ZH
RU
ES

Argon ion sputtering

Argon ion sputtering, Total:37 items.

In the international standard classification, Argon ion sputtering involves: Analytical chemistry, Vacuum technology, FLUID SYSTEMS AND COMPONENTS FOR GENERAL USE, Semiconducting materials, Optoelectronics. Laser equipment, Water quality, Products of non-ferrous metals.

International Organization for Standardization (ISO), Argon ion sputtering

• ISO 22415:2019 Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
• ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films

Professional Standard - Electron, Argon ion sputtering

• SJ 1781-1981 Sputtering ion pump--Testing methods
• SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series
• SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification
• SJ 3237-1989 Method for determination of trace oxygen in electronic grade Argon--Argon ionization gas chromatography method
• SJ 3238-1989 Method for determination of trace Nitrogen in electronic grade Argon--Argon ionization gas chromatography method
• SJ 3240-1989 Method for determination of trace Methane and hydrogen in electronic grade Argon--Argon ionization gas chromatography method

Professional Standard - Machinery, Argon ion sputtering

• JB/T 4081-2011 Vacuum technology - Sputter ion pump
• JB/T 4082-1991 Sputtering ion pump technical conditions
• JB/T 2965-1992 Performance testing method of sputtering ion pump
• JB/T 4081-1991 Sputtering ion pump type and basic parameters
• JB/T 9489-1999 Measuring mathod of major parameter for argon ion lasers

German Institute for Standardization, Argon ion sputtering

• DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps

British Standards Institution (BSI), Argon ion sputtering

• BS ISO 22415:2019 Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
• BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
• BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
• 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Argon ion sputtering

• GB/T 25755-2010 Vacuum technology.Sputter-ion pumps.Measurement of performance characteristics
• GB/T 8144-2008(英文版) Determination of exchange capacity of argon ion exchange resin

RU-GOST R, Argon ion sputtering

• GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products

American Society for Testing and Materials (ASTM), Argon ion sputtering

• ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
• ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
• ASTM D1976-07 Standard Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy
• ASTM D4190-03 Standard Test Method for Elements in Water by Direct-Current Argon Plasma Atomic Emission Spectroscopy
• ASTM D4190-82(1988)e1 Standard Test Method for Elements in Water by Direct-Current Argon Plasma atomic Emission Spectroscopy
• ASTM D1976-12 Standard Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy
• ASTM D4190-08 Standard Test Method for Elements in Water by Direct-Current Argon Plasma Atomic Emission Spectroscopy
• ASTM D4190-99 Standard Test Method for Elements in Water by Direct-Current Argon Plasma Atomic Emission Spectroscopy
• ASTM D1976-96 Standard Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy
• ASTM D1976-02 Standard Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy
• ASTM E1162-11(2019) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1162-06 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

Professional Standard - Non-ferrous Metal, Argon ion sputtering

• YS/T 819-2012 High-purity sputtering copper target used in electronic film
• YS/T 893-2013 High-purity sputtering titanium target used in electronic film

Others:   Ion sputter, ion sputtering, Ion sputter, sputter ion pump, Argon ion color, Ion sputtering machine, Argon ion polishing, ion sputtering, +Ion sputtering apparatus, Ion sputtering + gold, Argon ion polishing ion, Argon ion sputtering, ion sputtering, Ion sputter..., ion sputtering gold, gold ion sputtering, ion sputtering interface, ion sputter, Ion sputtering batch, small ion sputtering.