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small ion sputtering

small ion sputtering, Total:29 items.

In the international standard classification, small ion sputtering involves: FLUID SYSTEMS AND COMPONENTS FOR GENERAL USE, Vacuum technology, Analytical chemistry, Semiconducting materials, Pumps, Electronic components in general, Electricity. Magnetism. Electrical and magnetic measurements.

Professional Standard - Machinery, small ion sputtering

• JB/T 4081-1991 Sputtering ion pump type and basic parameters
• JB/T 4081-2011 Vacuum technology - Sputter ion pump
• JB/T 4082-1991 Sputtering ion pump technical conditions
• JB/T 2965-1992 Performance testing method of sputtering ion pump

Professional Standard - Electron, small ion sputtering

• SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series
• SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification
• SJ 1781-1981 Sputtering ion pump--Testing methods
• SJ 51065/6-1997 Detail Specification for Type GBX007 Miniature Waveguide RF Isolators

RU-GOST R, small ion sputtering

• GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products
• GOST 5.413-1970 The mater cooled diode type sputter-ion pump NMDI-01-1 (NIRD-100) with the power supply BP-150. Quality requirements for certified products

German Institute for Standardization, small ion sputtering

• DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, small ion sputtering

• GB/T 25755-2010 Vacuum technology.Sputter-ion pumps.Measurement of performance characteristics

American Society for Testing and Materials (ASTM), small ion sputtering

• ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
• ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
• ASTM E1162-11(2019) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1162-06 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E684-95(2000) Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
• ASTM E684-04 Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces

Association Francaise de Normalisation, small ion sputtering

• XP ISO/TS 23625:2021 Petits navires - Batteries lithium-ion

ES-UNE, small ion sputtering

• UNE-CEN ISO/TS 23625:2022 Small craft - Lithium-ion batteries (ISO/TS 23625:2021) (Endorsed by Asociación Española de Normalización in November of 2022.)

British Standards Institution (BSI), small ion sputtering

• BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
• BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
• 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…

International Organization for Standardization (ISO), small ion sputtering

• ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
• ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
• ISO 22415:2019 Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials

AT-ON, small ion sputtering

• ONORM S 1234-1997 Cartridges with small shot pellets - Proof barrel

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