12/25
이 표준은 구리 및 구리 합금 중의 코발트 정량 방법에 대하여 규정한다.
Methods for determination of cobalt in copper and copper alloys
- ICS
- 71.040.30;77.120.30
- CCS
- H17
- 发布
- 2012-11-02
- 实施
- 2012-11-02
이 표준은 구리 제품 및 구리 합금의 베릴륨 정량 방법에 대하여 규정한다.
Determination of beryllium in copper alloys
- ICS
- 77.040.30;77.120.30
- CCS
- H17
- 发布
- 2012-11-02
- 实施
- 2012-11-02
이 표준은 구리 및 구리 합금 중의 규소 정량 방법에 대하여 규정한다.
Methods for determination of silicon in copper and copper alloys
- ICS
- 77.120.30
- CCS
- H17
- 发布
- 2012-11-02
- 实施
- 2012-11-02
YS/T 34的本部分规定了高纯砷中硒含量的测定方法。 本部分适用于砷（99.999%）中硒含量的测定，测定范围为0.000 05%～0.00015%。
Method for chemical analysis of the high-purity arsenic.Predicating method for determinating the concentration of selenium
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2011-12-20
- 实施
- 2012-07-01
YS/T 34的本部分规定了高纯砷中硫含量的测定方法。 本部分适用于砷（99.999%）中硫含量的测定，测定范围为0.000 03%～0.00015%。
Method for chemical analysis of the high-purity arsenic.Predicating method for determinating the concentration of sulfur
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2011-12-20
- 实施
- 2012-07-01
YS/T 34的本部分规定了高纯砷中金属杂质含量的测定方法，采用电感耦合等离子质谱法测定砷中镁、铬、镍、铜、锌、银、锑、铅、铋、钠、钾、铝、钙、铁等14个杂质含量。 本部分适用于99.999%～99.99999%高纯砷中金属杂质的测定。测定范围为1×10%～１000×10%.
Method for chemical analysis of the high-purity arsenic.Inductive coupling plasma mass spectrum(ICP-MS)for determinating the concentration of elements in the high-purity arsenic
- ICS
- 77.040.30
- CCS
- H17
- 发布
- 2011-12-20
- 实施
- 2012-07-01
이 표준은 타이타늄 및 타이타늄 합금 중의 탄소 정량 방법에 대하여 규정한다.
Methods for determination of carbon in titanium and titanium alloys
- ICS
- 77.120.50
- CCS
- H17
- 发布
- 2011-07-11
- 实施
- 2011-07-11
이 표준은 타이타늄 및 타이타늄 합금 중의 규소 정량 방법에 대하여 규정한다.
Methods for determination of silicon in titanium and titanium alloys
- ICS
- 77.120.50;71.040.40
- CCS
- H17
- 发布
- 2011-07-11
- 实施
- 2011-07-11
